Chemical Vapor Deposition PDF Download
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Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
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Book Description
Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
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Book Description
Author: Daniel Dobkin
Publisher: Springer Science & Business Media
ISBN: 9781402012488
Category : Technology & Engineering
Languages : en
Pages : 298
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Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author: Jaime Andres Perez Taborda
Publisher: BoD – Books on Demand
ISBN: 1789848709
Category : Technology & Engineering
Languages : en
Pages : 288
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Book Description
The field of coatings and thin-film technologies is rapidly advancing to keep up with new uses for semiconductor, optical, tribological, thermoelectric, solar, security, and smart sensing applications, among others. In this sense, thin-film coatings and structures are increasingly sophisticated with more specific properties, new geometries, large areas, the use of heterogeneous materials and flexible and rigid coating substrates to produce thin-film structures with improved performance and properties in response to new challenges that the industry presents. This book aims to provide the reader with a complete overview of the current state of applications and developments in thin-film technology, discussing applications, health and safety in thin films, and presenting reviews and experimental results of recognized experts in the area of coatings and thin-film technologies.
Author: Masataka Higashiwaki
Publisher: Springer Nature
ISBN: 3030371530
Category : Technology & Engineering
Languages : en
Pages : 768
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Book Description
This book provides comprehensive coverage of the new wide-bandgap semiconductor gallium oxide (Ga2O3). Ga2O3 has been attracting much attention due to its excellent materials properties. It features an extremely large bandgap of greater than 4.5 eV and availability of large-size, high-quality native substrates produced from melt-grown bulk single crystals. Ga2O3 is thus a rising star among ultra-wide-bandgap semiconductors and represents a key emerging research field for the worldwide semiconductor community. Expert chapters cover physical properties, synthesis, and state-of-the-art applications, including materials properties, growth techniques of melt-grown bulk single crystals and epitaxial thin films, and many types of devices. The book is an essential resource for academic and industry readers who have an interest in, or plan to start, a new R&D project related to Ga2O3.
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566772549
Category : Science
Languages : en
Pages : 358
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Book Description
Author: Vasisht Venkatesh
Publisher: John Wiley & Sons
ISBN: 1119296110
Category : Technology & Engineering
Languages : en
Pages : 4024
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Book Description
This book contains the Proceedings of the 13th World Conference on Titanium.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1038
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Book Description
Author: Laura Mendicino
Publisher: The Electrochemical Society
ISBN: 9781566773379
Category : Science
Languages : en
Pages : 278
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Book Description
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
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Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 376
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Book Description
The main objective of this book is to: (1) provide a complete review of the structures and properties of refractory carbides and nitrides; (2) provide a thorough assessment of the technology, processing, and equipment and systems used in production and R&D, with emphasis on advanced designs; and (3) identify and describe the applications, particularly new and emerging areas.
