Microwave Plasma-assisted CVD Polycrystalline Diamond Films Deposition at Higher Pressure Conditions PDF Download
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Author: Stanley Shengxi Zuo
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 670
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Book Description
Author: Stanley Shengxi Zuo
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 670
Get Book Here
Book Description
Author: Shih-Feng Chou
Publisher:
ISBN:
Category :
Languages : en
Pages : 174
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Book Description
Diamond thin films are deposited on silicon wafers by MPECVD process with the presence of methane, argon, and hydrogen gases. The reaction chamber is designed with an internal microwave reaction cavity and a high-pressure pocket for improving deposition conditions. Scanning electron microscopy reveals tetrahedral and cauliflower-shaped crystals for polycrystalline diamond and nanocrystalline diamond films, respectively. Spectroscopy ellipsometer studies indicate that diamond-like carbon (DLC) films are deposited with a thickness of 700 nm. Fourier transform infrared spectroscopy shows C-H stretching in the range from 2800 cm -1 to 3000 cm -1 . Nanoindentation is performed on DLC films with an average hardness of 10.98 GPa and an average elastic modulus of 90.32 GPa. The effects of chamber pressure, microwave forward power, and gas mixture on the plasma chemistry are discussed. Substrate temperature has a significant influence on film growth rate, and substrate pretreatment can enhance the quality of diamond films.
Author: Kadek Wardika Hemawan
Publisher:
ISBN:
Category : Cavity resonators
Languages : en
Pages : 710
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Author: Kuo-Ping Kuo
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 566
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Author: 村中廉
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Wen-Shin Huang
Publisher:
ISBN:
Category : Chemical vapor
Languages : en
Pages : 798
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Author: Jes Asmussen
Publisher: CRC Press
ISBN: 9780203910603
Category : Science
Languages : en
Pages : 692
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Book Description
The Diamond Films Handbook is an important source of information for readers involved in the new diamond film technology, emphasizing synthesis technologies and diamond film applications. Containing over 1600 references, drawings, photographs, micrographs, equations, and tables, and contributions by experts from both industry and academia, it inclu
Author: Koji Kobashi
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350
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Book Description
Discusses the most advanced techniques for diamond growth Assists diamond researchers in deciding on the most suitable process conditions Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Author: Dzung Tri Tran
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 314
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Author: Bohr-ran Huang
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 468
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Book Description
