Materials Issues and Modeling for Device Nanofabrication, Volume 584, Held November 29-December 2, 1999, Boston, Massachusetts, USA. PDF Download
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Languages : en
Pages : 0
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The exploding market of information technology requires ultra-high-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100 nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication including epitaxial growth, and their powerful modeling, can lead to more cost-effective strategies. This volume contains most of the papers that were presented during Symposium J, "Advanced Materials and Techniques for Nanolithography," and Symposium N, "Atomic Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography," at the 1999 MRS Fall Meeting in Boston, Massachusetts. Because of the complementary nature of the two subject matters, particularly in their applicability to device nanofabrication, it was felt that a combined proceedings volume offered the best way to present the findings in a unified and comprehensive manner. The editors trust that the reader will find here a nice overview of the state of the art, both theoretical and experimental, as well as an indication of the future trends and remaining challenges in this technologically important field.
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Languages : en
Pages : 0
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Book Description
The exploding market of information technology requires ultra-high-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100 nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication including epitaxial growth, and their powerful modeling, can lead to more cost-effective strategies. This volume contains most of the papers that were presented during Symposium J, "Advanced Materials and Techniques for Nanolithography," and Symposium N, "Atomic Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography," at the 1999 MRS Fall Meeting in Boston, Massachusetts. Because of the complementary nature of the two subject matters, particularly in their applicability to device nanofabrication, it was felt that a combined proceedings volume offered the best way to present the findings in a unified and comprehensive manner. The editors trust that the reader will find here a nice overview of the state of the art, both theoretical and experimental, as well as an indication of the future trends and remaining challenges in this technologically important field.
Author: Lhadi Merhari
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 368
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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Lhadi Merhari
Publisher: Cambridge University Press
ISBN: 9781107414174
Category : Technology & Engineering
Languages : en
Pages : 360
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Book Description
The exploding market of information technology requires ultrahigh-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic-scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication, including epitaxial growth and their powerful modeling, can lead to more cost-effective strategies. This book contains the proceedings of two symposia held at the 1999 MRS Fall Meeting in Boston that address these issues - Advanced Materials and Techniques for Nanolithography, and Atomic-Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography. The reader will find an overview of the state of the art, both theoretical and experimental in this technologically important field. Topics include: advanced techniques for sub-100nm resolution lithography and molecular electronics; epitaxial growth and morphology; novel concepts of resists for nanolithography; atomic-scale characterization and measurement; modeling and atomistic simulations; and nanodevices and nanostructures.
Author: Sridhar Komarneni
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ISBN:
Category : Technology & Engineering
Languages : en
Pages : 720
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Author: Mahmoud Omar Manasreh
Publisher:
ISBN:
Category : Infrared detectors
Languages : en
Pages : 568
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Author: Antonios Gonis
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 474
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Book Description
One of the goals of materials science is to design alloys with pre-specified desirable technological properties. To achieve this goal, it is necessary to have a thorough understanding of the fundamental mechanisms underlying materials behavior. In particular, one must understand the effects on alloy properties caused by intentional changes in concentration and how the combinations of temperature, time and uncontrollable foreign impurities affect microstructure. In addition to the equilibrium phase information contained in phase diagrams, nonequilibrium dynamic processes and metastable phases are known to be crucial in determining materials properties. This volume brings together researchers working on various aspects of nonequilibrium processes in materials to discuss current research issues and to provide guidelines for future work. Particular attention was paid to understanding particle nucleation and growth, both experimentally and theoretically, solid-state reactions, nanosystems, liquid-solid transformations, and solidification and amorphization. On the theoretical side, fundamental principles governing nucleation and growth, and related phenomena such as coarsening and Ostwald ripening, are discussed. Progress is also reported on the phase field method and on Monte Carlo simulations.
Author: David Norton
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 244
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Epitaxial growth has always been a marriage of convenience between film and substrate. More and more frequently, however, it is impractical to use the same material for both film and substrate because it is not available as large single crystals, it is prohibitively expensive, or its properties are ill-suited for the intended application. To meet these challenges, many strategies have been pursued to achieve highly oriented or single-crystal thin films via epitaxy. Crystalline films have been mechanically bonded to other materials to form composite substrates. Crystals have been cut and rewelded, patterned and regrown, buffer layered and repolished. Each strategy has met with fundamental challenges including lattice mismatch, chemical incompatibility, differences in thermal expansion, and structural dissimilarity. This book, first published in 2000, focuses on developments in novel substrate engineering which enable improved epitaxy. Topics include: biaxially textured substrates for high-Tc-coated conductors; surfaces for oxide epitaxy; wafer bonding and lift off; lattice mismatch engineering; substrate engineering and solid-phase recrystallization and epitaxy.
Author: Susan Ermer
Publisher:
ISBN: 9781558995062
Category : Technology & Engineering
Languages : en
Pages : 598
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Book Description
This volume, the fifth in a popular series, features papers related to the development and utilization of materials with novel electrical, optical or magnetic properties. The field has experienced tremendous growth in the past years, and this volume provides a forum for materials scientists, chemists, physicists and engineers to assess the progress. In particular, light-emitting materials for displays are showing great promise for widespread commercialization. Developments in molecular engineering and self assembly, as well as in conducting polymers, are enabling better performance and greater scientific understanding of the phenomena underlying these advances. Improvements in electro-optic, photorefractive and two-photon absorbing materials are also being realized and are addressed here.
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ISBN:
Category : Books
Languages : en
Pages : 1872
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Author: Panjian Li
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Category : Biomedical materials
Languages : en
Pages : 392
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