New Designs Of Electrostatic Lens Systems With Quadrupole Multiplets For Production Of Sub Micron Ion Beam PDF Download
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Author: Mingwu Jin
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
To advance the understanding of fundamental mechanisms in particle therapy and to quantify the radiation-induced effects in subcellular level, we initiated an effort in design of electrostatic quadrupole (EQ) focusing lens systems, to focus low MeV ion beams onto subcellular matrix with
Author: Mingwu Jin
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
To advance the understanding of fundamental mechanisms in particle therapy and to quantify the radiation-induced effects in subcellular level, we initiated an effort in design of electrostatic quadrupole (EQ) focusing lens systems, to focus low MeV ion beams onto subcellular matrix with
Author: Martin Hÿtch
Publisher: Academic Press
ISBN: 0323988660
Category : Technology & Engineering
Languages : en
Pages : 400
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Book Description
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Advances in Imaging and Electron Physics series Updated release includes the latest information on Coulomb Interactions in Particle Beams
Author: D.W.O. Heddle
Publisher: CRC Press
ISBN: 1420034391
Category : Technology & Engineering
Languages : en
Pages : 264
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Book Description
Electrostatic Lens Systems: Second Edition enables readers to design lens systems for focusing beams of charged particles that have useful characteristics. The book covers the basic theory of the motion of charged particles in electrostatic fields and describes several methods for the calculation of the potential and field distribution for various electrode geometries. It emphasizes the Bessel function expansion method, developed by the author and his students, and the nine-point implementation of the finite difference method. Demonstration programs of other methods can be found via the websites provided. A chapter on aberrations presents formulae that enable the coefficients to be determined by an extension to the ray tracing procedures, demonstrating optimum conditions for lens operation. The book is accompanied by a disk that provides a suite of computer programs (LENSYS for MS-DOS) intended for practical use in the design and analysis of systems using round lenses with apertures or cylindrical elements. These programs are of value even to experienced workers in the field who may be quite familiar with much of the material in the text.
Author: Geoff W. Grime
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 280
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Book Description
Author: D.W.O. Heddle
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 120
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Book Description
The use of electrostatic lenses for the control of ion and electron beams has grown considerably in recent years. In addition, innovations in the production of low energy positrons have opened a whole new field of research for which electrostatic lenses are required. Electrostatic Lens Systems is therefore a timely treatise on the practical aspects of lens system design. The text gives a clear and concise treatment of the motion of charged particles in electrostatic fields and describes several methods of calculating the potential and field distributions for various electrode geometries. Electrostatic Lens Systems is also intended to be an interactive tutor on the practical design and analysis of systems using round lenses (both apertures and cylinders) through a unique suite of programs (provided on IBM compatible disc). Combined with an emphasis on the Bessel function expansion method and a thorough description of the well known relaxation methods, this volume will be a significant reference work and learning tool for experienced workers and new researchers alike. If you need to use electrostatic lenses then you need to read Electrostatic Lens Systems.
Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1132
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Book Description
Author: Hongyul Paik
Publisher:
ISBN:
Category : Electron optics
Languages : en
Pages : 588
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Ion-beam optics models for simulating electrostatic prisms (deflectors) of different geometries have been developed for the computer code TRACE 3-D. TRACE 3-D is an envelope (matrix) code, which includes a linear space charge model, that was originally developed to model bunched beams in magnetic transport systems and radiofrequency (RF) accelerators. Several new optical models for a number of electrostatic lenses and accelerator columns have been developed recently that allow the code to be used for modeling beamlines and accelerators with electrostatic components. The new models include a number of options for: (1) Einzel lenses, (2) accelerator columns, (3) electrostatic prisms, and (4) electrostatic quadrupoles. A prescription for setting up the initial beam appropriate to modeling 2-D (continuous) beams has also been developed. The models for electrostatic prisms are described in this paper. The electrostatic prism model options allow the modeling of cylindrical, spherical, and toroidal electrostatic deflectors. The application of these models in the development of ion-beam transport systems is illustrated through the modeling of a spherical electrostatic analyzer as a component of the new low energy beamline at CAMS.
Author: John F. Watts
Publisher: John Wiley & Sons
ISBN: 1119417643
Category : Technology & Engineering
Languages : en
Pages : 307
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Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 0080984169
Category : Science
Languages : en
Pages : 755
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Book Description
The three volumes in the PRINCIPLES OF ELECTRON OPTICS Series constitute the first comprehensive treatment of electron optics in over forty years. While Volumes 1 and 2 are devoted to geometrical optics, Volume 3 is concerned with wave optics and effects due to wave length. Subjects covered include: Derivation of the laws of electron propagation from SchrUdinger's equation Image formation and the notion of resolution The interaction between specimens and electrons Image processing Electron holography and interference Coherence, brightness, and the spectral function Together, these works comprise a unique and informative treatment of the subject. Volume 3, like its predecessors, will provide readers with both a textbook and an invaluable reference source.
