Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices : Proceedings of a Conference, 26-27 March 1987, Bay Point, Florida

Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices : Proceedings of a Conference, 26-27 March 1987, Bay Point, Florida PDF Author: O.J. Glembocki
Publisher:
ISBN:
Category :
Languages : en
Pages : 282

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Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices

Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices PDF Author: O. J. Glembocki
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices

Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices PDF Author: O. J. Glembocki
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 296

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Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing

Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing PDF Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 240

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Journal of Research of the National Institute of Standards and Technology

Journal of Research of the National Institute of Standards and Technology PDF Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 904

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Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.

Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing II

Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing II PDF Author: John Lowell
Publisher: Society of Photo Optical
ISBN: 9780819420046
Category : Technology & Engineering
Languages : en
Pages : 302

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Optical Characterization of Semiconductors

Optical Characterization of Semiconductors PDF Author: Sidney Perkowitz
Publisher: Elsevier
ISBN: 0080984274
Category : Technology & Engineering
Languages : en
Pages : 229

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Book Description
This is the first book to explain, illustrate, and compare the most widely used methods in optics: photoluminescence, infrared spectroscopy, and Raman scattering. Written with non-experts in mind, the book develops the background needed to understand the why and how of each technique, but does not require special knowledge of semiconductors or optics. Each method is illustrated with numerous case studies. Practical information drawn from the authors experience is given to help establish optical facilities, including commercial sources for equipment, and experimental details. For industrial scientists with specific problems in semiconducting materials; for academic scientists who wish to apply their spectroscopic methods to characterization problems; and for students in solid state physics, materials science and engineering, and semiconductor electronics and photonics, this book provides a unique overview, bringing together these valuable techniques in a coherent wayfor the first time. Discusses and compares infrared, Raman, and photoluminescence methods Enables readers to choose the best method for a given problem Illustrates applications to help non-experts and industrial users, with answers to selected common problems Presents fundamentals with examples from the semiconductor literature without excessive abstract discussion Features equipment lists and discussion of techniques to help establish characterization laboratories

Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing II

Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing II PDF Author: John Lowell
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 302

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Book Description


Semiconductor Material and Device Characterization

Semiconductor Material and Device Characterization PDF Author: Dieter K. Schroder
Publisher: Wiley-Interscience
ISBN: 9780471241393
Category : Technology & Engineering
Languages : en
Pages : 0

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Book Description
Semiconductor Material and Device Characterization is the only book on the market devoted to the characterization techniques used by the modern semiconductor industry to measure diverse semiconductor materials and devices. It covers the full range of electrical and optical characterization methods while thoroughly treating the more specialized chemical and physical techniques. This newly revamped and expanded Second Edition incorporates the many innovations that have come to dominate the field during the past decade. From scanning probe techniques to the detection of metallic impurities in silicon wafers to the use of microwave reflection to measure contactless resistivity, each chapter presents state-of-the-art tools and techniques, most of which were in their infancy or had not yet been developed when the previous edition first came out. Featured here are: * An entirely new chapter on reliability and probe microscopy * Numerous examples and end-of-chapter problems - new to this edition * Five hundred illustrations revised for this edition * Updated bibliography with over 1,200 references * Easy-to-use text including a real-world mix of units rather than strictly MKS units. This practical new edition is ideal for textbook adoptions at the graduate level and is destined to become an essential reference for research and development teams in the semiconductor industry.

Optical Characterization of Epitaxial Semiconductor Layers

Optical Characterization of Epitaxial Semiconductor Layers PDF Author: Günther Bauer
Publisher: Springer Science & Business Media
ISBN: 3642796788
Category : Technology & Engineering
Languages : en
Pages : 446

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Book Description
The characterization of epitaxial layers and their surfaces has benefitted a lot from the enormous progress of optical analysis techniques during the last decade. In particular, the dramatic improvement of the structural quality of semiconductor epilayers and heterostructures results to a great deal from the level of sophistication achieved with such analysis techniques. First of all, optical techniques are nondestructive and their sensitivity has been improved to such an extent that nowadays the epilayer analysis can be performed on layers with thicknesses on the atomic scale. Furthermore, the spatial and temporal resolution have been pushed to such limits that real time observation of surface processes during epitaxial growth is possible with techniques like reflectance difference spectroscopy. Of course, optical spectroscopies complement techniques based on the inter action of electrons with matter, but whereas the latter usually require high or ultrahigh vacuum conditions, the former ones can be applied in different environments as well. This advantage could turn out extremely important for a rather technological point of view, i.e. for the surveillance of modern semiconductor processes. Despite the large potential of techniques based on the interaction of electromagnetic waves with surfaces and epilayers, optical techniques are apparently moving only slowly into this area of technology. One reason for this might be that some prejudices still exist regarding their sensitivity.