GRAVURE DU PHOSPHURE D'INDIUM INP EN PLASMA CH#4/H#2 POUR LES TECHNOLOGIES MICRO-ELECTRONIQUES

GRAVURE DU PHOSPHURE D'INDIUM INP EN PLASMA CH#4/H#2 POUR LES TECHNOLOGIES MICRO-ELECTRONIQUES PDF Author: YANNICK.. FEURPRIER
Publisher:
ISBN:
Category :
Languages : fr
Pages : 250

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Book Description
L'UTILISATION DE PLASMAS A BASE DE METHANE ET D'HYDROGENE S'EST IMPOSEE DEPUIS QUELQUES ANNEES POUR LES ETAPES DE GRAVURE DES TECHNOLOGIES DE FABRICATION DE COMPOSANTS MICRO ET OPTO-ELECTRONIQUES DE LA FILIERE INP. CE MEMOIRE DE THESE TRAITE DE LA GRAVURE DES MATERIAUX DE LA FILIERE INP PAR PLASMA CH#4/H#2 A PARTIR D'UNE APPROCHE EXPERIMENTALE FONDEE SUR L'ETUDE DE L'INTERACTION PLASMA-SURFACE. LA CARACTERISATION DU PLASMA CH#4/H#2 LORS DE LA GRAVURE DES SEMI-CONDUCTEURS INP, GAAS ET INGAAS A ETE REALISEE PAR SPECTROSCOPIE D'EMISSION OPTIQUE ET PAR SPECTROMETRIE DE MASSE. CES TECHNIQUES D'ANALYSE ONT ETE UTILISEES POUR LA DETECTION DES PRODUITS DE GRAVURE DES ELEMENTS III ET V ET DES ESPECES NEUTRES ACTIVES. LES ANALYSES DE SURFACE QUASI IN-SITU PAR SPECTROMETRIE DE PHOTOELECTRONS (XPS) ONT PERMIS DE CARACTERISER DE FACON TRES PRECISE L'ENDOMMAGEMENT DES SURFACES APRES GRAVURE. LE TRAITEMENT DES SPECTRES XPS A CONDUIT A LA DEFINITION D'UN MODELE DE REPRESENTATION DE LA COUCHE ANALYSEE. UNE BONNE CORRELATION ENTRE LE SUIVI DES PRODUITS DE GRAVURE, DES NEUTRES REACTIFS ET L'ANALYSE DE SURFACE PAR XPS A ETE OBTENUE. GRACE A CETTE APPROCHE EXPERIMENTALE, L'APPLICATION D'UN MODELE DE GRAVURE (MODELE DE GRAVURE DE MAYER ET BARKER) A PERMIS DE MONTRER LE ROLE DES NEUTRES REACTIFS ET DU BOMBARDEMENT IONIQUE DANS LE MECANISME DE GRAVURE DE L'INDIUM ET DU PHOSPHORE. L'EPAISSEUR DE LA COUCHE ENDOMMAGEE A ETE DETERMINEE POUR LES DIFFERENTES CONDITIONS DE GRAVURE ETUDIEES. EN DECHARGE DE TYPE RIE, UNE COMPARAISON DE LA GRAVURE DES SEMI-CONDUCTEURS INP, GAAS ET INGAAS A ETE EFFECTUEE. UNE ETUDE DE LA SELECTIVITE DE GRAVURE D'UNE COUCHE INP SUR UNE COUCHE INGAAS A CONDUIT A PROPOSER L'ADDITION D'OXYGENE EN FAIBLE QUANTITE AU MELANGE CH#4/H#2, PROCEDE QUI PEUT ETRE ENVISAGE POUR LA TECHNOLOGIE DE FABRICATION DU TBH INP/INGAAS. ENFIN, D'EXCELLENTS RESULTATS ONT ETE OBTENUS POUR LA GRAVURE DE INP A PARTIR D'UN MELANGE CH#4/H#2 AVEC UNE SOURCE DE PLASMA HAUTE DENSITE DE TYPE ICP. L'UTILISATION DE POLARISATION FAIBLE PERMET DE GRAVER INP AVEC DES VITESSES DE GRAVURE ASSEZ ELEVEES TOUT EN CONSERVANT UN TRES BON ETAT DE SURFACE. DES COUCHES ENDOMMAGEES INFERIEURES OU EGALES A 10 ANGSTROMS ONT ETE OBTENUES.

