Gas-source Molecular Beam Epitaxial Growth and Characterization of the (Al, In, Ga)NP/GaP Material System and Its Applications to Light-emitting Diodes

Gas-source Molecular Beam Epitaxial Growth and Characterization of the (Al, In, Ga)NP/GaP Material System and Its Applications to Light-emitting Diodes PDF Author: Vladimir Odnoblyudov
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Category :
Languages : en
Pages : 148

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Nitrogen incorporation into GaAs has received much attention in the last decade, because of its application to long-wavelength lasers. However, nitrogen incorporation into GaP (100) has not received much attention to date despite the promising application of this material system to yellow-amber-red light-emitting diodes. In order to investigate the not yet well-studied (Al, In, Ga)NP material system, we use gas-source molecular beam (MBE), in which nitrogen radicals are used as nitrogen precursor, to grow these mixed group-V alloy semiconductors with excellent crystallinity. This dissertation is divided into two major parts. In the first part we describe the growth and characterization of the (Al, In, Ga)NP material system. Optical and structural properties of GaNP bulk layers, AlGaNP bulk layers, and InGaNP quantum wells are studied. The dependence of the GaNP band gap vs. nitrogen concentration and temperature dependent PL are analyzed. For AlGaNP layers, using a thermodynamic approach we explain the difference between nitrogen incorporation into GaP and AlP. The dependence of the emission wavelength vs. nitrogen and indium compositions is studied for InGaNP QWs. The electron effective mass is determined for InGaNP materials with different indium concentration. The conduction and valence band offsets are calculated for the InGaNP/GaP heterojunction. In the second part, we describe LED chip fabrication and contacts optimization. development of n-type and p-type contacts is discussed. A description of LED chip processing optimization is given for a p-i-n diode structure. The band offsets are compared for (Al, In, Ga)NP-based LED structures and conventional AlInGaP-based LED structures; they are 2-3 times higher in LEDs based on the (Al, In, Ga)NP material system. Growth and fabrication results for bulk GaNP-based amber LEDs are discussed. Color stability (electroluminescence peak wavelength shift vs. current) is compared for GaNPbased LEDs and AlInGaP-based LEDs; the wavelength shift of (Al, In, Ga)NP-based LED chips is ~ 6 times less than that of AlInGaP-based LED chips, in the drive current range of 10 - 60 mA. The influence of In concentration in InGaNP QWs on EL properties of LED chips is reported. Single and multiple InGaNP QW-based LEDs are studied.

Gas-source Molecular Beam Epitaxial Growth and Characterization of the (Al, In, Ga)NP/GaP Material System and Its Applications to Light-emitting Diodes

Gas-source Molecular Beam Epitaxial Growth and Characterization of the (Al, In, Ga)NP/GaP Material System and Its Applications to Light-emitting Diodes PDF Author: Vladimir Odnoblyudov
Publisher:
ISBN:
Category :
Languages : en
Pages : 148

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Book Description
Nitrogen incorporation into GaAs has received much attention in the last decade, because of its application to long-wavelength lasers. However, nitrogen incorporation into GaP (100) has not received much attention to date despite the promising application of this material system to yellow-amber-red light-emitting diodes. In order to investigate the not yet well-studied (Al, In, Ga)NP material system, we use gas-source molecular beam (MBE), in which nitrogen radicals are used as nitrogen precursor, to grow these mixed group-V alloy semiconductors with excellent crystallinity. This dissertation is divided into two major parts. In the first part we describe the growth and characterization of the (Al, In, Ga)NP material system. Optical and structural properties of GaNP bulk layers, AlGaNP bulk layers, and InGaNP quantum wells are studied. The dependence of the GaNP band gap vs. nitrogen concentration and temperature dependent PL are analyzed. For AlGaNP layers, using a thermodynamic approach we explain the difference between nitrogen incorporation into GaP and AlP. The dependence of the emission wavelength vs. nitrogen and indium compositions is studied for InGaNP QWs. The electron effective mass is determined for InGaNP materials with different indium concentration. The conduction and valence band offsets are calculated for the InGaNP/GaP heterojunction. In the second part, we describe LED chip fabrication and contacts optimization. development of n-type and p-type contacts is discussed. A description of LED chip processing optimization is given for a p-i-n diode structure. The band offsets are compared for (Al, In, Ga)NP-based LED structures and conventional AlInGaP-based LED structures; they are 2-3 times higher in LEDs based on the (Al, In, Ga)NP material system. Growth and fabrication results for bulk GaNP-based amber LEDs are discussed. Color stability (electroluminescence peak wavelength shift vs. current) is compared for GaNPbased LEDs and AlInGaP-based LEDs; the wavelength shift of (Al, In, Ga)NP-based LED chips is ~ 6 times less than that of AlInGaP-based LED chips, in the drive current range of 10 - 60 mA. The influence of In concentration in InGaNP QWs on EL properties of LED chips is reported. Single and multiple InGaNP QW-based LEDs are studied.

