Author: Eric M. Panning
Publisher:
ISBN: 9781510607385
Category : Extreme ultraviolet lithography
Languages : en
Pages :
Book Description
Extreme Ultraviolet (EUV) Lithography VIII
Author: Eric M. Panning
Publisher:
ISBN: 9781510607385
Category : Extreme ultraviolet lithography
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9781510607385
Category : Extreme ultraviolet lithography
Languages : en
Pages :
Book Description
EUV Lithography
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Extreme Ultraviolet Lithography
Author: Harry J. Levinson
Publisher:
ISBN: 9781510639393
Category :
Languages : en
Pages : 245
Book Description
Publisher:
ISBN: 9781510639393
Category :
Languages : en
Pages : 245
Book Description
Extreme Ultraviolet (EUV) Lithography III.
Author:
Publisher:
ISBN: 9780819489784
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9780819489784
Category :
Languages : en
Pages :
Book Description
Extreme Ultraviolet (EUV) Lithography VII.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Extreme Ultraviolet (EUV) Lithography X
Author: Kenneth A. Goldberg
Publisher:
ISBN: 9781510625617
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9781510625617
Category :
Languages : en
Pages :
Book Description
Extreme Ultraviolet (EUV) Lithography II
Author: Bruno M. La Fontaine
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819485281
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1040
Book Description
Includes Proceedings Vol. 7821
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819485281
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1040
Book Description
Includes Proceedings Vol. 7821
Extreme Ultraviolet (EUV) Lithography III
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 500
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 500
Book Description
Extreme Ultraviolet (EUV) Lithography
Author: Bruno M. La Fontaine
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819480507
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1064
Book Description
Includes Proceedings Vol. 7821
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819480507
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1064
Book Description
Includes Proceedings Vol. 7821
Extreme Ultraviolet (EUV) Lithography XI
Author: Nelson M. Felix
Publisher:
ISBN: 9781510634138
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9781510634138
Category :
Languages : en
Pages :
Book Description