GRAVURE DU PHOSPHURE D'INDIUM INP EN PLASMA CH#4/H#2 POUR LES TECHNOLOGIES MICRO-ELECTRONIQUES

GRAVURE DU PHOSPHURE D'INDIUM INP EN PLASMA CH#4/H#2 POUR LES TECHNOLOGIES MICRO-ELECTRONIQUES PDF Author: YANNICK.. FEURPRIER
Publisher:
ISBN:
Category :
Languages : fr
Pages : 250

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Book Description
L'UTILISATION DE PLASMAS A BASE DE METHANE ET D'HYDROGENE S'EST IMPOSEE DEPUIS QUELQUES ANNEES POUR LES ETAPES DE GRAVURE DES TECHNOLOGIES DE FABRICATION DE COMPOSANTS MICRO ET OPTO-ELECTRONIQUES DE LA FILIERE INP. CE MEMOIRE DE THESE TRAITE DE LA GRAVURE DES MATERIAUX DE LA FILIERE INP PAR PLASMA CH#4/H#2 A PARTIR D'UNE APPROCHE EXPERIMENTALE FONDEE SUR L'ETUDE DE L'INTERACTION PLASMA-SURFACE. LA CARACTERISATION DU PLASMA CH#4/H#2 LORS DE LA GRAVURE DES SEMI-CONDUCTEURS INP, GAAS ET INGAAS A ETE REALISEE PAR SPECTROSCOPIE D'EMISSION OPTIQUE ET PAR SPECTROMETRIE DE MASSE. CES TECHNIQUES D'ANALYSE ONT ETE UTILISEES POUR LA DETECTION DES PRODUITS DE GRAVURE DES ELEMENTS III ET V ET DES ESPECES NEUTRES ACTIVES. LES ANALYSES DE SURFACE QUASI IN-SITU PAR SPECTROMETRIE DE PHOTOELECTRONS (XPS) ONT PERMIS DE CARACTERISER DE FACON TRES PRECISE L'ENDOMMAGEMENT DES SURFACES APRES GRAVURE. LE TRAITEMENT DES SPECTRES XPS A CONDUIT A LA DEFINITION D'UN MODELE DE REPRESENTATION DE LA COUCHE ANALYSEE. UNE BONNE CORRELATION ENTRE LE SUIVI DES PRODUITS DE GRAVURE, DES NEUTRES REACTIFS ET L'ANALYSE DE SURFACE PAR XPS A ETE OBTENUE. GRACE A CETTE APPROCHE EXPERIMENTALE, L'APPLICATION D'UN MODELE DE GRAVURE (MODELE DE GRAVURE DE MAYER ET BARKER) A PERMIS DE MONTRER LE ROLE DES NEUTRES REACTIFS ET DU BOMBARDEMENT IONIQUE DANS LE MECANISME DE GRAVURE DE L'INDIUM ET DU PHOSPHORE. L'EPAISSEUR DE LA COUCHE ENDOMMAGEE A ETE DETERMINEE POUR LES DIFFERENTES CONDITIONS DE GRAVURE ETUDIEES. EN DECHARGE DE TYPE RIE, UNE COMPARAISON DE LA GRAVURE DES SEMI-CONDUCTEURS INP, GAAS ET INGAAS A ETE EFFECTUEE. UNE ETUDE DE LA SELECTIVITE DE GRAVURE D'UNE COUCHE INP SUR UNE COUCHE INGAAS A CONDUIT A PROPOSER L'ADDITION D'OXYGENE EN FAIBLE QUANTITE AU MELANGE CH#4/H#2, PROCEDE QUI PEUT ETRE ENVISAGE POUR LA TECHNOLOGIE DE FABRICATION DU TBH INP/INGAAS. ENFIN, D'EXCELLENTS RESULTATS ONT ETE OBTENUS POUR LA GRAVURE DE INP A PARTIR D'UN MELANGE CH#4/H#2 AVEC UNE SOURCE DE PLASMA HAUTE DENSITE DE TYPE ICP. L'UTILISATION DE POLARISATION FAIBLE PERMET DE GRAVER INP AVEC DES VITESSES DE GRAVURE ASSEZ ELEVEES TOUT EN CONSERVANT UN TRES BON ETAT DE SURFACE. DES COUCHES ENDOMMAGEES INFERIEURES OU EGALES A 10 ANGSTROMS ONT ETE OBTENUES.

Gravure du phosphure d'indium en plasma haute densité CH4-H2

Gravure du phosphure d'indium en plasma haute densité CH4-H2 PDF Author: Lae͏̈titia Rolland
Publisher:
ISBN:
Category :
Languages : fr
Pages : 88

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Book Description


Molecular Beam Epitaxy

Molecular Beam Epitaxy PDF Author: John Wilfred Orton
Publisher:
ISBN: 0199695822
Category : Science
Languages : en
Pages : 529

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Book Description
The book is a history of Molecular Beam Epitaxy (MBE) as applied to the growth of semiconductor thin films (note that it does not cover the subject of metal thin films). It begins by examining the origins of MBE, first of all looking at the nature of molecular beams and considering their application to fundamental physics, to the development of nuclear magnetic resonance and to the invention of the microwave MASER. It shows how molecular beams of silane (SiH4) were used to study the nucleation of silicon films on a silicon substrate and how such studies were extended to compound semiconductors such as GaAs. From such surface studies in ultra-high vacuum the technique developed into a method of growing high quality single crystal films of a wide range of semiconductors. Comparing this with earlier evaporation methods of deposition and with other epitaxial deposition methods such as liquid phase and vapour phase epitaxy (LPE and VPE). The text describes the development of MBE machines from the early 'home-made' variety to that of commercial equipment and show how MBE was gradually refined to produce high quality films with atomic dimensions. This was much aided by the use of various in-situ surface analysis techniques, such as reflection high energy electron diffraction (RHEED) and mass spectrometry, a feature unique to MBE. It looks at various modified versions of the basic MBE process, then proceed to describe their application to the growth of so-called 'low-dimensional structures' (LDS) based on ultra-thin heterostructure films with thickness of order a few molecular monolayers. Further chapters cover the growth of a wide range of different compounds and describe their application to fundamental physics and to the fabrication of electronic and opto-electronic devices. The authors study the historical development of all these aspects and emphasise both the (often unexpected) manner of their discovery and development and the unique features which MBE brings to the growth of extremely complex structures with monolayer accuracy.

