Electrical Resistivity of Thin Metal Films

Electrical Resistivity of Thin Metal Films PDF Author: Peter Wissmann
Publisher: Springer Science & Business Media
ISBN: 3540484884
Category : Science
Languages : en
Pages : 135

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Book Description
The intent of this book is to report on the electrical, optical, and structural properties of silver and gold films in dependence on substrate material, annealing treatment, and gas adsorption. A main point is the calculation of the scattering cross section of the conduction electrons. All results are substantiated by extended experimental data, as well as numerous illustrations and tables.

Electrical Resistivity of Thin Metal Films

Electrical Resistivity of Thin Metal Films PDF Author: Peter Wissmann
Publisher: Springer Science & Business Media
ISBN: 3540484884
Category : Science
Languages : en
Pages : 135

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Book Description
The intent of this book is to report on the electrical, optical, and structural properties of silver and gold films in dependence on substrate material, annealing treatment, and gas adsorption. A main point is the calculation of the scattering cross section of the conduction electrons. All results are substantiated by extended experimental data, as well as numerous illustrations and tables.

The Physical Properties of Thin Metal Films

The Physical Properties of Thin Metal Films PDF Author: G.P. Zhigal'skii
Publisher: CRC Press
ISBN: 9781420024074
Category : Technology & Engineering
Languages : en
Pages : 234

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Book Description
Thin films of conducting materials, such as metals, alloys and semiconductors are currently in use in many areas of science and technology, particularly in modern integrated circuit microelectronics that require high quality thin films for the manufacture of connection layers, resistors and ohmic contacts. These conducting films are also important for fundamental investigations in physics, radio-physics and physical chemistry. Physical Properties of Thin Metal Films provides a clear presentation of the complex physical properties particular to thin conducting films and includes the necessary theory, confirming experiments and applications. The volume will be an invaluable reference for graduates, engineers and scientists working in the electronics industry and fields of pure and applied science.

Principles of the Theory of Solids

Principles of the Theory of Solids PDF Author: J. M. Ziman
Publisher: Cambridge University Press
ISBN: 1139642804
Category : Science
Languages : en
Pages : 456

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Book Description
Professor Ziman's classic textbook on the theory of solids was first pulished in 1964. This paperback edition is a reprint of the second edition, which was substantially revised and enlarged in 1972. The value and popularity of this textbook is well attested by reviewers' opinions and by the existence of several foreign language editions, including German, Italian, Spanish, Japanese, Polish and Russian. The book gives a clear exposition of the elements of the physics of perfect crystalline solids. In discussing the principles, the author aims to give students an appreciation of the conditions which are necessary for the appearance of the various phenomena. A self-contained mathematical account is given of the simplest model that will demonstrate each principle. A grounding in quantum mechanics and knowledge of elementary facts about solids is assumed. This is therefore a textbook for advanced undergraduates and is also appropriate for graduate courses.

Size Effects in Thin Films

Size Effects in Thin Films PDF Author: C.R. Tellier
Publisher: Elsevier
ISBN: 1483289761
Category : Technology & Engineering
Languages : en
Pages : 321

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Book Description
A complete and comprehensive study of transport phenomena in thin continuous metal films, this book reviews work carried out on external-surface and grain-boundary electron scattering and proposes new theoretical equations for transport properties of these films. It presents a complete theoretical view of the field, and considers imperfection and impurity effects.

Electron Transport in Metals

Electron Transport in Metals PDF Author: Jørgen Lykke Olsen
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 144

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Book Description


Thin metal films on weakly-interacting substrates

Thin metal films on weakly-interacting substrates PDF Author: Andreas Jamnig
Publisher: Linköping University Electronic Press
ISBN: 9179298206
Category :
Languages : en
Pages : 108

