Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films

Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films PDF Author: P. Shen
Publisher:
ISBN:
Category :
Languages : en
Pages : 5

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Spin-on deposited Sio2-TiO2 thin films (pure and doped with dyes) are produced. Their optical and mechanical properties are determined and their use for a number of applications is investigated. The spin-on deposited SiO2 film has been successfully doped with coumarin as a colour center and characterized as a waveguide overlay. Solution deposited thin films of silicon and titanium dioxide, and their mixtures, are suitable for a number of applications such as antireflection coating and waveguides for integrated optics. Both dipping and spinning methods can be used to obtain good quality films 1 2. For the dipping process, processing standardization ensures good reproducibility of refractive index and thickness 1. In this paper, we use a spin-on and baking process to produce pure and doped SiO2 and TiO2 films and we study some of their optical and mechanical properties. The solution we used is commercially available E. Merck liquicoat solutions 3. They are metal alkoxide colloidal solutions containing 7% and 9% SiO2 and TiO2 respectively. By varying the volume ratio of the two component solutions, films of various thickness (80-250 nm) and refractive index (1.4-2.0) can be obtained. We used 0.02 inch thick P-doped 100 silicon, Coming 0211 glass, and 1 mm thick Fisher microscope slides as three substrate materials. We use standard silicon and glass cleaning procedures and carried out the film deposition in a class 100 clean room. The solution were mixed immediately before coating to ensure.

Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films

Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films PDF Author: P. Shen
Publisher:
ISBN:
Category :
Languages : en
Pages : 5

Get Book Here

Book Description
Spin-on deposited Sio2-TiO2 thin films (pure and doped with dyes) are produced. Their optical and mechanical properties are determined and their use for a number of applications is investigated. The spin-on deposited SiO2 film has been successfully doped with coumarin as a colour center and characterized as a waveguide overlay. Solution deposited thin films of silicon and titanium dioxide, and their mixtures, are suitable for a number of applications such as antireflection coating and waveguides for integrated optics. Both dipping and spinning methods can be used to obtain good quality films 1 2. For the dipping process, processing standardization ensures good reproducibility of refractive index and thickness 1. In this paper, we use a spin-on and baking process to produce pure and doped SiO2 and TiO2 films and we study some of their optical and mechanical properties. The solution we used is commercially available E. Merck liquicoat solutions 3. They are metal alkoxide colloidal solutions containing 7% and 9% SiO2 and TiO2 respectively. By varying the volume ratio of the two component solutions, films of various thickness (80-250 nm) and refractive index (1.4-2.0) can be obtained. We used 0.02 inch thick P-doped 100 silicon, Coming 0211 glass, and 1 mm thick Fisher microscope slides as three substrate materials. We use standard silicon and glass cleaning procedures and carried out the film deposition in a class 100 clean room. The solution were mixed immediately before coating to ensure.

Structural, Optical, and Mechanical Properties of Silicon Nitride Films Deposited by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Structural, Optical, and Mechanical Properties of Silicon Nitride Films Deposited by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition PDF Author: Ezgi Abacıoğlu
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Sol-gel Optics

Sol-gel Optics PDF Author:
Publisher:
ISBN:
Category : Colloids
Languages : en
Pages : 788

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Coatings on Glass 1998

Coatings on Glass 1998 PDF Author: H. Pulker
Publisher: Elsevier
ISBN: 0444502475
Category : Science
Languages : en
Pages : 483

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Book Description
This conference provided a forum where researchers and industrialists working with glass and thin films, could meet and discuss common, complex problems. Many apparently old fundamental procedures and processes are still under investigation, due to their complexity. In particular it is often so that experience dictates the operating conditions, e.g. a special glass treatment or a special coating process rather than the understanding of the treatment or the process itself. It was therefore the aim of this conference to discuss the various problems and to deepen the knowledge that is useful for industrial situations. Based on the fundamental steps of glass fabrication, modification and film deposition, and property studies and the search for possible applications, a wide range of glass and plastic treatments have been carefully considered in this book by experts working in the field.

Chemical Abstracts

Chemical Abstracts PDF Author:
Publisher:
ISBN:
Category : Chemical abstracts
Languages : en
Pages : 2682

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Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films

Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films PDF Author: David Christopher Gilmer
Publisher:
ISBN:
Category :
Languages : en
Pages : 314

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SPIE ... Publications Index

SPIE ... Publications Index PDF Author:
Publisher:
ISBN:
Category : Optics
Languages : en
Pages : 662

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Scientific and Technical Aerospace Reports

Scientific and Technical Aerospace Reports PDF Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704

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Physics Briefs

Physics Briefs PDF Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1108

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Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films

Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films PDF Author: Polly Wanda Chu
Publisher:
ISBN:
Category :
Languages : en
Pages : 434

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Book Description
Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.