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Author: Daniel Piedra (Ph. D.)
Publisher:
ISBN:
Category :
Languages : en
Pages : 130
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Book Description
As silicon devices approach their intrinsic material and technological limit, there is an opportunity for alternative semiconductor materials to push the performance of electronics forward. Gallium nitride (GaN) has demonstrated very promising performance for advanced electronics, but there is still room for improvement. This thesis discusses several new transistor designs to improve the performance of GaN-based power devices as well as demonstrations of their scaling potential and integration capability with silicon. Specifically, we have developed a wide-periphery GaN fin-based high electron mobility transistor process for power switching. The process was developed with emphasis on the passivation, field plates, gate periphery scaling, and packaging. A CMOS compatible GaN processing technology on 200-mm wafers was developed and optimized, with particular attention focused on the recess etching through the wide-bandgap AlGaN barrier to reduce the contact resistance. A study of a heterogeneous integration technology to integrate GaN and Si devices was conducted. This involved an approach to monolithically integrate GaN and Si devices which used a bonded SOI wafer with a Si (111) substrate and Si (100) device layer with windows opened to access the (111) layer to selectively grow GaN. Characterization of the transistor properties in GaN windows of different sizes was performed to qualify the optimal window size for power devices in future integrated systems.
Author: Daniel Piedra (Ph. D.)
Publisher:
ISBN:
Category :
Languages : en
Pages : 130
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Book Description
As silicon devices approach their intrinsic material and technological limit, there is an opportunity for alternative semiconductor materials to push the performance of electronics forward. Gallium nitride (GaN) has demonstrated very promising performance for advanced electronics, but there is still room for improvement. This thesis discusses several new transistor designs to improve the performance of GaN-based power devices as well as demonstrations of their scaling potential and integration capability with silicon. Specifically, we have developed a wide-periphery GaN fin-based high electron mobility transistor process for power switching. The process was developed with emphasis on the passivation, field plates, gate periphery scaling, and packaging. A CMOS compatible GaN processing technology on 200-mm wafers was developed and optimized, with particular attention focused on the recess etching through the wide-bandgap AlGaN barrier to reduce the contact resistance. A study of a heterogeneous integration technology to integrate GaN and Si devices was conducted. This involved an approach to monolithically integrate GaN and Si devices which used a bonded SOI wafer with a Si (111) substrate and Si (100) device layer with windows opened to access the (111) layer to selectively grow GaN. Characterization of the transistor properties in GaN windows of different sizes was performed to qualify the optimal window size for power devices in future integrated systems.
Author: Alex Lidow
Publisher: John Wiley & Sons
ISBN: 1118844769
Category : Science
Languages : en
Pages : 266
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Book Description
Gallium nitride (GaN) is an emerging technology that promises to displace silicon MOSFETs in the next generation of power transistors. As silicon approaches its performance limits, GaN devices offer superior conductivity and switching characteristics, allowing designers to greatly reduce system power losses, size, weight, and cost. This timely second edition has been substantially expanded to keep students and practicing power conversion engineers ahead of the learning curve in GaN technology advancements. Acknowledging that GaN transistors are not one-to-one replacements for the current MOSFET technology, this book serves as a practical guide for understanding basic GaN transistor construction, characteristics, and applications. Included are discussions on the fundamental physics of these power semiconductors, layout and other circuit design considerations, as well as specific application examples demonstrating design techniques when employing GaN devices. With higher-frequency switching capabilities, GaN devices offer the chance to increase efficiency in existing applications such as DC–DC conversion, while opening possibilities for new applications including wireless power transfer and envelope tracking. This book is an essential learning tool and reference guide to enable power conversion engineers to design energy-efficient, smaller and more cost-effective products using GaN transistors. Key features: Written by leaders in the power semiconductor field and industry pioneers in GaN power transistor technology and applications. Contains useful discussions on device–circuit interactions, which are highly valuable since the new and high performance GaN power transistors require thoughtfully designed drive/control circuits in order to fully achieve their performance potential. Features practical guidance on formulating specific circuit designs when constructing power conversion systems using GaN transistors – see companion website for further details. A valuable learning resource for professional engineers and systems designers needing to fully understand new devices as well as electrical engineering students.