Gas Source Molecular Beam Epitaxial Growth of GaN.

Gas Source Molecular Beam Epitaxial Growth of GaN. PDF Author:
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ISBN:
Category :
Languages : en
Pages : 34

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Aluminum gallium nitride (AlGaN) has long been recognized as a promising radiation hard optoelectronic material. AlGaN has a wide direct band gap and therefore has potential applications in the fabrication of short wave- length devices, e.g., detectors and light emitting diodes in the visible to ultraviolet region and its piezoelectric properties and high acoustic velocities make it attractive for acoustic devices. The technical objective in Phase I was to determine if low temperature sources based on covalently bonded Group III- nitrogen compounds could be used to prepare AlGaN films by gas source molecular beam epitaxy. The program required to investigate low temperature AlGaN source materials was separated into two parts, (1) the synthesis, purification, and pyrolysis of gallium-nitrogen adducts and aluminum-nitrogen adducts and (2) the growth of GaN by chemical beam epitaxy. We clearly demonstrated under CBE conditions GaNxCy films could be grown using compounds with preexisting Ga-N bonds whereas no films were formed using trimethylgallium. Dimethylgallium amide was shown to produce dramatically lower carbon content films in the presence ammonia than did trimethylgallium in the presence of ammonia.

Gas-source Molecular Beam Epitaxy of GaInNAs and Ga(In)NP for Electronic and Optoelectronic Device Applications

Gas-source Molecular Beam Epitaxy of GaInNAs and Ga(In)NP for Electronic and Optoelectronic Device Applications PDF Author: Huoping Xin
Publisher:
ISBN:
Category :
Languages : en
Pages : 350

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Dissertation Abstracts International

Dissertation Abstracts International PDF Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 902

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Chemical Abstracts

Chemical Abstracts PDF Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2668

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Novel Semi-conductor Material Systems

Novel Semi-conductor Material Systems PDF Author: Nader M. Elmarhoumi
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ISBN:
Category : Molecular beam epitaxy
Languages : en
Pages : 138

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Molecular Beam Epitaxial Growth and Characterization of GaAs/AlGaAs Thin Films and Multilayer Structures

Molecular Beam Epitaxial Growth and Characterization of GaAs/AlGaAs Thin Films and Multilayer Structures PDF Author: Yuh-Haw Wu
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ISBN:
Category : Gallium arsenide
Languages : en
Pages : 314

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Molecular Beam Epitaxial Growth and Characterization of Gallium Antimonide, and Its Use in GaSb/AlSb Heterostructures

Molecular Beam Epitaxial Growth and Characterization of Gallium Antimonide, and Its Use in GaSb/AlSb Heterostructures PDF Author: Seshadri Subbanna
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ISBN:
Category :
Languages : en
Pages : 276

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Gas Source Molecular Beam Epitaxy of Aluminum Gallium Indium Phosphide for Visible Spectrum Light Emitting Diodes

Gas Source Molecular Beam Epitaxy of Aluminum Gallium Indium Phosphide for Visible Spectrum Light Emitting Diodes PDF Author: James Nelson Baillargeon
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ISBN:
Category :
Languages : en
Pages : 252

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Book Description
Gas source molecular beam epitaxy is an advanced crystal growth technique that has been shown to be capable of producing high quality, ultra-thin semiconductor layers and interfaces, excellent dopant and thickness uniformity, and precisely controlled compositions in the aluminum gallium indium arsenide and indium phosphide material systems. This work extends this growth technique to the aluminum gallium indium phosphide material system and demonstrates that it is a potentially viable and attractive technique for producing visible optoelectronic devices. In this work, particular emphasis is placed upon the surface reflection high energy electron diffraction pattern and its relationship to the equilibrium vapor pressure of phosphorus along the Ga + P liquidus. The selective desorption during growth of the surface atoms and its importance to the overall chemical composition, and the accompanied effect on the crystalline quality and optical properties are also discussed. The luminescence properties of epitaxial GaP doped with nitrogen are investigated using cracked PH$sb3$ and NH$sb3$. Emphasis is placed on the species generated by the cracking process and that which is responsible for the substitutional incorporation of nitrogen onto the growth surface. In addition, the origin of the natural (111) ordering is discussed and the related energy band gap lowering data are presented. Data are also presented for the thermal and catalytic disassociation of arsine, phosphene and ammonia for various cracker designs. Finally, using the results obtained by extensive material characterization, data for some preliminary optical and electronic device structures are presented, which indicate that this growth technique has significant merit as applied to this material system.

Gas-source Molecular Beam Epitaxy Growth of GaN with a Nitrogen Radical Beam and Ammonia

Gas-source Molecular Beam Epitaxy Growth of GaN with a Nitrogen Radical Beam and Ammonia PDF Author: William Sam Wong
Publisher:
ISBN:
Category :
Languages : en
Pages : 314

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