Colour Chemistry

Colour Chemistry PDF Author: Robert Christie
Publisher: Royal Society of Chemistry
ISBN: 1847550592
Category : Science
Languages : en
Pages : 218

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Book Description
This book provides an up-to-date insight into the chemistry behind the colour of the dyes and pigments that make our world so colourful. The impressive breadth of coverage starts with a dip into the history of colour science. Colour Chemistry then goes on to look at the structure and synthesis of the various dyes and pigments, along with their applications in the traditional areas of textiles, coatings and plastics, and also the ever-expanding range of "high-tech" applications. Also discussed are some of the environmental issues associated with the manufacture and use of colour. The broad and balanced coverage presented in this book makes it ideal for students and graduates. In addition, many specialists in industry or academia will also benefit from the overview of the subject that is provided.

ICREEC 2019

ICREEC 2019 PDF Author: Ahmed Belasri
Publisher: Springer Nature
ISBN: 9811554447
Category : Technology & Engineering
Languages : en
Pages : 659

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Book Description
This book highlights peer reviewed articles from the 1st International Conference on Renewable Energy and Energy Conversion, ICREEC 2019, held at Oran in Algeria. It presents recent advances, brings together researchers and professionals in the area and presents a platform to exchange ideas and establish opportunities for a sustainable future. Topics covered in this proceedings, but not limited to, are photovoltaic systems, bioenergy, laser and plasma technology, fluid and flow for energy, software for energy and impact of energy on the environment.

Anagram Solver

Anagram Solver PDF Author: Bloomsbury Publishing
Publisher: Bloomsbury Publishing
ISBN: 1408102579
Category : Games & Activities
Languages : en
Pages : 719

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Book Description
Anagram Solver is the essential guide to cracking all types of quiz and crossword featuring anagrams. Containing over 200,000 words and phrases, Anagram Solver includes plural noun forms, palindromes, idioms, first names and all parts of speech. Anagrams are grouped by the number of letters they contain with the letters set out in alphabetical order so that once the letters of an anagram are arranged alphabetically, finding the solution is as easy as locating the word in a dictionary.

Semiconductor Laser Fundamentals

Semiconductor Laser Fundamentals PDF Author: Toshiaki Suhara
Publisher: CRC Press
ISBN: 9780203020470
Category : Science
Languages : en
Pages : 330

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Book Description
Ranging from fundamental theoretical concepts to advanced device technologies, this reference/text explores the engineering, characteristics, and performance of specific semiconductor lasers. It defines key principles in electromagnetics, optoelectronics, and laser implementation for novel applications in optical communications, storage, processing

Ceramic Abstracts

Ceramic Abstracts PDF Author:
Publisher:
ISBN:
Category : Ceramics
Languages : en
Pages : 228

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Book Description


An Introduction To Plasmonics

An Introduction To Plasmonics PDF Author: Olivier Pluchery
Publisher: World Scientific
ISBN: 1800613415
Category : Science
Languages : en
Pages : 356

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Book Description
What is a plasmon? Is it a particle, like a photon or a wave? Plasmonics stands at the frontier of condensed matter physics, which is the world of electrons, optics and of photons. Plasmonics is one of the most active fields in nanophotonics. This book begins by exploring the concepts behind waves, and the electromagnetic description of light when it interacts with metals; it dedicates every chapter thereafter to all aspects of plasmonics. In particular, the surface plasmon polariton wave is explained in full detail, as well as the localized surface plasmon resonance of metallic nanoparticles. The active research area opened by plasmonics, as well as its applications, are also briefly explained, such as advanced biosensing, subwavelength waveguiding, quantum plasmonics, nanoparticle-based cancer therapies, optical nano-antenna and high-efficiency photovoltaic cells.The book is adapted for graduate students and places a special emphasis on providing complete explanations of the fundamental concepts of plasmonics. Further, each of these concepts is illustrated with examples drawn from the most recent scientific literature. Each chapter ends with a set of exercises that will help the reader revise the concepts and go deeper into the world of plasmonics. More than 70 exercises are included.

Carbon Nanotube Science

Carbon Nanotube Science PDF Author: Peter J. F. Harris
Publisher: Cambridge University Press
ISBN: 0521828953
Category : Science
Languages : en
Pages : 315

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Book Description
Provides coverage of all of the important aspects of carbon nanotube research, including synthesis, properties and potential applications.