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Author: Eric Silkowski
Publisher:
ISBN: 9781423576570
Category : Gallium nitride
Languages : en
Pages : 330
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Book Description
Luminescence and absorption measurements were used to demonstrate the efficacy of ion implantation for introducing various classes of dopants into GaN. A wide range of implantation and annealing studies were performed with several dopant species (Ar, Zn, C, O, Si, Be, Mg, Nd, Er). Room temperature ion implantation was performed on MOCVD- and MBE-grown GaN samples at energies between 100 and 1150 keV with doses ranging from 1 x 10(exp 13) to 1 x 10 (exp 15)/sq cm. Conventional furnace annealing in flowing NH3 or N2 gas resulted in good implantation damage recovery at an annealing temperature of 1000 deg C for 90 min. Annealing temperature was found to be the determining factor in implantation damage recovery. It was discovered that surface degradation occurred for annealing in an NH3 environment at temperatures above 1000 deg C. An optimal annealing temperature of 1000 deg C and an optimal annealing gas environment of NH3 were found for the optical activation of Zn, Mg, Er, and Nd. Several new luminescence features were observed for the various dopants. Zn- implanted GaN was found to have a strong luminescence peak in the blue at 2.86 eV. The energetic location and width of this luminescence peak was insensitive to temperature changes and excitation intensity changes. These properties suggested that an internal Zn center transition was responsible.
Author: Eric Silkowski
Publisher:
ISBN: 9781423576570
Category : Gallium nitride
Languages : en
Pages : 330
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Book Description
Luminescence and absorption measurements were used to demonstrate the efficacy of ion implantation for introducing various classes of dopants into GaN. A wide range of implantation and annealing studies were performed with several dopant species (Ar, Zn, C, O, Si, Be, Mg, Nd, Er). Room temperature ion implantation was performed on MOCVD- and MBE-grown GaN samples at energies between 100 and 1150 keV with doses ranging from 1 x 10(exp 13) to 1 x 10 (exp 15)/sq cm. Conventional furnace annealing in flowing NH3 or N2 gas resulted in good implantation damage recovery at an annealing temperature of 1000 deg C for 90 min. Annealing temperature was found to be the determining factor in implantation damage recovery. It was discovered that surface degradation occurred for annealing in an NH3 environment at temperatures above 1000 deg C. An optimal annealing temperature of 1000 deg C and an optimal annealing gas environment of NH3 were found for the optical activation of Zn, Mg, Er, and Nd. Several new luminescence features were observed for the various dopants. Zn- implanted GaN was found to have a strong luminescence peak in the blue at 2.86 eV. The energetic location and width of this luminescence peak was insensitive to temperature changes and excitation intensity changes. These properties suggested that an internal Zn center transition was responsible.
Author: Erin N. Claunch
Publisher:
ISBN: 9781423548287
Category : Aluminum nitride
Languages : en
Pages : 63
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Book Description
Recently, research on the wide bandgap semiconductors such as GaN and Al(x)Ga(1-x)N became very popular for their applications on various devices. Therefore comprehensive and systematic luminescence studies of Si implanted Al(x)Ga(1-x)N, Mg doped GaN, and Si+N implanted GaN grown on sapphire substrates by molecular beam epitaxial method have been made as a function of ion dose and anneal temperature.
Author: James A. Fellows
Publisher:
ISBN: 9781423526537
Category : Ion implantation
Languages : en
Pages : 221
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Book Description
A comprehensive and systematic electrical activation study of Si- implanted GaN was performed as a function of ion implantation dose, anneal temperature, and implantation temperature. Additionally, Mg-implanted GaN was also investigated. Temperature-dependent Hall effect measurements and photoluminescence (PL) spectra were used to characterize the samples. GaN wafers capped with AlN were implanted with Si ions at doses ranging from 1x1013 to 5x1015 cm-2 and annealed from 1050 to 1350 oC. The optimum anneal temperature for samples implanted with the higher Si doses is around 1350 oC, exhibiting nearly 100% electrical activation efficiency. Exceptional mobilities and carrier concentrations were obtained on all Si-implanted samples. PL spectra revealed nearly complete implantation damage recovery as well as the nature of the yellow luminescence plaguing nearly all Si-doped GaN. Additionally, GaN wafers were implanted with Mg and various coimplants and annealed from 1100 to 1350 oC. All of the Mg-implanted and most of the Mg-coimplanted GaN samples became extremely resistive, and did not show definite p-type conductivity even after annealing at 1350 oC, remaining highly resistive even at a sample temperature as high as 800 K. A dominant 2.36 eV green luminescence band observed in the PL spectra of all Mg-implanted samples is attributed to a Mg-related deep complex DAP transition. The inefficient electrical activation of Mg acceptors implanted into GaN is attributed to these Mg-related deep complexes.
