Semiconductor Silicon 1981 PDF Download
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Author: Howard R. Huff
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 1076
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Book Description
Author: Howard R. Huff
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 1076
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Book Description
Author: Klaus Graff
Publisher: Springer Science & Business Media
ISBN: 3642571212
Category : Technology & Engineering
Languages : en
Pages : 285
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Book Description
This up-to-date monograph provides a thorough review of the relevant data and properties of the transition-metal impurities generated during silicon-sample and device fabrication. The different mechanisms responsible for contamination are discussed, and a survey is given of their impact on device performance. The specific properties of the main and rare impurities in silicon are examined, as well as the detection methods and requirements in modern technology. This new edition includes important recent data and many new tables.
Author: A. G. Naumovets
Publisher: Elsevier
ISBN: 0080924395
Category : Science
Languages : en
Pages : 438
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Book Description
This is a self-contained, tutorial introduction to two-dimensional crystal science and technology. Including concise descriptions of experimental methods and results from fundamental theoretical concepts, this book covers a broad range of two-dimensional structures--from overlayers to freestanding films. All those with an active interest in surface science and statistical physics will find this book to be an essential reference work. - Presents a coherent overview of experimental methods and theoretical background of two-dimensional crystal physics - Provides a tutorial overview of continuous melting of two-dimensional crystals, roughening transitions, wetting phenomena, and commensurate-incommensurate transitions
Author: F. Garbassi
Publisher: Springer Science & Business Media
ISBN: 9400904991
Category : Technology & Engineering
Languages : en
Pages : 166
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Book Description
Proceedings of the 2nd Scientific Workshop, Novara, May 3-4, 1989
Author: United States. Patent and Trademark Office
Publisher:
ISBN:
Category : Patents
Languages : en
Pages : 1514
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Book Description
Author: Zhong-Qun Tian
Publisher: John Wiley & Sons Incorporated
ISBN: 9780470068083
Category : Science
Languages : en
Pages : 400
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Book Description
Surface-Enhanced Raman Spectroscopy: Principles, Experiments, and Applications is a comprehensive, up to date, and balanced treatment of the theoretical and practical aspects of Surface-Enhanced Raman Scattering (SERS), a useful branch of spectroscopy for several areas of science. This book describes the basic principles of SERS, including SERS mechanisms, performing SERS measurements, and interpreting data. Also emphasized are applications in electrochemistry; catalysis; surface processing and corrosion; Self-Assemble-Layer and L-B Films; polymer science; biology; medicine and drug analysis; sensors; fuel cells; forensics; and archaeology. It is an essential guide for student and professional analytical chemists.
Author:
Publisher:
ISBN:
Category : Patents
Languages : en
Pages : 472
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Book Description
Author: D.A. King
Publisher: Elsevier
ISBN: 0444601309
Category : Science
Languages : en
Pages : 489
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Book Description
Surface Properties of Electronic Materials is the fifth volume of the series, The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis. This volume indicates the present state of some basic properties of semiconductor surfaces. Chapter one summarizes the general problems in electronic materials and the areas affected by the surface science methods. The next two chapters illustrate the existing perception of the electronic and structural properties of elemental and compound semiconductor surfaces. This volume also deals with the properties of adsorption of semiconductors relating to both relevant gas phase species and metals. Chapters four to six of this volume explore compound semiconductors and elemental semiconductors. The remaining chapters of this volume explore the adsorption of metals on elemental semiconductors; aspects of growth kinetics and dynamics involved in molecular beam epitaxy; molecular beam epitaxy of silicon; insulators; and metastable phases. The last chapter covers the surface chemistry of dry etching processes.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 1170
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Book Description
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 412
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Book Description
