Mössbauer Studies of Implantation Damage in Iron and Nickel PDF Download
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Author: Sipke Roelf Reintsema
Publisher:
ISBN:
Category : Iron
Languages : en
Pages : 176
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Author: Sipke Roelf Reintsema
Publisher:
ISBN:
Category : Iron
Languages : en
Pages : 176
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Author: A. Perez
Publisher: Springer Science & Business Media
ISBN: 1468410156
Category : Science
Languages : en
Pages : 518
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Book Description
Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.
Author: J. Christiansen
Publisher: Springer Science & Business Media
ISBN: 3642819699
Category : Science
Languages : en
Pages : 378
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Book Description
This volume deals with the interaction between moments of excited or radioactive nuclei and electromagnetic fields. The experimental techniques developed for the observation of this hyperfine interaction are governed by the lifetime of the nuc lear states in question. The dynamics of the interaction are reflected by the time dependence of the spatial distribution of the radioactive decay radiation. Basically, the experiments yield information on the energy shifts and/or splittings of the nuc lear levels. These quantities are determined essentially by the product of the nuc lear moment and the electromagnetic field acting at the site of the nucleus. Due to the strong decrease in the fields with distance, the measurements probe these fields within a highly localized region centered around the radioactive nuclei. Detailed experimental methods with numerous ramifications were developed in the early sixties. In the period which followed, the main emphasis was on excitation of short-lived nuclear states by means of pulsed particle accelerators, implantation of radioactive nuclei, and production of polarized a-unstable nuclei by nuclear re actions with polarized neutrons or particles. The seventies were a period of fruit ful applications directed to extensive studies of the moments of excited nuclear states on the one hand, and local internal fields on the other, resulting in far reaching information on atomic and solid-state properties. The organization of this Topics volume follows these main lines of research.
Author: Walter M. Gibson
Publisher:
ISBN:
Category : Language Arts & Disciplines
Languages : en
Pages : 726
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Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 376
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Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author: G.J Long
Publisher: Springer Science & Business Media
ISBN: 1461318270
Category : Business & Economics
Languages : en
Pages : 784
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Book Description
As is often the case, the preface is the last task to be finished during the preparation of a large volume such as you are now holding. The first task, obtaining approval for a symposium on the industrial applications, now seems a long time ago. The idea orginated with John Stevens, probably in 1982, from his observation of papers dealing with industrial applications of the Mossbauer effect appearing in the Mossbauer Effect Reference and Data Journal. His initial suggestion for a symposium entitled "Industrial Applications of the Mossbauer Effect" to be held at a national meeting of the American Chemical Society eventually led to the symposium at the International Chemical Congress of Pacific Basin Societies which met in Honolulu, Hawaii in December 1984. This volume is the result of the symposium at the above mentioned Congress, but is not actually the 'proceedings' of the symposium because this volume does not contain all of the over one hundred Mossbauer effect papers that were pre sented at the symposium. Rather it contains a selection of papers that the or ganizing committee for the symposium deemed most appropriate for a volume devoted to industrial applications of the Mossbauer effect. The final volume also contains six chapters that were not a part of the symposium but which are closely related to the topic. There is another difference from many proceedings.
Author: Walter M. Gibson
Publisher:
ISBN:
Category : Collisions (Physics)
Languages : en
Pages : 330
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Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 668
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Author: C.A.J. Ammerlaan
Publisher: Elsevier
ISBN: 0080983642
Category : Technology & Engineering
Languages : en
Pages : 518
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Book Description
This volume reviews recent developments in the materials science of silicon. The topics discussed range from the fundamental characterization of the physical properties to the assessment of materials for device applications, and include: crystal growth; process-induced defects; topography; hydrogenation of silicon; impurities; and complexes and interactions between impurities.In view of its key position within the conference scope, several papers examine process induced defects: defects due to ion implantation, silicidation and dry etching, with emphasis being placed on the device aspects. Special attention is also paid to recent developments in characterization techniques on epitaxially grown silicon, and silicon-on-insulators.
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1218
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