Extreme Ultraviolet (EUV) Lithography VII. PDF Download
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Languages : en
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Author: Vivek Bakshi
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510616783
Category : Optical coatings
Languages : en
Pages : 758
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Book Description
Extreme ultraviolet lithography (EUVL) is the principal lithography technology--beyond the current 193-nm-based optical lithography--aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field. Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography--light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials, and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing. This comprehensive volume comprises contributions from the world's leading EUVL researchers and provides the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. This book is intended for people involved in one or more aspects of EUVL, as well as for students, who will find this text equally valuable.
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Languages : en
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ISBN: 9780819489784
Category :
Languages : en
Pages :
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Author: Christopher Neil Anderson
Publisher:
ISBN:
Category :
Languages : en
Pages : 262
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Author:
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Category : Lithography
Languages : en
Pages : 628
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Author: Nelson M. Felix
Publisher:
ISBN: 9781510634138
Category :
Languages : en
Pages :
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Author: Banqiu Wu
Publisher: Wiley-VCH
ISBN: 9783527408184
Category : Technology & Engineering
Languages : en
Pages : 650
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Book Description
Explains the most promising innovation in microlithography. today. . This landmark resource provides the first complete guide to. extreme ultraviolet lithography (EUVL), covering the latest scientific. theory, processing methods, applications, and future. directions. Edited by two renowned EUVL experts, the reference. contains contributions by prominent engineers at leading semiconductor. manufacturers such as Intel and ASM Lithography.. Designed to help you optimize. EUVL, Extreme Ultraviolet Lithography covers EUV. lithography tools, EUV printer, EUV sources, multilayer EUV, EUV. optics, defect control, resist, mask techniques, and more.
Author: Ajay Kumar
Publisher: McGraw-Hill Education
ISBN: 9780071549189
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product. Master Extreme Ultraviolet Lithography Techniques Produce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and minimize wasted energy. You will also learn how to use Mo/Si deposition technology, fine-tune performance, and optimize cost of ownership. Design EUVL-ready photomasks, resist layers, and source-collector modules Assemble optical components, mirrors, microsteppers, and scanners Harness laser-produced and discharge pulse plasma sources Enhance resolution using proximity correction and phase-shift Generate modified illumination using holographic elements Measure critical dimensions using metrology and scatterometry Deploy stable Mo/Si coatings and high-sensitivity multilayers Handle mask defects, layer imperfections, and thermal instabilities
Author: Harry J. Levinson
Publisher:
ISBN: 9781510639393
Category :
Languages : en
Pages : 245
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Author: Bruno M. La Fontaine
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819485281
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1040
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Book Description
Includes Proceedings Vol. 7821
