Author: Jagdish Narayan
Publisher: North Holland
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 800
Book Description
Laser-solid Interactions and Transient Thermal Processing of Materials
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Energy Research Abstracts
Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 1684
Book Description
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 1684
Book Description
Oriented Crystallization on Amorphous Substrates
Author: E.I. Givargizov
Publisher: Springer Science & Business Media
ISBN: 1489925600
Category : Technology & Engineering
Languages : en
Pages : 377
Book Description
Present-day scienceand technology have become increasingly based on studies and applications of thin films. This is especiallytrue of solid-state physics, semiconduc tor electronics, integrated optics, computer science, and the like. In these fields, it is necessary to use filmswith an ordered structure, especiallysingle-crystallinefilms, because physical phenomena and effects in such films are most reproducible. Also, active parts of semiconductor and other devices and circuits are created, as a rule, in single-crystal bodies. To date, single-crystallinefilms have been mainly epitaxial (or heteroepitaxial); i.e., they have been grown on a single-crystalline substrate, and principal trends, e.g., in the evolution of integrated circuits (lCs), have been based on continuing reduction in feature size and increase in the number of components per chip. However, as the size decreases into the submicrometer range, technological and physical limitations in integrated electronics become more and more severe. It is generally believed that a feature size of about 0.1um will have a crucial character. In other words, the present two-dimensional ICs are anticipated to reach their limit of minimization in the near future, and it is realized that further increase of packing density and/or functions might depend on three-dimensional integration. To solve the problem, techniques for preparation of single-crystalline films on arbitrary (including amorphous) substrates are essential.
Publisher: Springer Science & Business Media
ISBN: 1489925600
Category : Technology & Engineering
Languages : en
Pages : 377
Book Description
Present-day scienceand technology have become increasingly based on studies and applications of thin films. This is especiallytrue of solid-state physics, semiconduc tor electronics, integrated optics, computer science, and the like. In these fields, it is necessary to use filmswith an ordered structure, especiallysingle-crystallinefilms, because physical phenomena and effects in such films are most reproducible. Also, active parts of semiconductor and other devices and circuits are created, as a rule, in single-crystal bodies. To date, single-crystallinefilms have been mainly epitaxial (or heteroepitaxial); i.e., they have been grown on a single-crystalline substrate, and principal trends, e.g., in the evolution of integrated circuits (lCs), have been based on continuing reduction in feature size and increase in the number of components per chip. However, as the size decreases into the submicrometer range, technological and physical limitations in integrated electronics become more and more severe. It is generally believed that a feature size of about 0.1um will have a crucial character. In other words, the present two-dimensional ICs are anticipated to reach their limit of minimization in the near future, and it is realized that further increase of packing density and/or functions might depend on three-dimensional integration. To solve the problem, techniques for preparation of single-crystalline films on arbitrary (including amorphous) substrates are essential.
Laser Processing and Diagnostics
Author: D. Bäuerle
Publisher: Springer Science & Business Media
ISBN: 3642823815
Category : Science
Languages : en
Pages : 561
Book Description
Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromecha nics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly loca lized heat- and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking - within the surface of the material or within the molecules of the surrounding reactive atmosphere - simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates.
Publisher: Springer Science & Business Media
ISBN: 3642823815
Category : Science
Languages : en
Pages : 561
Book Description
Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromecha nics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly loca lized heat- and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking - within the surface of the material or within the molecules of the surrounding reactive atmosphere - simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates.