Author: Mengyang Yuan
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
Gallium nitride (GaN) is a promising candidate for harsh environment electronics, thanks to its excellent material properties, which have given rise to high-performance (room temperature) transistors for radio frequency (RF), power, micro-electro-mechanical systems (MEMS), and mixed-signal applications. Previous works on high-temperature (HT) electronics have been typically limited to two aspects, namely, the high-temperature robustness of discrete transistors and basic circuit building blocks, which are mainly combinational logic. While these studies offer a strong indication of the potential of GaN transistor technology for HT applications, the development of HT (500 °C) GaN integrated circuit (ICs) is still at its early stage due to the low degree of complexity and integration demonstrated so far. Major challenges in the realization of GaN HT-robust sequential logic circuits or more complex systems is the lack of a scalable technology. This thesis aims to advance the integration technology of GaN HT electronics by demonstrating a comprehensive HT (500°C) enhancement-mode (E-mode) GaN-on-Si technology from device to circuit perspectives: (1) a scalable device technology based on p-GaN-gate AlGaN/GaN high-electron-mobility transistors (HEMTs) with high uniformity, which is optimized for HT operation and demonstrated to offer robust performance at least up to 500 °C with the help of in-house developed packaging technology and characterization platform, (2) compact modeling of monolithically integrated enhancement/depletion-mode HEMTs up to 500 °C HEMTs, (3) robustness-driven circuit design based on GaN technology, (4) demonstration of GaN-based combinational and sequential building blocks including inverter, NAND, NOR, ring oscillators, ROM, SRAM, D Latch, D Flip-Flop operational up to 500 °C.
Author: Maurizio Di Paolo Emilio
Publisher: Springer Nature
ISBN: 3031632389
Category :
Languages : en
Pages : 388
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Book Description
Author: Farid Medjdoub
Publisher: CRC Press
ISBN: 1482220040
Category : Technology & Engineering
Languages : en
Pages : 372
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Book Description
Addresses a Growing Need for High-Power and High-Frequency Transistors Gallium Nitride (GaN): Physics, Devices, and Technology offers a balanced perspective on the state of the art in gallium nitride technology. A semiconductor commonly used in bright light-emitting diodes, GaN can serve as a great alternative to existing devices used in microelectronics. It has a wide band gap and high electron mobility that gives it special properties for applications in optoelectronic, high-power, and high-frequency devices, and because of its high off-state breakdown strength combined with excellent on-state channel conductivity, GaN is an ideal candidate for switching power transistors. Explores Recent Progress in High-Frequency GaN Technology Written by a panel of academic and industry experts from around the globe, this book reviews the advantages of GaN-based material systems suitable for high-frequency, high-power applications. It provides an overview of the semiconductor environment, outlines the fundamental device physics of GaN, and describes GaN materials and device structures that are needed for the next stage of microelectronics and optoelectronics. The book details the development of radio frequency (RF) semiconductor devices and circuits, considers the current challenges that the industry now faces, and examines future trends. In addition, the authors: Propose a design in which multiple LED stacks can be connected in a series using interband tunnel junction (TJ) interconnects Examine GaN technology while in its early stages of high-volume deployment in commercial and military products Consider the potential use of both sunlight and hydrogen as promising and prominent energy sources for this technology Introduce two unique methods, PEC oxidation and vapor cooling condensation methods, for the deposition of high-quality oxide layers A single-source reference for students and professionals, Gallium Nitride (GaN): Physics, Devices, and Technology provides an overall assessment of the semiconductor environment, discusses the potential use of GaN-based technology for RF semiconductor devices, and highlights the current and emerging applications of GaN.
Author: Matteo Meneghini
Publisher: Springer
ISBN: 3319431994
Category : Technology & Engineering
Languages : en
Pages : 383
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Book Description
This book presents the first comprehensive overview of the properties and fabrication methods of GaN-based power transistors, with contributions from the most active research groups in the field. It describes how gallium nitride has emerged as an excellent material for the fabrication of power transistors; thanks to the high energy gap, high breakdown field, and saturation velocity of GaN, these devices can reach breakdown voltages beyond the kV range, and very high switching frequencies, thus being suitable for application in power conversion systems. Based on GaN, switching-mode power converters with efficiency in excess of 99 % have been already demonstrated, thus clearing the way for massive adoption of GaN transistors in the power conversion market. This is expected to have important advantages at both the environmental and economic level, since power conversion losses account for 10 % of global electricity consumption. The first part of the book describes the properties and advantages of gallium nitride compared to conventional semiconductor materials. The second part of the book describes the techniques used for device fabrication, and the methods for GaN-on-Silicon mass production. Specific attention is paid to the three most advanced device structures: lateral transistors, vertical power devices, and nanowire-based HEMTs. Other relevant topics covered by the book are the strategies for normally-off operation, and the problems related to device reliability. The last chapter reviews the switching characteristics of GaN HEMTs based on a systems level approach. This book is a unique reference for people working in the materials, device and power electronics fields; it provides interdisciplinary information on material growth, device fabrication, reliability issues and circuit-level switching investigation.
