Growth and Characterisation of Al(Cr)N Thin Films by R.f. Plasma Assisted Pulsed Laser Deposition PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Growth and Characterisation of Al(Cr)N Thin Films by R.f. Plasma Assisted Pulsed Laser Deposition PDF full book. Access full book title Growth and Characterisation of Al(Cr)N Thin Films by R.f. Plasma Assisted Pulsed Laser Deposition by Brendan James Arnold. Download full books in PDF and EPUB format.
Author: Brendan James Arnold
Publisher:
ISBN:
Category :
Languages : en
Pages :
Get Book Here
Book Description
Author: Brendan James Arnold
Publisher:
ISBN:
Category :
Languages : en
Pages :
Get Book Here
Book Description
Author: Liviu Duta
Publisher: MDPI
ISBN: 3036510443
Category : Medical
Languages : en
Pages : 224
Get Book Here
Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.
Author: Çağla Özgit-Akgün
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659208232
Category :
Languages : en
Pages : 180
Get Book Here
Book Description
III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (>1000 C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature ( 200 C) plasma-assisted ALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures."
Author: Charbel Said Madi
Publisher:
ISBN:
Category :
Languages : en
Pages : 166
Get Book Here
Book Description
Remote Plasma Assisted Pulsed Laser Deposition (RPA-PLD) film growth differs fro m conventional PLD in that laser ablation is carried in a chemically activated o xygen background generated by a plasma source as opposed to deposition in ground state O2 molecules in reactive PLD. The aim of this thesis is to investigate th e use of RPA-PLD technique for the growth of chromium oxide thin films and in pa rticular the growth of the metastable half-metallic CrO2 phase. Films were grown on both Si (100) and TiO2 (100) substrates by KrF Excimer las er ablation of Cr2O3 and Cr targets. The effects of plasma power, activated oxyg en pressure, substrate temperature, as well as substrate and target composition on the bonding, microstructure and magnetic domains of the films were studied us ing Fourier Transform Infra-Red Spectroscopy (FTIR), Grazing Incidence X-Ray Dif fraction (GIXRD), Atomic Force Microscopy (AFM) and Magnetic Force Microscopy (M FM). The combination of the Pulsed Laser Deposition with an oxygen remote plasma so urce promoted the formation of the CrO2 phase. The effect of plasma source was s ignificant at high pressure: Films deposited at high O2 pressure (75 mTorr) reve aled the presence of the CrO3 phase (the stable CrOx phase at low temperatures) whereas, the use of activated oxygen pressure lead to the formation of the CrO2 phase. At low deposition temperatures, namely below 300?C, the films consisted of a mixture of several oxide phases with the occurrence of CrO2 features embedd ed in a pre-dominantly amorphous matrix. With increasing the temperature up to 4 50 oC, the structure of the films reverted to a polycrystalline Cr2O3 phase as i nferred from the appearance of the corresponding peaks in the XRD spectra and fr om the narrowing of the infra-red absorption bands. At activated oxygen pressure of less than 30 mTorr, the films were inert and no postdeposition oxidation was observed. The use of a higher activated oxygen pressure, however, resulted in p orous films exhibiting postdeposition oxidation and an increase of CrO2 amounts as inferred from the intensity increase of both the FTIR absorption bands and th e magnetic phase interaction in the MFM scans.
Author: Dongfang Yang
Publisher: BoD – Books on Demand
ISBN: 9535128116
Category : Technology & Engineering
Languages : en
Pages : 430
Get Book Here
Book Description
Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.
Author: Jermaine Maurice Bradley
Publisher:
ISBN:
Category : Pulsed laser deposition
Languages : en
Pages : 146
Get Book Here
Book Description
Investigates the structural and mechanical properties of pulsed laser deposited (PLD) titania (TiO2) thin films. Uses nano-indentation to determine the mechanical properties of the films as a function of the growth parameters.
Author: E. Fogarassy
Publisher: Newnes
ISBN: 0444596321
Category : Technology & Engineering
Languages : en
Pages : 943
Get Book Here
Book Description
This book contains the proceedings of the largest conference ever held on this subject. The strong interest in this field is largely due to the fact that both fundamental aspects of laser-surface interaction as well as applied techniques for thin film generation and patterning were treated in detail by experts from around the world.
Author: Gregory Edward Triplett
Publisher:
ISBN:
Category : Boron nitride
Languages : en
Pages : 112
Get Book Here
Book Description
Author: Christopher Scarfone
Publisher:
ISBN:
Category :
Languages : en
Pages : 208
Get Book Here
Book Description
Author: Anna Marie Widdowson
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Get Book Here
Book Description
