Author: Publisher:
ISBN: 9780819489784
Category :
Languages : en
Pages :
Book Description
Extreme Ultraviolet (EUV) Lithography III.
Author: Extreme Ultraviolet (EUV) Lithography III
Author: Publisher:
ISBN:
Category : Extreme ultraviolet lithography
Languages : en
Pages :
Book Description
Extreme Ultraviolet (EUV) Lithography III
Author: Extreme Ultraviolet Lithography
Author: Harry J. LevinsonPublisher:
ISBN: 9781510639393
Category :
Languages : en
Pages : 245
Book Description
EUV Lithography
Author: Vivek BakshiPublisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
EUV Sources for Lithography
Author: Vivek BakshiPublisher: SPIE Press
ISBN: 9780819458452
Category : Art
Languages : en
Pages : 1104
Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Extreme Ultraviolet (EUV) Lithography II
Author: Bruno M. La FontainePublisher:
ISBN:
Category :
Languages : en
Pages : 560
Book Description
Efficient Extreme Ultra-Violet Mirror Design
Author: Yen-Min LeePublisher: IOP Publishing Limited
ISBN: 9780750326506
Category : Science
Languages : en
Pages : 150
Book Description
Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel's equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach.
Extreme Ultraviolet (EUV) Lithography II
Author: Bruno M. La FontainePublisher: SPIE-International Society for Optical Engineering
ISBN: 9780819485281
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1040
Book Description
Includes Proceedings Vol. 7821
Extreme Ultraviolet (EUV) Lithography
Author: Bruno M. La FontainePublisher: SPIE-International Society for Optical Engineering
ISBN: 9780819480507
Category : Extreme ultraviolet lithography
Languages : en
Pages : 1064
Book Description
Includes Proceedings Vol. 7821