Author: Eldad Bahat-Treidel
Publisher: Cuvillier Verlag
ISBN: 3736940947
Category : Science
Languages : en
Pages : 220
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Book Description
Gallium nitride (GaN)-based High Electron Mobility Transistors (HEMTs) for high voltage, high power switching and regulating for space applications are studied in this work. Efficient power switching is associated with operation in high OFF-state blocking voltage while keeping the ON-state resistance, the dynamic dispersion and leakage currents as low as possible. The potential of such devices to operate at high voltages is limited by a chain of factors such as subthreshold leakages and the device geometry. Blocking voltage enhancement is a complicated problem that requires parallel methods for solution; epitaxial layers design, device structural and geometry design, and suitable semiconductor manufacturing technique. In this work physical-based device simulation as an engineering tool was developed. An overview on GaN-based HEMTs physical based device simulation using Silvaco-“ATLAS” is given. The simulation is utilized to analyze, give insight to the modes of operation of the device and for design and evaluation of innovative concepts. Physical-based models that describe the properties of the semiconductor material are introduced. A detailed description of the specific AlGaN/GaN HEMT structure definition and geometries are given along with the complex fine meshing requirements. Nitride-semiconductor specific material properties and their physical models are reviewed focusing on the energetic band structure, epitaxial strain tensor calculation in wurtzite materials and build-in polarization models. Special attention for thermal conductivity, carriers’ mobility and Schottky-gate-reverse-bias-tunneling is paid. Empirical parameters matching and adjustment of models parameters to match the experimental device measured results are discussed. An enhancement of breakdown voltage in AlxGa1-xN/GaN HEMT devices by increasing the electron confinement in the transistor channel using a low Al content AlyGa1-yN back-barrier layer structure is systematically studied. It is shown that the reduced sub-threshold drain-leakage current through the buffer layer postpones the punch-through and therefore shifts the breakdown of the device to higher voltages. It is also shown that the punch-through voltage (VPT) scales up with the device dimensions (gate to drain separation). An optimized electron confinement results both, in a scaling of breakdown voltage with device geometry and a significantly reduced sub-threshold drain and gate leakage currents. These beneficial properties are pronounced even further if gate recess technology is applied for device fabrication. For the systematic study a large variations of back-barrier epitaxial structures were grown on sapphire, n-type 4H-SiC and semi-insulating 4H-SiC substrates. The devices with 5 μm gate-drain separation grown on n-SiC owning Al0.05Ga0.95N and Al0.10Ga0.90N back-barrier exhibit 304 V and 0.43 m × cm2 and 342 V and 0.41 m × cm2 respectively. To investigate the impact of AlyGa1-yN back-barrier on the device properties the devices were characterized in DC along with microwave mode and robustness DC-step-stress test. Physical-based device simulations give insight in the respective electronic mechanisms and to the punch-through process that leads to device breakdown. Systematic study of GaN-based HEMT devices with insulating carbon-doped GaN back-barrier for high voltage operation is also presented. Suppression of the OFF-state sub-threshold drain leakage-currents enables breakdown voltage enhancement over 1000 V with low ON-state resistance. The devices with 5 μm gate-drain separation on SI-SiC and 7 μm gate-drain separation on n-SiC exhibit 938 V and 0.39 m × cm2 and 942 V and 0.39 m × cm2 respectively. Power device figure of merit of ~2.3 × 109 V2/-cm2 was calculated for these devices. The impacts of variations of carbon doping concentration, GaN channel thickness and substrates are evaluated. Trade-off considerations in ON-state resistance and of current collapse are addressed. A novel GaN-based HEMTs with innovative planar Multiple-Grating-Field-Plates (MGFPs) for high voltage operation are described. A synergy effect with additional electron channel confinement by using a heterojunction AlGaN back-barrier is demonstrated. Suppression of the