Author: Peter A. Rosenthal
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 312
Book Description
Focuses on the rapidly developing field of sensor technology for process monitoring and control during the fabrication of advanced materials and structures. Of high interest among the 39 papers are sensor-driven, closed-loop control of the fabrication process and product-state monitoring. Among the processes considered are several forms of vapor deposition, molecular beam epitaxy, rapid thermal processing, reactive-ion and plasma etching, electron beam evaporation, and sputtering. Monitoring variable such as temperature, composition, and thickness are described for a range of materials including electronic and optical thin-films, particles, and nanostructures. Annotation copyrighted by Book News, Inc., Portland, OR
In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502
Author: Peter A. Rosenthal
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 312
Book Description
Focuses on the rapidly developing field of sensor technology for process monitoring and control during the fabrication of advanced materials and structures. Of high interest among the 39 papers are sensor-driven, closed-loop control of the fabrication process and product-state monitoring. Among the processes considered are several forms of vapor deposition, molecular beam epitaxy, rapid thermal processing, reactive-ion and plasma etching, electron beam evaporation, and sputtering. Monitoring variable such as temperature, composition, and thickness are described for a range of materials including electronic and optical thin-films, particles, and nanostructures. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 312
Book Description
Focuses on the rapidly developing field of sensor technology for process monitoring and control during the fabrication of advanced materials and structures. Of high interest among the 39 papers are sensor-driven, closed-loop control of the fabrication process and product-state monitoring. Among the processes considered are several forms of vapor deposition, molecular beam epitaxy, rapid thermal processing, reactive-ion and plasma etching, electron beam evaporation, and sputtering. Monitoring variable such as temperature, composition, and thickness are described for a range of materials including electronic and optical thin-films, particles, and nanostructures. Annotation copyrighted by Book News, Inc., Portland, OR
In Situ Characterization of Thin Film Growth
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
Chemical Aspects of Electronic Ceramics Processing: Volume 495
Author: Prashant N. Kumta
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 496
Book Description
Containing 65 papers from the symposium titled Chemical Aspects of Electronic Ceramics Processing held in November- December 1997 in Boston, the contents of this volume are divided into five sections: chemical vapor deposition of oxide ceramics; chemical vapor deposition of nonoxide ceramics; solution routes to ceramic materials; characterization and application of ceramic materials; and process characterization as a form of novel processing of ceramic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 496
Book Description
Containing 65 papers from the symposium titled Chemical Aspects of Electronic Ceramics Processing held in November- December 1997 in Boston, the contents of this volume are divided into five sections: chemical vapor deposition of oxide ceramics; chemical vapor deposition of nonoxide ceramics; solution routes to ceramic materials; characterization and application of ceramic materials; and process characterization as a form of novel processing of ceramic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Materials Science of the Cell: Volume 489
Author: B. Mulder
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 248
Book Description
The 34 papers investigate the processing routes and properties of the complex molecular and macromolecular structures that hold biological cells together, both to reveal some of the mysteries of cell function and to identify natural solutions for optimizing membranes that might be adapted for applications in materials science. They cover the mechanics of DNA; the cytoskeleton, semiflexible polymers, polyelectrolytes, and motor proteins; properties and models of membranes and their interactions with macromolecules; biomaterials; and cells and cellular processes. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 248
Book Description
The 34 papers investigate the processing routes and properties of the complex molecular and macromolecular structures that hold biological cells together, both to reveal some of the mysteries of cell function and to identify natural solutions for optimizing membranes that might be adapted for applications in materials science. They cover the mechanics of DNA; the cytoskeleton, semiflexible polymers, polyelectrolytes, and motor proteins; properties and models of membranes and their interactions with macromolecules; biomaterials; and cells and cellular processes. Annotation copyrighted by Book News, Inc., Portland, OR
Power Semiconductor Materials and Devices: Volume 483
Author: S. J. Pearton
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 478
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 478
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Thin-Film Structures for Photovoltaics: Volume 485
Author: Eric D. Jones
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Contains 49 papers from the December 1997 symposium. The contributions are organized into three sections devoted to silicon-, II-VI-, and III-V-based thin films, as well as a section on general thin films. A number of processes are dealt with, including VEST; ion-beam, plasma, laser, low temperature sputter, and metalorganic chemical vapor depositions; and various growth techniques. In addition, analysis and modeling methodologies are discussed. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Contains 49 papers from the December 1997 symposium. The contributions are organized into three sections devoted to silicon-, II-VI-, and III-V-based thin films, as well as a section on general thin films. A number of processes are dealt with, including VEST; ion-beam, plasma, laser, low temperature sputter, and metalorganic chemical vapor depositions; and various growth techniques. In addition, analysis and modeling methodologies are discussed. Annotation copyrighted by Book News, Inc., Portland, OR
Silicon Front-end Technology--materials Processing and Modelling
Author: Nicholas E. B. Cowern
Publisher:
ISBN:
Category : Semiconductor doping
Languages : en
Pages : 258
Book Description
Publisher:
ISBN:
Category : Semiconductor doping
Languages : en
Pages : 258
Book Description
Rapid Thermal and Integrated Processing
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 914
Book Description
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 914
Book Description
Materials Reliability in Microelectronics
Author:
Publisher:
ISBN:
Category : Microelectronics
Languages : en
Pages : 392
Book Description
Publisher:
ISBN:
Category : Microelectronics
Languages : en
Pages : 392
Book Description
Nanostructured Powders and Their Industrial Applications
Author: Gregory Beaucage
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Industrial and academic researchers describe their experience with synthesizing and using such powders as fumed silica, pyrolytic titania, precipitated silica, and less conventional species such as exfoliated clays. Of the 38 papers, the first four provide an overview and the rest focus on physical aspects, synthesis, and applications. Topics of invited papers include drying nano-size materials, synthesis by a room-temperature aerosol process, and gel mineralization as a model for bone formation. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Industrial and academic researchers describe their experience with synthesizing and using such powders as fumed silica, pyrolytic titania, precipitated silica, and less conventional species such as exfoliated clays. Of the 38 papers, the first four provide an overview and the rest focus on physical aspects, synthesis, and applications. Topics of invited papers include drying nano-size materials, synthesis by a room-temperature aerosol process, and gel mineralization as a model for bone formation. Annotation copyrighted by Book News, Inc., Portland, OR