Kinetic Monte Carlo Simulation of Gas Phase Nucleation of Particles During Chemical Vapor Deposition of Silicon

Kinetic Monte Carlo Simulation of Gas Phase Nucleation of Particles During Chemical Vapor Deposition of Silicon PDF Author: Xuegeng Li
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages :

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Kinetic Monte Carlo Simulation of Gas Phase Nucleation of Particles During Chemical Vapor Deposition of Silicon

Kinetic Monte Carlo Simulation of Gas Phase Nucleation of Particles During Chemical Vapor Deposition of Silicon PDF Author: Xuegeng Li
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages :

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Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV

Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV PDF Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566773195
Category : Science
Languages : en
Pages : 526

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Atomic-scale Kinetic Monte Carlo Simulations of Diamond Chemical Vapor Deposition

Atomic-scale Kinetic Monte Carlo Simulations of Diamond Chemical Vapor Deposition PDF Author: Corbett Chandler Battaile
Publisher:
ISBN:
Category :
Languages : en
Pages : 372

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How to Use the Monte Carlo Simulation Technique? Application

How to Use the Monte Carlo Simulation Technique? Application PDF Author: Fethi Khelfaoui
Publisher:
ISBN:
Category : Electronic books
Languages : en
Pages : 0

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Many physical phenomena can be modeled using Monte Carlo simulation (MCS) because it is a powerful tool to study thermodynamic properties. MCS can be used to simulate interactions between several particles or bodies in the presence of local or external fields. The main idea is to create a high number of different random configurations; statistics can be taken according to appropriate algorithms (Metropolis algorithm). In this chapter, we present basic techniques of MCS as the choice of potential, reaction rates, simulation cell, random configurations, and algorithms. We present some principal ideas of MCS used to study particle-particle collisions in the gas and in plasmas. Other MCS techniques are presented briefly. A numerical application is presented for collisions in gas phase during thin film deposition by plasma-enhanced chemical vapor deposition (PECVD) processes. Parameters and results of the simulation are studied according to a chosen reactor and mixture.

A Monte Carlo Simulation of Surface Kinetics During Plasma Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetraethoxysilane Chemistry

A Monte Carlo Simulation of Surface Kinetics During Plasma Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetraethoxysilane Chemistry PDF Author: Phillip J. Stout
Publisher:
ISBN:
Category :
Languages : en
Pages : 98

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Kinetic Monte Carlo Simulation of Chemical Vapor Deposition Growth of Thin Films

Kinetic Monte Carlo Simulation of Chemical Vapor Deposition Growth of Thin Films PDF Author: Martine Kalke
Publisher:
ISBN:
Category :
Languages : en
Pages : 212

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Directory of Graduate Research

Directory of Graduate Research PDF Author: American Chemical Society. Committee on Professional Training
Publisher:
ISBN:
Category : Biochemistry
Languages : en
Pages : 1932

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Faculties, publications and doctoral theses in departments or divisions of chemistry, chemical engineering, biochemistry and pharmaceutical and/or medicinal chemistry at universities in the United States and Canada.

Crystal Growth Bibliography

Crystal Growth Bibliography PDF Author:
Publisher: Springer Nature
ISBN: 1461596181
Category :
Languages : en
Pages : 270

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Monte Carlo Methods in Statistical Physics

Monte Carlo Methods in Statistical Physics PDF Author: Kurt Binder
Publisher: Springer Science & Business Media
ISBN: 3642828035
Category : Science
Languages : en
Pages : 425

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Book Description
In the seven years since this volume first appeared. there has been an enormous expansion of the range of problems to which Monte Carlo computer simulation methods have been applied. This fact has already led to the addition of a companion volume ("Applications of the Monte Carlo Method in Statistical Physics", Topics in Current Physics. Vol . 36), edited in 1984, to this book. But the field continues to develop further; rapid progress is being made with respect to the implementation of Monte Carlo algorithms, the construction of special-purpose computers dedicated to exe cute Monte Carlo programs, and new methods to analyze the "data" generated by these programs. Brief descriptions of these and other developments, together with numerous addi tional references, are included in a new chapter , "Recent Trends in Monte Carlo Simulations" , which has been written for this second edition. Typographical correc tions have been made and fuller references given where appropriate, but otherwise the layout and contents of the other chapters are left unchanged. Thus this book, together with its companion volume mentioned above, gives a fairly complete and up to-date review of the field. It is hoped that the reduced price of this paperback edition will make it accessible to a wide range of scientists and students in the fields to which it is relevant: theoretical phYSics and physical chemistry , con densed-matter physics and materials science, computational physics and applied mathematics, etc.

International Aerospace Abstracts

International Aerospace Abstracts PDF Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 944

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