Directed Self-assembly of Block Copolymer Films on Chemically Nanopatterned Surfaces PDF Download
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Author: Adam M. Welander
Publisher:
ISBN:
Category :
Languages : en
Pages : 118
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Book Description
Author: Adam M. Welander
Publisher:
ISBN:
Category :
Languages : en
Pages : 118
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Book Description
Author: Roel Gronheid
Publisher: Woodhead Publishing
ISBN: 0081002610
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. - Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic - Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing - Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
Author: Erik WiIliam Edwards
Publisher:
ISBN:
Category :
Languages : en
Pages : 248
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Book Description
Author: John A. Rogers
Publisher: John Wiley & Sons
ISBN: 0470405775
Category : Technology & Engineering
Languages : en
Pages : 616
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Book Description
Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.
Author: Mark P. Stoykovich
Publisher:
ISBN:
Category :
Languages : en
Pages : 210
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Book Description
Author: Aránzazu del Campo
Publisher: John Wiley & Sons
ISBN: 3527633464
Category : Technology & Engineering
Languages : en
Pages : 562
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Book Description
New micro and nanopatterning technologies have been developed in the last years as less costly and more flexible alternatives to phtolithograpic processing. These technologies have not only impacted on recent developments in microelectronics, but also in emerging fields such as disposable biosensors, scaffolds for tissue engineering, non-biofouling coatings, high adherence devices, or photonic structures for the visible spectrum. This handbook presents the current processing methods suitable for the fabrication of micro- and nanostructured surfaces made out of polymeric materials. It covers the steps and materials involved, the resulting structures, and is rounded off by a part on applications. As a result, chemists, material scientists, and physicists gain a critical understanding of this topic at an early stage of its development.
Author: Richard D. Peters
Publisher:
ISBN:
Category :
Languages : en
Pages : 264
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Book Description
Author: Stefano Cabrini
Publisher: CRC Press
ISBN: 1420090526
Category : Technology & Engineering
Languages : en
Pages : 548
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Book Description
While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and academic institutions around the world define subfields, offer practical instructions and examples, and pave the way for future research. Helping readers to select the proper fabricating technique for their experiments, the book provides a broad vision of the most critical problems and explains how to solve them. It includes basic definitions and introduces the main underlying concepts of nanofabrication. The book also discusses the major advantages and disadvantages of each approach and offers a wide variety of examples of cutting-edge applications. Each chapter focuses on a particular method or aspect of study. For every method, the contributors describe the underlying theoretical basis, resolution, patterns and substrates used, and applications. They show how applications at the nanoscale require a different process and understanding than those at the microscale. For each experiment, they elucidate key solutions to problems relating to materials, methods, and surface considerations. A complete resource for this rapidly emerging interdisciplinary field, this handbook provides practical information for planning the experiments of any project that employs nanofabrication techniques. It gives readers a foundation to enter the complex world of nanofabrication and inspires the scientific community at large to push the limits of nanometer resolution.
Author: Zheng Cui (author)
Publisher: Springer Nature
ISBN: 3031625463
Category :
Languages : en
Pages : 418
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Book Description
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
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Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