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Book Description
Vapor-based growth of thin metal films with controlled morphology on weakly-interacting substrates (WIS), including oxides and van der Waals materials, is essential for the fabrication of multifunctional metal contacts in a wide array of optoelectronic devices. Achieving this entails a great challenge, since weak film/substrate interactions yield a pronounced and uncontrolled 3D morphology. Moreover, the far-from-equilibrium nature of vapor-based film growth often leads to generation of mechanical stress, which may further compromise device reliability and functionality. The objectives of this thesis are related to metal film growth on WIS and seek to: (i) contribute to the understanding of atomic-scale processes that control film morphological evolution; (ii) elucidate the dynamic competition between nanoscale processes that govern film stress generation and evolution; and (iii) develop methodologies for manipulating and controlling nanoscale film morphology between 2D and 3D. Investigations focus on magnetron sputter-deposited Ag and Cu films on SiO2 and amorphous carbon (a-C) substrates. Research is conducted by strategically combining of in situ and real-time film growth monitoring, ex situ chemical and (micro)-structural analysis, optical modelling, and deterministic growth simulations. In the first part, the scaling behavior of characteristic morphological transition thicknesses (i.e., percolation and continuous film formation thickness) during growth of Ag and Cu films on a-C are established as function of deposition rate and temperature. These data are interpreted using a theoretical framework based on the droplet growth theory and the kinetic freezing model for island coalescence, from which the diffusion rates of film forming species during Ag and Cu growth are estimated. By combining experimental data with ab initio molecular dynamics simulations, diffusion of multiatomic clusters, rather than monomers, is identified as the rate-limiting structure-forming process. In the second part, the effect of minority metallic or gaseous species (Cu, N2, O2) on Ag film morphological evolution on SiO2 is studied. By employing in situ spectroscopic ellipsometry, it is found that addition of minority species at the film growth front promotes 2D morphology, but also yields an increased continuous-layer resistivity. Ex situ analyses show that 2D morphology is favored because minority species hinder the rate of coalescence completion. Hence, a novel growth manipulation strategy is compiled in which minority species are deployed with high temporal precision to selectively target specific film growth stages and achieve 2D morphology, while retaining opto-electronic properties of pure Ag films. In the third part, the evolution of stress during Ag and Cu film growth on a-C and its dependence on growth kinetics (as determined by deposition rate, substrate temperature) is systematically investigated. A general trend toward smaller compressive stress magnitudes with increasing temperature/deposition rate is found, related to increasing grain size/decreasing adatom diffusion length. Exception to this trend is found for Cu films, in which oxygen incorporation from the residual growth atmosphere at low deposition rates inhibits adatom diffusivity and decreases the magnitude of compressive stress. The effect of N2 on stress type and magnitude in Ag films is also studied. While Ag grown in N2-free atmosphere exhibits a typical compressive-tensile-compressive stress evolution as function of thickness, addition of a few percent of N2 yields to a stress turnaround from compressive to tensile stress after film continuity which is attributed to giant grain growth and film roughening. The overall results of the thesis provide the foundation to: (i) determine diffusion rates over a wide range of WIS film/substrates systems; (ii) design non-invasive strategies for multifunctional contacts in optoelectronic devices; (iii) complete important missing pieces in the fundamental understanding of stress, which can be used to expand theoretical descriptions for predicting and tuning stress magnitude. La morphologie de films minces métalliques polycristallins élaborés par condensation d’une phase vapeur sur des substrats à faible interaction (SFI) possède un caractère 3D intrinsèque. De plus, la nature hors équilibre de la croissance du film depuis une phase vapeur conduit souvent à la génération de contraintes mécaniques, ce qui peut compromettre davantage la fiabilité et la fonctionnalité des dispositifs optoélectroniques. Les objectifs de cette thèse sont liés à la croissance de films métalliques sur SFI et visent à: (i) contribuer à une meilleure compréhension des processus à l'échelle atomique qui contrôlent l'évolution morphologique des films; (ii) élucider les processus dynamiques qui régissent la génération et l'évolution des contraintes en cours de croissance; et (iii) développer des méthodologies pour manipuler et contrôler la morphologie des films à l'échelle nanométrique. L’originalité de l’approche mise en œuvre consiste à suivre la croissance des films in situ et en temps réel par couplage de plusieurs diagnostics, complété par des analyses microstructurales ex situ. Les grandeurs mesurées sont confrontées à des modèles optiques et des simulations atomistiques. La première partie est consacrée à une étude de comportement d’échelonnement des épaisseurs de transition morphologiques caractéristiques, à savoir la percolation et la continuité du film, lors de la croissance de films polycristallins d'Ag et de Cu sur carbone amorphe (a-C). Ces grandeurs sont examinées de façon systématique en fonction de la vitesse de dépôt et de la température du substrat, et interprétées dans le cadre de la théorie de la croissance de gouttelettes suivant un modèle cinétique décrivant la coalescence d’îlots, à partir duquel les coefficients de diffusion des espèces métalliques sont estimés. En confrontant les données expérimentales à des simulations par dynamique moléculaire ab initio, la diffusion de clusters multiatomiques est identifiée comme l’étape limitante le processus de croissance. Dans la seconde partie, l’incorporation, et l’impact sur la morphologie, d’espèces métalliques ou gazeuses minoritaires (Cu, N2, O2) lors de la croissance de film Ag sur SiO2 est étudié. A partir de mesures ellipsométriques in situ, on constate que l'addition d'espèces minoritaires favorise une morphologie 2D, entravant le taux d'achèvement de la coalescence, mais donne également une résistivité accrue de la couche continue. Par conséquent, une stratégie de manipulation de la croissance est proposée dans laquelle des espèces minoritaires sont déployées avec une grande précision temporelle pour cibler sélectivement des stades de croissance de film spécifiques et obtenir une morphologie 2D, tout en conservant les propriétés optoélectroniques des films d’Ag pur. Dans la troisième partie, l'évolution des contraintes résiduelles lors de la croissance des films d'Ag et de Cu sur a-C et leur dépendance à la cinétique de croissance est systématiquement étudiée. On observe une tendance générale vers des amplitudes de contrainte de compression plus faibles avec une augmentation de la température/vitesse de dépôt, liée à l'augmentation de la taille des grains/à la diminution de la longueur de diffusion des adatomes. Également, l’ajout dans le plasma de N2 sur le type et l'amplitude des contraintes dans les films d'Ag est étudié. L'ajout de quelques pourcents de N2 en phase gaz donne lieu à un renversement de la contrainte de compression et une évolution en tension au-delà de la continuité du film. Cet effet est attribué à une croissance anormale des grains géants et le développement de rugosité de surface. L’ensemble des résultats obtenus dans cette thèse fournissent les bases pour: (i) déterminer les coefficients de diffusion sur une large gamme de systèmes films/SFI; (ii) concevoir des stratégies non invasives pour les contacts multifonctionnels dans les dispositifs optoélectroniques; (iii) apporter des éléments de compréhension à l’origine du développement de contrainte, qui permettent de prédire et contrôler le niveau de contrainte intrinsèque à la croissance de films minces polycristallins.

