Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Electron microscopy
Languages : en
Pages : 856
Book Description
Microscopy of Semiconducting Materials 1989 brings together both the invited and contributed papers from this conference. The main subject areas covered include: high resolution microscopy, microanalysis, epitaxial layers, quantum wells and superlattices, bulk GaAs, X-ray studies, dielectric structures, silicides and metal-semiconductor contacts, device studies and advanced scanning microscopy techniques. This volume provides an indispensable guide for researchers in physics, materials science, electronics and electrical engineering.
Microscopy of Semiconducting Materials 1989, Proceedings of the Royal Microscopical Society Conference Held at Oxford University, 10-13 April 1989
Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Electron microscopy
Languages : en
Pages : 856
Book Description
Microscopy of Semiconducting Materials 1989 brings together both the invited and contributed papers from this conference. The main subject areas covered include: high resolution microscopy, microanalysis, epitaxial layers, quantum wells and superlattices, bulk GaAs, X-ray studies, dielectric structures, silicides and metal-semiconductor contacts, device studies and advanced scanning microscopy techniques. This volume provides an indispensable guide for researchers in physics, materials science, electronics and electrical engineering.
Publisher: CRC Press
ISBN:
Category : Electron microscopy
Languages : en
Pages : 856
Book Description
Microscopy of Semiconducting Materials 1989 brings together both the invited and contributed papers from this conference. The main subject areas covered include: high resolution microscopy, microanalysis, epitaxial layers, quantum wells and superlattices, bulk GaAs, X-ray studies, dielectric structures, silicides and metal-semiconductor contacts, device studies and advanced scanning microscopy techniques. This volume provides an indispensable guide for researchers in physics, materials science, electronics and electrical engineering.
Sixth Oxford Conference on Microscopy of Semiconducting Materials
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 44
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 44
Book Description
Microscopy of Semiconducting Materials
Author: A.G Cullis
Publisher: CRC Press
ISBN: 9780750306508
Category : Technology & Engineering
Languages : en
Pages : 782
Book Description
With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigate semiconducting structures. It also covers specimen preparation using focused ion beam milling and advances in microscopy techniques using different types of scanning probes, such as AFM, STM, and SCM. In addition, the book discusses a range of materials, from finished devices to partly processed materials and structures, including nanoscale wires and dots. This volume provides an authoritative reference for all academics and researchers in materials science, electrical and electronic engineering and instrumentation, and condensed matter physics.
Publisher: CRC Press
ISBN: 9780750306508
Category : Technology & Engineering
Languages : en
Pages : 782
Book Description
With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigate semiconducting structures. It also covers specimen preparation using focused ion beam milling and advances in microscopy techniques using different types of scanning probes, such as AFM, STM, and SCM. In addition, the book discusses a range of materials, from finished devices to partly processed materials and structures, including nanoscale wires and dots. This volume provides an authoritative reference for all academics and researchers in materials science, electrical and electronic engineering and instrumentation, and condensed matter physics.
Microscopy of Semiconducting Materials 2001
Author: A.G. Cullis
Publisher: CRC Press
ISBN: 1351083074
Category : Science
Languages : en
Pages : 626
Book Description
The Institute of Physics Conference Series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists.
Publisher: CRC Press
ISBN: 1351083074
Category : Science
Languages : en
Pages : 626
Book Description
The Institute of Physics Conference Series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists.
Microscopy of Semiconducting Materials 1995, Proceedings of the Institute of Physics Conference Held at Oxford University, 20-23 March 1995
Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 824
Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 824
Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Microscopy of Semiconducting Materials 1997
Author: A.G Cullis
Publisher: CRC Press
ISBN: 9780750304641
Category : Technology & Engineering
Languages : en
Pages : 326
Book Description
This tenth volume in the series provides an overview of recent developments and current research activity including both invited review and summary research papers. Particular importance is attached at this meeting to papers addressing the centenary of the discovery of the electron. "MSM" has become the premier forum for dissemination of research results in this well established field, which is of continuing importance for the analysis of both reliable substrate materials, and as-grown devices in the whole range of semiconducting materials. It covers developments in analysis techniques across the whole range of microscopies. Also includes specimen preparation techniques.
Publisher: CRC Press
ISBN: 9780750304641
Category : Technology & Engineering
Languages : en
Pages : 326
Book Description
This tenth volume in the series provides an overview of recent developments and current research activity including both invited review and summary research papers. Particular importance is attached at this meeting to papers addressing the centenary of the discovery of the electron. "MSM" has become the premier forum for dissemination of research results in this well established field, which is of continuing importance for the analysis of both reliable substrate materials, and as-grown devices in the whole range of semiconducting materials. It covers developments in analysis techniques across the whole range of microscopies. Also includes specimen preparation techniques.
Microscopy of Semiconducting Materials 1995, Proceedings of the Institute of Physics Conference held at Oxford University, 20-23 March 1995
Author: A. G. Cullis
Publisher: CRC Press
ISBN: 9780750303477
Category : Art
Languages : en
Pages : 848
Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Publisher: CRC Press
ISBN: 9780750303477
Category : Art
Languages : en
Pages : 848
Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Microscopy of Semiconducting Materials 1993, Proceedings of the Royal Microscopical Society Conference Held at Oxford University, 5-8 April 1993 Oxford, UK
Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Science
Languages : en
Pages : 818
Book Description
These proceedings contain the invited and contributed papers from the international MSM conference and present the work of many leaders in the field. The papers provide information on the most up-to-date advances in semiconductor microscopy spanning both fundamental research areas and developments in device processing technologies. As the major forum for the presentation of worldwide research papers in this field, this volume will be essential reading for all researchers probing the characteristics of semiconducting materials.
Publisher: CRC Press
ISBN:
Category : Science
Languages : en
Pages : 818
Book Description
These proceedings contain the invited and contributed papers from the international MSM conference and present the work of many leaders in the field. The papers provide information on the most up-to-date advances in semiconductor microscopy spanning both fundamental research areas and developments in device processing technologies. As the major forum for the presentation of worldwide research papers in this field, this volume will be essential reading for all researchers probing the characteristics of semiconducting materials.
Sixth Oxford Conference on Microscopy of Semiconducting Materials
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Microscopy of Semiconducting Materials
Author: A.G. Cullis
Publisher: Springer Science & Business Media
ISBN: 3540319158
Category : Technology & Engineering
Languages : en
Pages : 543
Book Description
The 14th conference in the series focused on the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy. The latest developments in the use of other important microcharacterisation techniques were also covered and included the latest work using scanning probe microscopy and also X-ray topography and diffraction.
Publisher: Springer Science & Business Media
ISBN: 3540319158
Category : Technology & Engineering
Languages : en
Pages : 543
Book Description
The 14th conference in the series focused on the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy. The latest developments in the use of other important microcharacterisation techniques were also covered and included the latest work using scanning probe microscopy and also X-ray topography and diffraction.