Rapid Thermal Processing of Semiconductors
Author: Victor E. Borisenko
Publisher: Springer Science & Business Media
ISBN: 1489918043
Category : Technology & Engineering
Languages : en
Pages : 374
Book Description
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Publisher: Springer Science & Business Media
ISBN: 1489918043
Category : Technology & Engineering
Languages : en
Pages : 374
Book Description
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Growth of Crystals
Author: E.I. Givargizov
Publisher: Springer Science & Business Media
ISBN: 146153660X
Category : Science
Languages : en
Pages : 213
Book Description
This volume, as the previous ones, consists primarily of review artic1es. However, it also contains a large quantity of original material on the growth of crystals and films. Priority is given to experimental work. Only two artic1es are concerned exc1usively with the theory of crystal growth. Theoretical aspects are treated in several others. This volume is divided into three parts. Part I, "Epitaxy and Transformations in Thin Films," stems from the current broad application of lasers and optical effects in general to crystal growth (in particular, the growth of thin films). The first three artic1es of the book are devoted to this topic. In particular, the laser pulse vaporization method, for which a comparatively slow deposition rate is typical (which should not always be viewed as a drawback), is distinguished by the unique kinetics of the initial growth stages. These are not entirely explained. However, this method is completely suitable for oriented or generally ordered growth of films under otherwise equal conditions. Another artic1e of this section is based on use of ultrashort (down to picosecond) laser pulses. It emphasizes the nonequilibrium processes of crystallization and decrystallization that are characteristic for such influences. In particular, material heated above its melting point and metastable states in the semiconductor melt exhibit these qualities.
Publisher: Springer Science & Business Media
ISBN: 146153660X
Category : Science
Languages : en
Pages : 213
Book Description
This volume, as the previous ones, consists primarily of review artic1es. However, it also contains a large quantity of original material on the growth of crystals and films. Priority is given to experimental work. Only two artic1es are concerned exc1usively with the theory of crystal growth. Theoretical aspects are treated in several others. This volume is divided into three parts. Part I, "Epitaxy and Transformations in Thin Films," stems from the current broad application of lasers and optical effects in general to crystal growth (in particular, the growth of thin films). The first three artic1es of the book are devoted to this topic. In particular, the laser pulse vaporization method, for which a comparatively slow deposition rate is typical (which should not always be viewed as a drawback), is distinguished by the unique kinetics of the initial growth stages. These are not entirely explained. However, this method is completely suitable for oriented or generally ordered growth of films under otherwise equal conditions. Another artic1e of this section is based on use of ultrashort (down to picosecond) laser pulses. It emphasizes the nonequilibrium processes of crystallization and decrystallization that are characteristic for such influences. In particular, material heated above its melting point and metastable states in the semiconductor melt exhibit these qualities.
Silicon-on-Insulator Technology: Materials to VLSI
Author: J.-P. Colinge
Publisher: Springer Science & Business Media
ISBN: 1441991069
Category : Technology & Engineering
Languages : en
Pages : 375
Book Description
Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis.
Publisher: Springer Science & Business Media
ISBN: 1441991069
Category : Technology & Engineering
Languages : en
Pages : 375
Book Description
Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis.
Semiconductors and Semimetals
Author:
Publisher: Academic Press
ISBN: 0080864074
Category : Technology & Engineering
Languages : en
Pages : 471
Book Description
Semiconductors and Semimetals
Publisher: Academic Press
ISBN: 0080864074
Category : Technology & Engineering
Languages : en
Pages : 471
Book Description
Semiconductors and Semimetals
Laser Science and Technology
Author: A.N. Chester
Publisher: Springer Science & Business Media
ISBN: 1475703783
Category : Science
Languages : en
Pages : 449
Book Description
The conference "Laser Science and Technology" was held May 11-19, 1987 in Erice, Sicily. This was the 12th conference organized by the Internatio nal School of Quantum Electronics, under the auspices of the "Ettore Majorana" Center for Scientific Culture. This volume contains both the in vited and contributed papers presented at the conference, covering current research work in two areas: new laser sources, and laser applications. The operation of the first laser by Dr. Theodore Maiman in 1960 initia ted a decade of scientific exploration of new laser sources. This was fol lowed by the decade of the 1970s, which was characterized by "technology push" in which the discoveries of the 1960s were seeking practical applica tion. In the 1980s we are instead seeking "applications pull," in which the success and rapid maturing of laser applications provides both inspiration and financial resources to stimulate additional work both on laser sources and applications. The papers presented in these Proceedings attest to the great vitali ty of research in both these areas: New Laser Sources. The papers describe current developments in ultra violet excimer lasers, X-ray lasers, and free electron lasers. These new lasers share several characteristics: each is a potentially important coher ent source; each is at a relatively short wavelength (below 1 micrometer); and each is receiving significant development attention today.