The Materials Science of Thin Films

The Materials Science of Thin Films PDF Author: Milton Ohring
Publisher: Academic Press
ISBN: 9780125249904
Category : Science
Languages : en
Pages : 744

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Book Description
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Proceedings of the Workshop on the Electrocatalysis of Fuel Cell Reactions, May 15-16, 1978, Brookhaven National Laboratory, Upton, New York ...

Proceedings of the Workshop on the Electrocatalysis of Fuel Cell Reactions, May 15-16, 1978, Brookhaven National Laboratory, Upton, New York ... PDF Author: W. E. O'Grady
Publisher:
ISBN:
Category : Catalysis
Languages : en
Pages : 250

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Book Description


Smart Sensors for Industrial Applications

Smart Sensors for Industrial Applications PDF Author: Krzysztof Iniewski
Publisher: CRC Press
ISBN: 1466568119
Category : Technology & Engineering
Languages : en
Pages : 598

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Book Description
Sensor technologies are a rapidly growing area of interest in science and product design, embracing developments in electronics, photonics, mechanics, chemistry, and biology. Their presence is widespread in everyday life, where they are used to sense sound, movement, and optical or magnetic signals. The demand for portable and lightweight sensors is relentless in several industries, from consumer electronics to biomedical engineering to the military. Smart Sensors for Industrial Applications brings together the latest research in smart sensors technology and exposes the reader to myriad applications that this technology has enabled. Organized into five parts, the book explores: Photonics and optoelectronics sensors, including developments in optical fibers, Brillouin detection, and Doppler effect analysis. Chapters also look at key applications such as oxygen detection, directional discrimination, and optical sensing. Infrared and thermal sensors, such as Bragg gratings, thin films, and microbolometers. Contributors also cover temperature measurements in industrial conditions, including sensing inside explosions. Magnetic and inductive sensors, including magnetometers, inductive coupling, and ferro-fluidics. The book also discusses magnetic field and inductive current measurements in various industrial conditions, such as on airplanes. Sound and ultrasound sensors, including underwater acoustic modem, vibrational spectroscopy, and photoacoustics. Piezoresistive, wireless, and electrical sensors, with applications in health monitoring, agrofood, and other industries. Featuring contributions by experts from around the world, this book offers a comprehensive review of the groundbreaking technologies and the latest applications and trends in the field of smart sensors.

Ultrathin Metal Transparent Electrodes for the Optoelectronics Industry

Ultrathin Metal Transparent Electrodes for the Optoelectronics Industry PDF Author: Dhriti Sundar Ghosh
Publisher: Springer Science & Business Media
ISBN: 3319003488
Category : Science
Languages : en
Pages : 96

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Book Description
Transparent electrodes (TEs) are a class of materials that make it possible to bring electrical current or potentials in close proximity to optically active regions without significant loss of optical energy. However, it is a challenge to decouple the electrical and optical properties of a material, as the property of conductivity is strongly coupled to the imaginary part of the refractive index. An ideal TE has high transparency in combination with very low electrical resistivity. The main objective of the thesis was to develop TEs which can replace expensive, scarce and fragile Indium Tin Oxide (ITO), the most widely used TE material in the industry today. The thesis contains original work on ultrathin metal film (UTMF)-based TEs, which are essential elements in a wide range of optoelectronics, consumer electronics and energy devices. It presents new designs and fabrication methods and demonstrates the efficient use of UTMF-TEs in organic light emitting diodes and solar cells, achieving similar levels of efficiency to that of state-of-the-art ITO.