Author: Manuel V. Key
Publisher:
ISBN:
Category :
Languages : en
Pages : 84
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Book Description
The 5 deg photoluminescence (PL) from 1.55 eV to 1.36 eV of semi-insulating bulk GaAs implanted with Si was observed, using the 488 nm line of an argon-ion laser. Implant dosages were 10 to the 12th power, 10 to the 13th power, 10 to the 14th power, and 10 to the 15th power ions/sq cm. Separate sets of samples were annealed at 750 deg C and 900 deg C. The virgin unannealed sample spectrum contained a shallow donor peak at 1.513 eV, a carbon donor-to-carbon acceptor peak at 1.490 eV, a possible carbon donor-to-zinc acceptor peak at 1.487 eV, and an optical phonon peak at 1.454 eV. The virgin annealed sample spectra included, additionally, a vacancy complex-to-silicon acceptor peak at 1.406 eV, a Ga vacancy complex peak at 1.358 eV and a phonon replica at 1.322 eV. The spectra of the implanted unannealed samples showed an increasing quenching of native peaks with increasing dosage, and included no new damage related peaks. The spectra of the implanted samples showed an increase in the native peaks due to annealing but not due to Si dosage increases. The increase in Si dosage caused an increase in low energy broad peaks. A temperature study (5 deg K to 77 deg K), and chemical etching depth resolved study of a sample implanated with 10 to the 15th power ions sq cm and annealed at 900 deg C showed two broads peaks: one near 1.38 eV and one near 1.42 eV. (Author).
Author: Abdul Majid
Publisher: LAP Lambert Academic Publishing
ISBN: 9783845474991
Category :
Languages : en
Pages : 168
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Book Description
A detailed and systematic study of ion implanted MOCVD grown wurtzite gallium nitride (GaN) and aluminum indium nitride (AlInN) is conducted. As-grown samples were characterized using XRD and Hall measurements to check the structural and electrical properties of the samples. Neon (Ne), manganese (Mn) and cerium (Ce) ions were implanted into the materials with different doses in ranges 1014 9x1015, 1014 5x1016 and 3x1014 2x1015cm-2 respectively. Using rapid thermal annealing (RTA) furnace implanted GaN samples were annealed at 800, 850, 900 and 1000oC and implanted AlInN samples were annealed at 750 and 850 oC for lattice recovery and activation of the dopants. Structural and optical characterizations were made using Rutherford backscattering spectroscopy (RBS), X-Ray diffraction (XRD), Photoluminescence (PL), Optical transmission and Raman scattering spectroscopy. Moreover, magnetic characterization of Mn and Ce implanted samples was also carried out with vibrating sample magnetometer (VSM) and superconducting quantum interference device (SQUID)."
Author: F. A. Ponce
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1008
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Book Description
This book reflects the excitement in the scientific community about III-V nitrides. Based on papers presented at the First International Symposium on Gallium Nitride and Related Materials (ISGN-1), it reveals the large amount of work that has taken place since the field exploded with the announcement of commercial blue-light-emitting devices. The compound semiconductors in the III-V nitride systems are of increasing interest for high-performance optoelectronic and electronic device applications. These wide-bandgap semiconductor materials are also of great fundamental scientific interest because of their unique structural, electrical and optical properties. From the advances in the technologies for the heteroepitaxial growth of these materials, leading to improved quality and device performance, it is expected that III-V nitrides will soon be of significant practical and commercial interest. Topics include: crystal growth - substrates and early stages; molecular beam growth techniques; chemical vapor phase and alloys and novel growth techniques; structural properties; electronic properties; optical properties; point defects; hydrogen, etching and other materials processes; surfaces and metal contacts and devices.
Author: Walter M. Gibson
Publisher:
ISBN:
Category : Language Arts & Disciplines
Languages : en
Pages : 726
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Book Description
Author:
Publisher: Academic Press
ISBN: 0080864554
Category : Science
Languages : en
Pages : 509
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Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded.Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Author: Daniel L. DeForest
Publisher:
ISBN:
Category :
Languages : en
Pages : 76
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Book Description
Depth resolved photoluminescence and cathodoluminescence data were obtained from gallium arsenide implanted with 120 keV silicon ions. The luminescence data were studied as a function of depth in an effort to determine the implant damage profile of the silicon in GaAs. A chemical etchant was used to etch off successive layers of the crystal surface. The substrate material used for this study was bulk GaAs, grown by the Liquid-Encapsulated Czochralski (LEC) method. (Author).
Author: R D. Metcalfe
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