Publisher: Springer Science & Business Media
ISBN: 1475703783
Category : Science
Languages : en
Pages : 449
Book Description
The conference "Laser Science and Technology" was held May 11-19, 1987 in Erice, Sicily. This was the 12th conference organized by the Internatio nal School of Quantum Electronics, under the auspices of the "Ettore Majorana" Center for Scientific Culture. This volume contains both the in vited and contributed papers presented at the conference, covering current research work in two areas: new laser sources, and laser applications. The operation of the first laser by Dr. Theodore Maiman in 1960 initia ted a decade of scientific exploration of new laser sources. This was fol lowed by the decade of the 1970s, which was characterized by "technology push" in which the discoveries of the 1960s were seeking practical applica tion. In the 1980s we are instead seeking "applications pull," in which the success and rapid maturing of laser applications provides both inspiration and financial resources to stimulate additional work both on laser sources and applications. The papers presented in these Proceedings attest to the great vitali ty of research in both these areas: New Laser Sources. The papers describe current developments in ultra violet excimer lasers, X-ray lasers, and free electron lasers. These new lasers share several characteristics: each is a potentially important coher ent source; each is at a relatively short wavelength (below 1 micrometer); and each is receiving significant development attention today.
Chemical Processing with Lasers
Author: Dieter Bäuerle
Publisher: Springer Science & Business Media
ISBN: 3662025051
Category : Science
Languages : en
Pages : 253
Book Description
Materials processing with lasers is a rapidly expanding field which is increasingly captivating the attention of scientists, engineers and manufacturers alike. The aspect of most interest to scientists is provided by the basic interaction mechanisms between the intense light of a laser and materials exposed to a chemically reactive or nonreactive surrounding medium. Engineers and manufacturers see in the laser a new tool which will not only make manufacturing cheaper, faster, cleaner and more accurate but which also opens up entirely new technologies and manufacturing methods that are simply not available using existing techniques. Actual and potential applications range from laser machining to laser-induced materials transformation, coating, patterning, etc. , opening up the prospect of exciting new processing methods for micromechanics, metallurgy, integrated optics, semiconductor manufacture and chemical engineering. This book concentrates on the new and interdisciplinary field of 1 aser-i nduced chemicaZ process i ng of materi als. The techni que permits maskless single-step deposition of thin films of metals, semiconductors or insulators with lateral dimensions ranging from a few tenths of a micrometer up to several centimeters. Moreover, materials removal or synthesis, or surface modifications, such as oxidation, nitridation, reduction, metallization and doping, are also possible within similar dimensions. This book is meant as an introduction. It attempts to cater for the very broad range of specific interests which different groups of readers will have, and this thinking underlies the way in which the material has been arranged.
Publisher: Springer Science & Business Media
ISBN: 3662025051
Category : Science
Languages : en
Pages : 253
Book Description
Materials processing with lasers is a rapidly expanding field which is increasingly captivating the attention of scientists, engineers and manufacturers alike. The aspect of most interest to scientists is provided by the basic interaction mechanisms between the intense light of a laser and materials exposed to a chemically reactive or nonreactive surrounding medium. Engineers and manufacturers see in the laser a new tool which will not only make manufacturing cheaper, faster, cleaner and more accurate but which also opens up entirely new technologies and manufacturing methods that are simply not available using existing techniques. Actual and potential applications range from laser machining to laser-induced materials transformation, coating, patterning, etc. , opening up the prospect of exciting new processing methods for micromechanics, metallurgy, integrated optics, semiconductor manufacture and chemical engineering. This book concentrates on the new and interdisciplinary field of 1 aser-i nduced chemicaZ process i ng of materi als. The techni que permits maskless single-step deposition of thin films of metals, semiconductors or insulators with lateral dimensions ranging from a few tenths of a micrometer up to several centimeters. Moreover, materials removal or synthesis, or surface modifications, such as oxidation, nitridation, reduction, metallization and doping, are also possible within similar dimensions. This book is meant as an introduction. It attempts to cater for the very broad range of specific interests which different groups of readers will have, and this thinking underlies the way in which the material has been arranged.