Advancing Silicon Carbide Electronics Technology I

Advancing Silicon Carbide Electronics Technology I PDF Author: Konstantinos Zekentes
Publisher: Materials Research Forum LLC
ISBN: 1945291842
Category : Technology & Engineering
Languages : en
Pages : 249

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Book Description
The rapidly advancing Silicon Carbide technology has a great potential in high temperature and high frequency electronics. High thermal stability and outstanding chemical inertness make SiC an excellent material for high-power, low-loss semiconductor devices. The present volume presents the state of the art of SiC device fabrication and characterization. Topics covered include: SiC surface cleaning and etching techniques; electrical characterization methods and processing of ohmic contacts to silicon carbide; analysis of contact resistivity dependence on material properties; limitations and accuracy of contact resistivity measurements; ohmic contact fabrication and test structure design; overview of different metallization schemes and processing technologies; thermal stability of ohmic contacts to SiC, their protection and compatibility with device processing; Schottky contacts to SiC; Schottky barrier formation; Schottky barrier inhomogeneity in SiC materials; technology and design of 4H-SiC Schottky and Junction Barrier Schottky diodes; Si/SiC heterojunction diodes; applications of SiC Schottky diodes in power electronics and temperature/light sensors; high power SiC unipolar and bipolar switching devices; different types of SiC devices including material and technology constraints on device performance; applications in the area of metal contacts to silicon carbide; status and prospects of SiC power devices.

Advancing Silicon Carbide Electronics Technology I

Advancing Silicon Carbide Electronics Technology I PDF Author: Konstantinos Zekentes
Publisher: Materials Research Forum LLC
ISBN: 1945291842
Category : Technology & Engineering
Languages : en
Pages : 249

Get Book Here

Book Description
The rapidly advancing Silicon Carbide technology has a great potential in high temperature and high frequency electronics. High thermal stability and outstanding chemical inertness make SiC an excellent material for high-power, low-loss semiconductor devices. The present volume presents the state of the art of SiC device fabrication and characterization. Topics covered include: SiC surface cleaning and etching techniques; electrical characterization methods and processing of ohmic contacts to silicon carbide; analysis of contact resistivity dependence on material properties; limitations and accuracy of contact resistivity measurements; ohmic contact fabrication and test structure design; overview of different metallization schemes and processing technologies; thermal stability of ohmic contacts to SiC, their protection and compatibility with device processing; Schottky contacts to SiC; Schottky barrier formation; Schottky barrier inhomogeneity in SiC materials; technology and design of 4H-SiC Schottky and Junction Barrier Schottky diodes; Si/SiC heterojunction diodes; applications of SiC Schottky diodes in power electronics and temperature/light sensors; high power SiC unipolar and bipolar switching devices; different types of SiC devices including material and technology constraints on device performance; applications in the area of metal contacts to silicon carbide; status and prospects of SiC power devices.

Analysis of Low Pressure Chemical Vapor Deposition Processes

Analysis of Low Pressure Chemical Vapor Deposition Processes PDF Author: Karl Frederick Roenigk
Publisher:
ISBN:
Category :
Languages : en
Pages : 726

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Book Description


Low-temperature Silicon Sputter-deposition Epitaxy for 3-D Integrated Circuits

Low-temperature Silicon Sputter-deposition Epitaxy for 3-D Integrated Circuits PDF Author: Pailu Dennis Wang
Publisher:
ISBN:
Category :
Languages : en
Pages : 312

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Book Description


Proceedings of the Symposium on Reduced Temperature Processing for VLSI

Proceedings of the Symposium on Reduced Temperature Processing for VLSI PDF Author: Rafael Reif
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 634

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Book Description


Silicon Epitaxy

Silicon Epitaxy PDF Author:
Publisher: Elsevier
ISBN: 0080541003
Category : Science
Languages : en
Pages : 514

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Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition

Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition PDF Author: Yangchin Shih
Publisher:
ISBN:
Category :
Languages : en
Pages : 394

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Book Description


Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition PDF Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507

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Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Silicon Molecular Beam Epitaxy

Silicon Molecular Beam Epitaxy PDF Author: E. Kasper
Publisher: CRC Press
ISBN: 1351093525
Category : Technology & Engineering
Languages : en
Pages : 411

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Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.

Thin Film Solar Cells

Thin Film Solar Cells PDF Author: Jef Poortmans
Publisher: John Wiley & Sons
ISBN: 0470091266
Category : Science
Languages : en
Pages : 504

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Book Description
Thin-film solar cells are either emerging or about to emerge from the research laboratory to become commercially available devices finding practical various applications. Currently no textbook outlining the basic theoretical background, methods of fabrication and applications currently exist. Thus, this book aims to present for the first time an in-depth overview of this topic covering a broad range of thin-film solar cell technologies including both organic and inorganic materials, presented in a systematic fashion, by the scientific leaders in the respective domains. It covers a broad range of related topics, from physical principles to design, fabrication, characterization, and applications of novel photovoltaic devices.

Silicon Carbide Technology for Advanced Human Healthcare Applications

Silicon Carbide Technology for Advanced Human Healthcare Applications PDF Author: Stephen E. Saddow
Publisher: Elsevier
ISBN: 0323908268
Category : Technology & Engineering
Languages : en
Pages : 370

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Book Description
After over two decades of focused research and development, silicon carbide (SiC) is now ready for use in the healthcare sector and Silicon Carbide Technology for Advanced Human Healthcare Applications provides an up-to-date assessment of SiC devices for long-term human use. It explores a plethora of applications that SiC is uniquely positioned for in human healthcare, beginning with the three primary areas of technology which are closest to human trials and thus adoption in the healthcare industry: neural implants and spinal cord repair, graphene and biosensors, and finally deep tissue cancer therapy using SiC nanotechnology. Biomedical-inspired engineers, scientists, and healthcare professionals will find this book to be very useful in two ways: (I) as a guide to new ways to design and develop advanced medical devices and (II) as a reference for new developments in the field. The book's intent is to stimulate ideas for further technological enhancements and breakthroughs, which will provide alternative solutions for human healthcare applications. - Discusses the utilization of SiC materials for biomedical applications - Provides a logical pathway to understand why SiC is ideal for several critical applications, in particular for long-term implantable devices, and will serve as a guide to new ways to design and develop advanced medical devices - Serves as a reference for new developments in the field and as a technology resource for medical doctors and practitioners looking to identify and implement advanced engineering solutions to everyday medical challenges that currently lack long-term, cost-effective solutions