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Author: Nuno Araujo
Publisher: LAP Lambert Academic Publishing
ISBN: 9783838369419
Category :
Languages : en
Pages : 224
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Book Description
When films growth under nonequilibrium conditions, phenomena not predicted from microscopic interactions emerge at the macroscopic level. Statistical Physics concepts and methods are then the meaningful methodology to study the problem. This book discusses the influence of the particle/particle and particle/substrate interaction rules on the morphology of the obtained film. Based on the work of the author s phD thesis, interesting structures are discussed, emerging from simple interacting rules as the ones from random sequential adsorption process either in the presence of patterned substrates or during competitive adsorption of particles with different sizes. For the growth regime where diffusion of particles on the substrate cannot be neglected, the influence of the flux of impinging particles on the nucleation and growth of islands is also covered.
Author: Nuno Araujo
Publisher: LAP Lambert Academic Publishing
ISBN: 9783838369419
Category :
Languages : en
Pages : 224
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Book Description
When films growth under nonequilibrium conditions, phenomena not predicted from microscopic interactions emerge at the macroscopic level. Statistical Physics concepts and methods are then the meaningful methodology to study the problem. This book discusses the influence of the particle/particle and particle/substrate interaction rules on the morphology of the obtained film. Based on the work of the author s phD thesis, interesting structures are discussed, emerging from simple interacting rules as the ones from random sequential adsorption process either in the presence of patterned substrates or during competitive adsorption of particles with different sizes. For the growth regime where diffusion of particles on the substrate cannot be neglected, the influence of the flux of impinging particles on the nucleation and growth of islands is also covered.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 12
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Book Description
We have developed new approaches to synthesize superhard/ultrastrong thin films and coatings by chemical vapor deposition (CVD) of unimolecular precursors, and to monitor and characterize the film-growth process in situ and in real time. To this end, we have designed and constructed an ultrahigh vacuum CVD chamber fitted with energy-dispersive x-ray reflectivity (XRR) and multiple- beam optical stress sensor (MOSS) for in situ monitoring of surface morphology and stress evolution of the films under growth. Both of these techniques were applied to the CVD growth of boron and GaN films. We have synthesized novel precursors of C3N3P, Si4CN4, LiBC4N4, BC3N3, BeC2N2, MgC2N2 for CVD growth of films with properties of superhardness. We have also deposited thin films by CVD with the composition of Zr-B-Si-N via reactions of Zr(BH4)4 with SiH4, and Zr(BH4)4 with N(SiH3)4. The elastic constants cli and c44 of these films measured by Brillouin scattering in collaboration with Prof. Sooryakumar of Ohio State University produced results suggesting that films and coatings based on the Zr-B-Si-N system exhibit promising superhard properties.
Author: K. Oura
Publisher: Springer Science & Business Media
ISBN: 3662051796
Category : Science
Languages : en
Pages : 443
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Book Description
The most important aspects of modern surface science are covered. All topics are presented in a concise and clear form accessible to a beginner. At the same time, the coverage is comprehensive and at a high technical level, with emphasis on the fundamental physical principles. Numerous examples, references, practice exercises, and problems complement this remarkably complete treatment, which will also serve as an excellent reference for researchers and practitioners. The textbook is idea for students in engineering and physical sciences.
Author: Zexian Cao
Publisher: Elsevier
ISBN: 0857093290
Category : Technology & Engineering
Languages : en
Pages : 433
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Book Description
Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films.Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films.With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic. - Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films - Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films - An essential reference for engineers in electronics, energy materials and mechanical engineering
Author: Orazio Descalzi
Publisher: Springer Science & Business Media
ISBN: 9400709919
Category : Science
Languages : en
Pages : 409
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Book Description
This volume contains a selection of lectures and seminars given at the Ninth International Workshop on Instabilities and Nonequilibrium Structures which took place in Via del Mar, Chile, in December 2001. This book consists of two parts, the first one has three lectures written by Professors H.R. Brand, M. Moreau and L.S. Tuckerman. H.R. Brand gives an overview about reorientation and undulation instabilities in liquid crystals, M. Moreau presents recent results on biased tracer diffusion in lattice gases, finally, L.S. Tuckerman summarizes some numerical methods used in bifurcation problems. The second part consists of a collection of selected seminars which cover different topics in nonlinear physics, from an experimental, numerical and theoretical point of view. This book should appeal to mathematicians, physicists and engineers interested in dynamical systems, statistical mechanics, and nonequilibrium systems.
Author: Jianguo Zhu
Publisher: World Scientific
ISBN: 9811224005
Category : Science
Languages : en
Pages : 706
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Book Description
Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.
Author: R.F.C. Farrow
Publisher: Springer Science & Business Media
ISBN: 1468491458
Category : Technology & Engineering
Languages : en
Pages : 548
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Book Description
This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.
Author: L. Correra
Publisher: Elsevier
ISBN: 0444600256
Category : Technology & Engineering
Languages : en
Pages : 908
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Book Description
Interdisciplinary research on superconducting oxides is the main focus of the contributions in this volume. Several aspects of the thin film field from fundamental properties to applications are examined. Interesting results for the Bi system are also reviewed. The 132 papers, including 8 invited, report mainly on the 1-2-3 system, indicating that the Y-Ba-Cu-O and related compounds are still the most intensively studied materials in this field. The volume attests to the significant progress that has been made in this field, as well as reporting on the challenging problems that still remain to be solved.
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173
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Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author: Matthew Pelliccione
Publisher: Springer Science & Business Media
ISBN: 0387751092
Category : Technology & Engineering
Languages : en
Pages : 206
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Book Description
The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.
