Focused Electron Beam Induced Chemistry and Its Application in Microelectronics PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Focused Electron Beam Induced Chemistry and Its Application in Microelectronics PDF full book. Access full book title Focused Electron Beam Induced Chemistry and Its Application in Microelectronics by University of Cambridge. Download full books in PDF and EPUB format.
Author: University of Cambridge
Publisher:
ISBN:
Category :
Languages : en
Pages :
Get Book Here
Book Description
Author: University of Cambridge
Publisher:
ISBN:
Category :
Languages : en
Pages :
Get Book Here
Book Description
Author: George Brewer
Publisher: Elsevier
ISBN: 0323153410
Category : Technology & Engineering
Languages : en
Pages : 377
Get Book Here
Book Description
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Get Book Here
Book Description
The purpose of this research has been to investigate the mechanisms and develop techniques for electron beam induced chemistry. Applications for electron beam chemistry include repair and fabrication of lithographic masks, integrated circuit repair and rewiring, nanofabrication of functional nanoscale tools and scanned probe microscopy tips and damage free transmission electron microscope sample preparation. The use of hydrocarbon contamination as a precursor has been investigated and complex three dimensional nanostructures have been successfully fabricated. Accelerating voltage and scan speed can be used to control the morphology of the deposits. The development and implementation of an internal precursor reservoir and introduction device that is transferable to various scanning electron microscope and focused ion beam instruments has been performed. The effects of beam and scan parameters on the deposition efficiency of carbon structures utilizing a phenanthrene precursor has been investigated. Deposition efficiency is maximized for low beam current, large scan areas exposed for short times using the experimental conditions in this work. However, the use of a focused ion beam provides a significantly higher deposition efficiency (over 45 times) than that of an electron beam.
Author: Bo Cui
Publisher: BoD – Books on Demand
ISBN: 953307602X
Category : Science
Languages : en
Pages : 630
Get Book Here
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Ivo Utke
Publisher: OUP USA
ISBN: 0199734216
Category : Technology & Engineering
Languages : en
Pages : 830
Get Book Here
Book Description
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 696
Get Book Here
Book Description
Author: Zeng-qi Yu
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 504
Get Book Here
Book Description
Author: E.F. Krimmel
Publisher: Elsevier
ISBN: 0444596364
Category : Technology & Engineering
Languages : en
Pages : 744
Get Book Here
Book Description
This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author: EDFAS Desk Reference Committee
Publisher: ASM International
ISBN: 1615037268
Category : Technology & Engineering
Languages : en
Pages : 673
Get Book Here
Book Description
Includes bibliographical references and index.
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 600
Get Book Here
Book Description
Theses on any subject submitted by the academic libraries in the UK and Ireland.
