Investigation of the Characteristics of Ferroelectric Thin Films Deposited by Pulsed Laser Ablation PDF Download
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Category :
Languages : en
Pages : 13
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Ferroelectric thin films of barium strontium titanate (BSTO) have been deposited on bare and metallized substrates by the pulsed laser ablation method under different oxygen ambients (150 mT and 50 mT). Under an oxygen pressure of 150 mT, the film composition was similar to that of its ablation target composition, viz. Ba(0.6)Sr(0.4)TiO3. However, when the films were deposited under the lower oxygen pressure, x-ray diffraction studies showed the presence of a secondary phase. The electrical characteristics of the films were measured to examine the effect of the stoichiometry on the dielectric constant and tunability. jg.
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ISBN:
Category :
Languages : en
Pages : 13
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Book Description
Ferroelectric thin films of barium strontium titanate (BSTO) have been deposited on bare and metallized substrates by the pulsed laser ablation method under different oxygen ambients (150 mT and 50 mT). Under an oxygen pressure of 150 mT, the film composition was similar to that of its ablation target composition, viz. Ba(0.6)Sr(0.4)TiO3. However, when the films were deposited under the lower oxygen pressure, x-ray diffraction studies showed the presence of a secondary phase. The electrical characteristics of the films were measured to examine the effect of the stoichiometry on the dielectric constant and tunability. jg.
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 456
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Carlos Paz de Araujo
Publisher: Taylor & Francis US
ISBN: 9782884491976
Category : Science
Languages : en
Pages : 598
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Book Description
The impetus for the rapid development of thin film technology, relative to that of bulk materials, is its application to a variety of microelectronic products. Many of the characteristics of thin film ferroelectric materials are utilized in the development of these products - namely, their nonvolatile memory and piezoelectric, pyroelectric, and electro-optic properties. It is befitting, therefore, that the first of a set of three complementary books with the general title Integrated Ferroelectric Devices and Technologies focuses on the synthesis of thin film ferroelectric materials and their basic properties. Because it is a basic introduction to the chemistry, materials science, processing, and physics of the materials from which integrated ferroelectrics are made, newcomers to this field as well as veterans will find this book self-contained and invaluable in acquiring the diverse elements requisite to success in their work in this area. It is directed at electronic engineers and physicists as well as process and system engineers, ceramicists, and chemists involved in the research, design, development, manufacturing, and utilization of thin film ferroelectric materials.
Author:
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Category :
Languages : en
Pages :
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Thin film ferroelectricss are widely considered for tunable microwave applications, the reduced small dimensions leading to low tuning voltages. The incipient ferroelectric strontium titanate is an ideal solution for tunable microwave devices, particularly in conjunction with high temperature superconductors. It has no spontaneous polarisation yet possesses a large permittivity at low temperatures that is sensitive to an electric field bias with relatively low loss. For such applications it is essential to use a low loss substrate such as magnesium oxide. In general, thin films have less favourable dielectric properties compared with their bulk counterparts due to differences in microstructure. strontium titanate films on MgO substrate prove difficult to grow due to the high lattice mismatch and issues connected with chemical incompatibility at the film/substrate interface. It has been shown here that it is possible to engineer the growth mode of this system, altering the strain and the defect concentration. These are both known factors influencing the dielectric properties of thin films. Reflection high energy electron diffraction (RHEED) in combination with interval pulsed laser deposition (PLD) has been used to achieve a two dimensional, layer-by-layer growth mode. Crucial to this was the deposition of a unit-cell thick titanium dioxide buffer layer on the surface, the deposition of which was also controlled by RHEED. The growth mode and microstructure of films grown using standard PLD with and without the buffer layer and films grown by interval PLD with and without the buffer layer have been compared by analysis of the RHEED data and transmission electron microscopy. This is the first time layer-by-layer growth has been achieved in this highly-mismatched epitaxial systems. The results point the way towards control of defects in oxide thin films from which microstructure-property relationships may be more clearly determined.
Author: Bruce Tuttle
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 658
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Book Description
Papers from the fall 1994 symposium present research and developments from academia, government, organizations, and industry in ferroelectric thin films, organized in sections on characterization, layered structure ferroelectrics, photonic phenomena, process integration, dram thin film technology, solution deposition, and piezoelectric and IR thin film technology. Highlights include the first public technical disclosures of Y1 nonvolatile memory material. Annotation copyright by Book News, Inc., Portland, OR
Author:
Publisher:
ISBN:
Category : Ferroelectric thin films
Languages : en
Pages : 746
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Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 548
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Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754
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Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 456
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Book Description
Author: Angus I. Kingon
Publisher:
ISBN: 9781558991378
Category : Technology & Engineering
Languages : en
Pages : 616
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