Growth of Aluminum, Boron, And, Titanium Nitride Thin Films by Plasma-assisted Plused Laser Deposition PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Growth of Aluminum, Boron, And, Titanium Nitride Thin Films by Plasma-assisted Plused Laser Deposition PDF full book. Access full book title Growth of Aluminum, Boron, And, Titanium Nitride Thin Films by Plasma-assisted Plused Laser Deposition by Edward Poindexter. Download full books in PDF and EPUB format.
Author: Edward Poindexter
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 114
Get Book Here
Book Description
Author: Edward Poindexter
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 114
Get Book Here
Book Description
Author: Armando Luches
Publisher: Nova Science Publishers
ISBN: 9781611224207
Category : Boron nitride
Languages : en
Pages : 0
Get Book Here
Book Description
Pulsed laser deposition (PLD) is at present one of the most interesting technique for thin film deposition. In the PLD process a film is formed by ablating a solid target with energetic laser pulses and collecting the material of interest on a substrate placed a few cm from the target. According to its ability to carry the stoichiometry from the target to the substrate and to its relatively high growth rate (~0.1 nm/pulse), PLD is an attractive technique for compound thin film deposition. This technique offers the possibility of depositing thin films on room-temperature or low-temperature substrates, due to the high energy of the species forming the laser plasma plume expanding from the target to the substrate. This book reviews research on the depositon of c-BN films by using PLD, ion-assisted PLD and other laser-assisted procedures.
Author: Cynthia Kornegay Waters
Publisher:
ISBN:
Category : Aluminum nitride
Languages : en
Pages : 336
Get Book Here
Book Description
Investigates the hardnesses, elastic moduli, and fracture mechanic properties of aluminum nitride and titanium nitride thin film multilayers when deposited in various thicknesses on silicon. Utilized pulsed laser deposition to grow the thin films.
Author: Michael Robert Hilton
Publisher:
ISBN:
Category :
Languages : en
Pages : 430
Get Book Here
Book Description
Author: Scott F. Szymanski
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 234
Get Book Here
Book Description
Author: Çağla Özgit-Akgün
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659208232
Category :
Languages : en
Pages : 180
Get Book Here
Book Description
III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (>1000 C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature ( 200 C) plasma-assisted ALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures."
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 500
Get Book Here
Book Description
Author: Siwei Tang
Publisher:
ISBN:
Category :
Languages : en
Pages : 99
Get Book Here
Book Description
This thesis focuses on the preparation parameter and characterization of boron and boron nitride thin film. System is built composing of designing the geometry, substrate and target holder, pumping parts and plasma generated parts. Experiments with various conditions have been tried and the optimized condition is found for the film growth rate. Many ways of characterization includes: X-ray diffraction, Scanning electron microscopy, Raman spectroscopy, Fourier transform infrared spectroscopy have been tried to identify the material composition.
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1076
Get Book Here
Book Description
Author: Fan Qian
Publisher:
ISBN:
Category :
Languages : en
Pages : 194
Get Book Here
Book Description
