Metal-organic chemical vapor deposition and characterization of semiconducting titanium dioxide

Metal-organic chemical vapor deposition and characterization of semiconducting titanium dioxide PDF Author: Jeffrey E. Bisberg
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Metal-organic chemical vapor deposition and characterization of semiconducting titanium dioxide

Metal-organic chemical vapor deposition and characterization of semiconducting titanium dioxide PDF Author: Jeffrey E. Bisberg
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films

Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films PDF Author: Polly Wanda Chu
Publisher:
ISBN:
Category :
Languages : en
Pages : 434

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Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.

Metalorganic Chemical Vapor Deposition of Titanium Dioxide and Strontium Titanate for Microelectronics Applications

Metalorganic Chemical Vapor Deposition of Titanium Dioxide and Strontium Titanate for Microelectronics Applications PDF Author: Kanchana Vydianathan
Publisher:
ISBN:
Category :
Languages : en
Pages : 450

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Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films

Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films PDF Author: David Christopher Gilmer
Publisher:
ISBN:
Category :
Languages : en
Pages : 314

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Characterization and Dispersition Behavior of Titanium Dioxide as Photocataytic Nanoparticles Using Metal Organic Chemical Vapour Deposition System

Characterization and Dispersition Behavior of Titanium Dioxide as Photocataytic Nanoparticles Using Metal Organic Chemical Vapour Deposition System PDF Author: Siti Hajar Othman
Publisher:
ISBN:
Category : Industrial application
Languages : en
Pages : 506

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Metalorganic Chemical Vapor Deposition and Characterization of TiO2 Nanoparticles

Metalorganic Chemical Vapor Deposition and Characterization of TiO2 Nanoparticles PDF Author: Weidong Li
Publisher:
ISBN:
Category : Nanoparticles
Languages : en
Pages : 276

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Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X-ray Photoelectron Spectroscopy

Metalorganic Chemical Vapor Deposition of Titanium Oxide Thin Films at Atmospheric Pressure with Analysis Via X-ray Photoelectron Spectroscopy PDF Author: Anuj K. Basil
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Comprehensive Semiconductor Science and Technology

Comprehensive Semiconductor Science and Technology PDF Author:
Publisher: Newnes
ISBN: 0080932282
Category : Science
Languages : en
Pages : 3572

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Book Description
Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Six Volume Set captures the breadth of this important field, and presents it in a single source to the large audience who study, make, and exploit semiconductors. Previous attempts at this achievement have been abbreviated, and have omitted important topics. Written and Edited by a truly international team of experts, this work delivers an objective yet cohesive global review of the semiconductor world. The work is divided into three sections. The first section is concerned with the fundamental physics of semiconductors, showing how the electronic features and the lattice dynamics change drastically when systems vary from bulk to a low-dimensional structure and further to a nanometer size. Throughout this section there is an emphasis on the full understanding of the underlying physics. The second section deals largely with the transformation of the conceptual framework of solid state physics into devices and systems which require the growth of extremely high purity, nearly defect-free bulk and epitaxial materials. The last section is devoted to exploitation of the knowledge described in the previous sections to highlight the spectrum of devices we see all around us. Provides a comprehensive global picture of the semiconductor world Each of the work's three sections presents a complete description of one aspect of the whole Written and Edited by a truly international team of experts

Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations

Low Pressure Metal Organic Chemical Vapor Deposition of Titanium Dioxide Thin Films in Conjunction with Photocatalytic Investigations PDF Author: Abon Jason Manuel del Rosario
Publisher:
ISBN:
Category :
Languages : en
Pages : 324

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Photocatalytic Semiconductors

Photocatalytic Semiconductors PDF Author: Aracely Hernández-Ramírez
Publisher: Springer
ISBN: 3319109995
Category : Science
Languages : en
Pages : 298

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Book Description
This critical volume examines the different methods used for the synthesis of a great number of photocatalysts, including TiO2, ZnO and other modified semiconductors, as well as characterization techniques used for determining the optical, structural and morphological properties of the semiconducting materials. Additionally, the authors discuss photoelectrochemical methods for determining the light activity of the photocatalytic semiconductors by means of measurement of properties such as band gap energy, flat band potential and kinetics of hole and electron transfer. Photocatalytic Semiconductors: Synthesis, Characterization and Environmental Applications provide an overview of the semiconductor materials from first- to third-generation photocatalysts and their applications in wastewater treatment and water disinfection. The book further presents economic and toxicological aspects in the production and application of photocatalytic materials.