Author: Jan Kristen Prüßing
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Electrical Characterization of Dopant Profiles in Semiconductor Nanostructures by Means of Scanning Spreading Resistance Microscopy
Author: Jan Kristen Prüßing
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Electrical Atomic Force Microscopy for Nanoelectronics
Author: Umberto Celano
Publisher: Springer
ISBN: 3030156125
Category : Science
Languages : en
Pages : 408
Book Description
The tremendous impact of electronic devices on our lives is the result of continuous improvements of the billions of nanoelectronic components inside integrated circuits (ICs). However, ultra-scaled semiconductor devices require nanometer control of the many parameters essential for their fabrication. Through the years, this created a strong alliance between microscopy techniques and IC manufacturing. This book reviews the latest progress in IC devices, with emphasis on the impact of electrical atomic force microscopy (AFM) techniques for their development. The operation principles of many techniques are introduced, and the associated metrology challenges described. Blending the expertise of industrial specialists and academic researchers, the chapters are dedicated to various AFM methods and their impact on the development of emerging nanoelectronic devices. The goal is to introduce the major electrical AFM methods, following the journey that has seen our lives changed by the advent of ubiquitous nanoelectronics devices, and has extended our capability to sense matter on a scale previously inaccessible.
Publisher: Springer
ISBN: 3030156125
Category : Science
Languages : en
Pages : 408
Book Description
The tremendous impact of electronic devices on our lives is the result of continuous improvements of the billions of nanoelectronic components inside integrated circuits (ICs). However, ultra-scaled semiconductor devices require nanometer control of the many parameters essential for their fabrication. Through the years, this created a strong alliance between microscopy techniques and IC manufacturing. This book reviews the latest progress in IC devices, with emphasis on the impact of electrical atomic force microscopy (AFM) techniques for their development. The operation principles of many techniques are introduced, and the associated metrology challenges described. Blending the expertise of industrial specialists and academic researchers, the chapters are dedicated to various AFM methods and their impact on the development of emerging nanoelectronic devices. The goal is to introduce the major electrical AFM methods, following the journey that has seen our lives changed by the advent of ubiquitous nanoelectronics devices, and has extended our capability to sense matter on a scale previously inaccessible.
Characterization of Electrically Active Dopant Profiles with the Spreading Resistance Probe
Author: T. Clarysse
Publisher:
ISBN:
Category :
Languages : en
Pages : 84
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 84
Book Description
Characterisation of Shallow Dopant Profiles in Semiconductors by Spreading Resistance Profiling
Author: Louison Cheng Pheng Tan
Publisher:
ISBN:
Category :
Languages : en
Pages : 360
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 360
Book Description
III-V Compound Semiconductor Dopant Profiling Using Scanning Spreading Resistance Microscopy
Author: Ryan Paul Lu
Publisher:
ISBN:
Category :
Languages : en
Pages : 358
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 358
Book Description
Springer Handbook of Semiconductor Devices
Author: Massimo Rudan
Publisher: Springer Nature
ISBN: 3030798275
Category : Technology & Engineering
Languages : en
Pages : 1680
Book Description
This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.
Publisher: Springer Nature
ISBN: 3030798275
Category : Technology & Engineering
Languages : en
Pages : 1680
Book Description
This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.
Cross-sectional Imaging of Semiconductor Devices Using Nanometer Scale Point Contacts
Author: Jochonia Norman Nxumalo
Publisher:
ISBN:
Category :
Languages : en
Pages : 328
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 328
Book Description
Handbook of Nanoscopy, 2 Volume Set
Author: Gustaaf van Tendeloo
Publisher: John Wiley & Sons
ISBN: 3527317066
Category : Technology & Engineering
Languages : en
Pages : 1484
Book Description
This completely revised successor to the Handbook of Microscopy supplies in-depth coverage of all imaging technologies from the optical to the electron and scanning techniques. Adopting a twofold approach, the book firstly presents the various technologies as such, before going on to cover the materials class by class, analyzing how the different imaging methods can be successfully applied. It covers the latest developments in techniques, such as in-situ TEM, 3D imaging in TEM and SEM, as well as a broad range of material types, including metals, alloys, ceramics, polymers, semiconductors, minerals, quasicrystals, amorphous solids, among others. The volumes are divided between methods and applications, making this both a reliable reference and handbook for chemists, physicists, biologists, materials scientists and engineers, as well as graduate students and their lecturers.
Publisher: John Wiley & Sons
ISBN: 3527317066
Category : Technology & Engineering
Languages : en
Pages : 1484
Book Description
This completely revised successor to the Handbook of Microscopy supplies in-depth coverage of all imaging technologies from the optical to the electron and scanning techniques. Adopting a twofold approach, the book firstly presents the various technologies as such, before going on to cover the materials class by class, analyzing how the different imaging methods can be successfully applied. It covers the latest developments in techniques, such as in-situ TEM, 3D imaging in TEM and SEM, as well as a broad range of material types, including metals, alloys, ceramics, polymers, semiconductors, minerals, quasicrystals, amorphous solids, among others. The volumes are divided between methods and applications, making this both a reliable reference and handbook for chemists, physicists, biologists, materials scientists and engineers, as well as graduate students and their lecturers.
Development of Scanning Spreading Resistance Microscopy as a Two-dimensional Dopant Profiling Technique for Advanced Silicon Processing
Author: Regis Joseph Kline
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 208
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 208
Book Description
Electrical & Electronics Abstracts
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2304
Book Description
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2304
Book Description