Field Guide to Optical Lithography PDF Download
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Author: Chris A. Mack
Publisher: Society of Photo Optical
ISBN: 9780819462077
Category : Technology & Engineering
Languages : en
Pages : 122
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Book Description
This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Author: Chris A. Mack
Publisher: Society of Photo Optical
ISBN: 9780819462077
Category : Technology & Engineering
Languages : en
Pages : 122
Get Book Here
Book Description
This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Author: Bernard C. Kress
Publisher:
ISBN: 9781628411843
Category : Diffraction gratings
Languages : en
Pages : 172
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Book Description
Traditional macro-optics can be designed without complex design software tools. However, digital optics, especially wafer-scale micro-optics, require specific software and tools. There is often no analytical solution, and thus complex iterative optimization algorithms may be required. This book covers refractive and diffractive micro-optics, the iterative optimization process, and modeling and fabrication techniques crucial to this field. The ability to create hybrid systems capable of producing analog and digital functionality is also addressed.
Author: Ray Williamson
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819486769
Category : Optical instruments
Languages : en
Pages : 0
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Book Description
Provides optical designers, shop managers, opticians, and purchasers a concise reference explaining what the designer needs to know before making final choices and how to specify the components before they are ordered. It presents how conventional fabrication proceeds for representative components, alternative and emerging methods to optical fabrication, product evaluation, and the calculations used.
Author: Paul F. McManamon
Publisher:
ISBN: 9781628416558
Category : Laser beams
Languages : en
Pages : 171
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Book Description
This Field Guide covers the various components and types of active electro-optical sensors - referred to as lidars in the text - from simple 2D direct-detection lidars to multiple subaperture synthetic aperture lidars. Other topics covered include receivers, apertures, atmospheric effects, and appropriate processing of different lidars. Lasers and modulation are presented in terms of their use in lidars. The lidar range equation in its many variations is discussed along with receiver noise issues that determine how much signal must be received to detect an object. This book is a handy reference to quickly look up any aspect of active electro-optical sensors. It will be useful to students, lidar scientists, or engineers needing an occasional reminder of the correct approaches or equations in certain applications, and systems engineers interested in gaining a perspective on this rapidly growing technology.
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
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Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446
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Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author: Burn Jeng Lin
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510639959
Category : Lasers
Languages : en
Pages : 0
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Book Description
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Author: P. Rai-Choudhury
Publisher: SPIE Press
ISBN: 9780819423795
Category : Technology & Engineering
Languages : en
Pages : 706
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Book Description
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author: Alfred Kwok-Kit Wong
Publisher: SPIE Press
ISBN: 9780819439956
Category : Science
Languages : en
Pages : 238
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Book Description
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Author: Jim Schwiegerling
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819456281
Category : Technology & Engineering
Languages : en
Pages : 109
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Book Description
Includes Proceedings Vols. 5631, 5636, 5637, 5642, 5643
