Effect of Ion-Irradiation on Phase Transformation in TiNi Shape Memory Alloys PDF Download
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Author: S. Watanabe
Publisher:
ISBN:
Category : Amorphization
Languages : en
Pages : 12
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Book Description
Ion-irradiation induced amorphization and crystallization processes in TiNi shape memory alloys have been investigated. The primary concern is to clarify the relationship between the critical temperature for irradiation-induced amorphization and the thermal crystallization temperature. The critical temperature for irradiation-induced amorphization was 673K, however, the edge of the foil specimen crystallized during the irradiation at a lower temperature. The crystallization temperature of the specimen edge during irradiation decreased with increasing of incident ion energy. Thermal annealing experiments revealed that the thermal crystallization preferentially occurred at the specimen edge and the crystalline-amorphous (C-A) interface; The crystallization temperature of the preferential sites were 573K and 623K, respectively. These preferential nucleation indicate that the nucleation barrier dominates the thermal crystallization temperature; the critical temperature for amorphization is higher than the thermal crystallization temperature with no nucleation barrier.
Author: S. Watanabe
Publisher:
ISBN:
Category : Amorphization
Languages : en
Pages : 12
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Book Description
Ion-irradiation induced amorphization and crystallization processes in TiNi shape memory alloys have been investigated. The primary concern is to clarify the relationship between the critical temperature for irradiation-induced amorphization and the thermal crystallization temperature. The critical temperature for irradiation-induced amorphization was 673K, however, the edge of the foil specimen crystallized during the irradiation at a lower temperature. The crystallization temperature of the specimen edge during irradiation decreased with increasing of incident ion energy. Thermal annealing experiments revealed that the thermal crystallization preferentially occurred at the specimen edge and the crystalline-amorphous (C-A) interface; The crystallization temperature of the preferential sites were 573K and 623K, respectively. These preferential nucleation indicate that the nucleation barrier dominates the thermal crystallization temperature; the critical temperature for amorphization is higher than the thermal crystallization temperature with no nucleation barrier.
Author: Shuichi Miyazaki
Publisher: Cambridge University Press
ISBN: 1139481045
Category : Technology & Engineering
Languages : en
Pages : 487
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Book Description
This book, the first dedicated to this exciting and rapidly growing field, enables readers to understand and prepare high-quality, high-performance TiNi shape memory alloys (SMAs). It covers the properties, preparation and characterization of TiNi SMAs, with particular focus on the latest technologies and applications in MEMS and biological devices. Basic techniques and theory are covered to introduce new-comers to the subject, whilst various sub-topics, such as film deposition, characterization, post treatment, and applying thin films to practical situations, appeal to more informed readers. Each chapter is written by expert authors, providing an overview of each topic and summarizing all the latest developments, making this an ideal reference for practitioners and researchers alike.
Author: Margaret L. Hamilton
Publisher: ASTM International
ISBN: 0803128525
Category : Materials
Languages : en
Pages : 1266
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Book Description
Author: Lu-Min Wang
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 704
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Book Description
The catastrophic effect, as well as a potentially advantageous effect, from energetic beams is the instant high-energy deposition in a local volume, down to the nanoscale, and the rapid cooling processes resulting in changes in the structure and properties of materials that are hard to achieve by other methods. The challenging balance between controlling radiation damage and enhancing material properties has intrigued materials scientists and physicists, as well as engineers in the nuclear and semiconductor industry, and caused them to work closely together for many years. As clearly demonstrated in this volume, many new technologies for creating unique functional devices with energetic particle beams are based on the fundamental study of radiation-induced defect production and evolution. Scientists and engineers working in nuclear engineering, environmental sciences and functional materials share a common language and numerous opportunities for collaboration in this truly interdisciplinary area. Exciting and promising results are presented here, including the most recent progress in fundamental understanding of radiation effects using molecular dynamic (MD) and kinetic Monte Carlo (kMC) simulations, processing of monodisperse nanoparticles by ion implantation, production of a wide variety of nanostructures with the application of focused ion beams (FIB), and creating new types of nanoscale functional devices using high-energy ion tracks. These results demonstrate the important relation between fundamental research on radiation effects and the development of new types of nanoscale functional devices using energetic particles over a wide energy range. Topics include: radiation effects in nuclear materials; ion-beam processing of nanostructures; ion-beam processing of semiconductor devices; ion-beam modification of physical properties; modeling and computer simulation of beam-solid interactions; and ion-beam-assisted deposition and surface modification.
Author: Shuichi Miyazaki
Publisher: Cambridge University Press
ISBN: 0521885760
Category : Science
Languages : en
Pages : 487
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Book Description
The first dedicated book describing the properties, preparation, characterization and device applications of TiNi-based shape memory alloys.
Author:
Publisher:
ISBN:
Category : Materials
Languages : en
Pages : 1296
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Book Description
Author: Yuan Tang
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
The need for high performance microelectromechanical systems (MEMS) has driven the industry to research ultra-thin shape memory alloy (SMA) films, specifically for microactuators capable of rapid actuation [1]. Biased target ion beam deposition (BTIBD) is a novel technique that can produce high quality films with thicknesses less than 1000 [2]. Nickel-titanium (NiTi) thin films with different composition ranges (Ni-poor/Ti-rich, near equiatomic NiTi, and Ni-rich), various thicknesses, and post-deposition annealing were deposited using BTIBD by Dr. Huilong Hou at the Penn State University [2 4]. The shape memory effect in NiTi films can be detected by measuring the thin film stress as a function of temperature. Stress measurements during heating and cooling were made on a variety of films using laser-based system that measures substrate. Additionally, cyclic tests, up to 100 heating-cooling cycles, were conducted to evaluate the stability of the phase transformation in subset of the deposited films. In several films that were 800 nm thick, thermal stress measurements showed a distinct hysteresis indicative of a functional shape memory effect in these films. These same films also showed that the effect was repeatable even after 100 temperature cycles.
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1076
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Book Description
Author: Frank V. Nolfi
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 384
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Book Description
Good,No Highlights,No Markup,all pages are intact, Slight Shelfwear,may have the corners slightly dented, may have slight color changes/slightly damaged spine.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1368
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Book Description
