Experiments and Models of the Plasma Assisted Chemical Vapor Deposition of Copper from Copper Hexafluoroacetylacetonate and Hydrogen PDF Download
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Author: Satish Kumar Lakshmanan
Publisher:
ISBN:
Category :
Languages : en
Pages : 193
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Author: Satish Kumar Lakshmanan
Publisher:
ISBN:
Category :
Languages : en
Pages : 193
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Author: Mehul B. Naik
Publisher:
ISBN:
Category :
Languages : en
Pages : 280
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Author: Yu David Chen
Publisher:
ISBN:
Category :
Languages : en
Pages : 234
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Author: D. Temple
Publisher:
ISBN:
Category : Organocopper compounds
Languages : en
Pages : 12
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Author: Jaesung Han
Publisher:
ISBN:
Category :
Languages : en
Pages : 406
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Author:
Publisher: Newnes
ISBN: 0080965334
Category : Technology & Engineering
Languages : en
Pages : 5485
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Book Description
Comprehensive Materials Processing, Thirteen Volume Set provides students and professionals with a one-stop resource consolidating and enhancing the literature of the materials processing and manufacturing universe. It provides authoritative analysis of all processes, technologies, and techniques for converting industrial materials from a raw state into finished parts or products. Assisting scientists and engineers in the selection, design, and use of materials, whether in the lab or in industry, it matches the adaptive complexity of emergent materials and processing technologies. Extensive traditional article-level academic discussion of core theories and applications is supplemented by applied case studies and advanced multimedia features. Coverage encompasses the general categories of solidification, powder, deposition, and deformation processing, and includes discussion on plant and tool design, analysis and characterization of processing techniques, high-temperatures studies, and the influence of process scale on component characteristics and behavior. Authored and reviewed by world-class academic and industrial specialists in each subject field Practical tools such as integrated case studies, user-defined process schemata, and multimedia modeling and functionality Maximizes research efficiency by collating the most important and established information in one place with integrated applets linking to relevant outside sources
Author:
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Category : Metallurgy
Languages : en
Pages : 764
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Author: Srinivasan Sivaram
Publisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302
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Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author: Anjana Devi
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128
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Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1634
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