Low-Temperature Silicon Thin Films for Large-Area Electronics: Device Fabrication Using Soft Lithography and Laser-Crystallization by Sequential Lateral Solidification PDF Download
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Languages : en
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Author: Hyun-Chul Jin
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Languages : en
Pages : 218
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Languages : en
Pages : 0
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This report describes new excimer-laser crystallization (ELC) techniques for producing high-quality Si films for AMLCD applications. These artificially controlled super-lateral growth (ACSLG) processes deliver crystalline silicon films with microstructures optimized for thin-film transistor applications. The ACSLG methods described herein include: (1) a low-temperature method for producing grain-boundary-location-controlled (GLC) Si films on glass substrates, (2) a high-temperature method for producing single-crystal islands (SCI) on quartz substrates, (3) a realistic two-dimensional program for simulation of ELC, and (4) low-temperature sequential lateral solidification of Si films. Preliminary TFT devices have yielded near-record performance characteristics and demonstrate that the ACSLG materials are superior to existing materials for fabrication of TFTs. The sequential lateral solidification (SLS) process possesses two characteristics not found in any other technique: (1) it can produce the best material (single-crystal silicon films) for TFT devices, and (2) it does so directly on low-cost, low-temperature substrates. The impact of the SLS process will be to create a new materials/device technology: low-temperature single-crystal silicon TFTs, which will: (1) displace conventional low- and high-temperature polycrystalline silicon TFT technology; (2) eliminate the need to utilize silicon-on-insulator (SOI) processes; and (3) ultimately enable the realization of highly integrated AMLCDs and system-on-glass products.
Author: B. Equer
Publisher: Elsevier Science Limited
ISBN: 9780080436074
Category : Technology & Engineering
Languages : en
Pages : 277
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The symposium brought together more than a hundred attendees from many countries including a significant participation from Japan and other East-Asia countries. Many of the trends observed in the 1st Symposium held in 1996 were confirmed: displays are indeed the main application in LAE (photovoltaics were not included in the topics of this symposium) and active matrix display (AMLCD) is still the leading technology. Future AMLCDs integrating the display drivers onto the same substrate require much faster thin-film transistors (TFTs) than those used for LCD addressing, therefore putting a strong demand on polysilicon performances. As a consequence the quest for an improved low temperature, large area (and low cost) polysilicon process is intensive and the competitors, including direct plasma deposition and excimer laser crystallization of amorphous layers, are reporting significant steps forward. With the tremendous demand for efficient colour flat panel displays, other display technologies are gaining interest. Field emission display (FED) is one of them. FEDs based on amorphous tetrahedral carbon thin-films are stimulating intensive studies on the optoelectronic properties of this complex material. Large area pixellized sensors for x-ray radiography and document scanning is another field of application in LAE which has recently reached initial production. Using a TFT or diode pixel addressing similar to AMLCD, this kind of device benefits from most of the AMLCD technology. However these devices present an increased complexity and stringent specifications on noise which in turn means materials with improved electronic transport properties. Finally, LAE is a fast developing area in thin-film research and technology. Initially an all-silicon domain, it now involves a large range of thin-film semiconductors and dielectrics, whose properties need to be fully understood and for which flexible and efficient processes have still to be developed.
Author: P. Joshi
Publisher: The Electrochemical Society
ISBN: 1566777259
Category : Science
Languages : en
Pages : 63
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The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Novel Plasma Techniques for Low Temperature Processing of Thin Films for Flexible Electronics¿, held during the 215th meeting of The Electrochemical Society, in San Francisco, California from May 24 to 29, 2009.
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Category : Dissertation abstracts
Languages : en
Pages : 776
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Author: Vijay Narayanan
Publisher: World Scientific
ISBN: 9814740497
Category : Technology & Engineering
Languages : en
Pages : 550
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Book Description
This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted.
Author: Kasturi Chopra
Publisher: Springer Science & Business Media
ISBN: 1461336821
Category : Science
Languages : en
Pages : 305
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Book Description
Two-dimensional materials created ab initio by the process of condensation of atoms, molecules, or ions, called thin films, have unique properties significantly different from the corresponding bulk materials as a result of their physical dimensions, geometry, nonequilibrium microstructure, and metallurgy. Further, these characteristic features of thin films can be drasti cally modified and tailored to obtain the desired and required physical characteristics. These features form the basis of development of a host of extraordinary active and passive thin film device applications in the last two decades. On the one extreme, these applications are in the submicron dimensions in such areas as very large scale integration (VLSI), Josephson junction quantum interference devices, magnetic bubbles, and integrated optics. On the other extreme, large-area thin films are being used as selective coatings for solar thermal conversion, solar cells for photovoltaic conver sion, and protection and passivating layers. Indeed, one would be hard pressed to find many sophisticated modern optical and electronic devices which do not use thin films in one way or the other. With the impetus provided by industrial applications, the science and technology of thin films have undergone revolutionary development and even today continue to be recognized globally as frontier areas of RID work. Major technical developments in any field of science and technology are invariably accompanied by an explosion of published literature in the form of scientific publications, reviews, and books.
Author: Daniel J. Ehrlich
Publisher: Elsevier
ISBN: 0080918026
Category : Technology & Engineering
Languages : en
Pages : 602
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Book Description
This book reviews the solid core of fundamental scientific knowledge on laser-stimulated surface chemistry that has accumulated over the past few years. It provides a useful overview for the student and interested non-expert as well as essential reference data (photodissociation cross sections, thermochemical constants, etc.) for the active researcher.
Author: Klaus Wetzig
Publisher: John Wiley & Sons
ISBN: 3527606475
Category : Science
Languages : en
Pages : 388
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Book Description
This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.