OFF-state sub-threshold gate and drain leakage-currents enables breakdown voltage enhancement over 700 V and low ON-state resistance of 0.68 m × cm2. Such devices have a minor trade-off in ON-state resistance, lag factor, maximum oscillation frequency and cut-off frequency. Systematic study of the MGFP design and the effect of Al composition in the back-barrier are described. Physics-based device simulation results give insight into electric field distribution and charge carrier concentration depending on field-plate design. The GaN superior material breakdown strength properties are not always a guarantee for high voltage devices. In addition to superior epitaxial growth design and optimization for high voltage operation the device geometrical layout design and the device manufacturing process design and parameters optimization are important criteria for breakdown voltage enhancement. Smart layout prevent immature breakdown due to lateral proximity of highly biased interconnects. Optimization of inter device isolation designed for high voltage prevents substantial subthreshold leakage. An example for high voltage test device layout design and an example for critical inter-device insulation manufacturing process optimization are presented. While major efforts are being made to improve the forward blocking performance, devices with reverse blocking capability are also desired in a number of applications. A novel GaN-based HEMT with reverse blocking capability for Class-S switch-mode amplifiers is introduced. The high voltage protection is achieved by introducing an integrated recessed Schottky contact as a drain electrode. Results from our Schottky-drain HEMT demonstrate an excellent reverse blocking with minor trade-off in the ON-state resistance for the complete device. The excellent quality of the forward diode characteristics indicates high robustness of the recess process. The reverse blocking capability of the diode is better than –110 V. Physical-based device simulations give insight in the respective electronic mechanisms. Zusammenfassung In dieser Arbeit wurden Galliumnitrid (GaN)-basierte Hochspannungs-HEMTs (High Electron Mobility Transistor) für Hochleistungsschalt- und Regelanwendungen in der Raumfahrt untersucht. Effizientes Leistungsschalten erfordert einen Betrieb bei hohen Sperrspannungen gepaart mit niedrigem Einschaltwiderstand, geringer dynamischer Dispersion und minimalen Leckströmen. Dabei wird das aus dem Halbleitermaterial herrührende Potential für extrem spannungsfeste Transistoren aufgrund mehrerer Faktoren aus dem lateralen und dem vertikalen Bauelementedesign oft nicht erreicht. Physikalisch-basierte Simulationswerkzeuge für die Bauelemente wurden daher entwickelt. Die damit durchgeführte Analyse der unterschiedlichen Transistorbetriebszustände ermöglichte das Entwickeln innovativer Bauelementdesignkonzepte. Das Erhöhen der Bauelementsperrspannung erfordert parallele und ineinandergreifende Lösungsansätze für die Epitaxieschichten, das strukturelle und das geometrische Design und für die Prozessierungstechnologie. Neuartige Bauelementstrukturen mit einer rückseitigen Kanalbarriere (back-barrier) aus AlGaN oder Kohlenstoff-dotierem GaN in Kombination mit neuartigen geometrischen Strukturen wie den Mehrfachgitterfeldplatten (MGFP, Multiple-Grating-Field-Plate) wurden untersucht. Die elektrische Gleichspannungscharakterisierung zeigte dabei eine signifikante Verringerung der Leckströme im gesperrten Zustand. Dies resultierte bei nach wie vor sehr kleinem Einschaltwiderstand in einer Durchbruchspannungserhöhung um das etwa Zehnfache auf über 1000 V. Vorzeitige Spannungsüberschläge aufgrund von Feldstärkenspitzen an Verbindungsmetallisierungen werden durch ein geschickt gestaltetes Bauelementlayout verhindert. Eine Optimierung der Halbleiterisolierung zwischen den aktiven Strukturen führte auch im kV-Bereich zu vernachlässigbaren Leckströme. Während das Hauptaugenmerk der Arbeit auf der Erhöhung der Spannungsfestigkeit im Vorwärtsbetrieb des Transistors lag, ist für einige Anwendung auch ein rückwärtiges Sperren erwünscht. Für Schaltverstärker im S-Klassenbetrieb wurde ein neuartiger GaN-HEMT entwickelt, dessen rückwärtiges Sperrverhalten durch einen tiefgelegten Schottkykontakt als Drainelektrode hervorgerufen wird. Eine derartige Struktur ergab eine rückwärtige Spannungsfestigkeit von über 110 V.
Author: Achim Seidel
Publisher: Springer Nature
ISBN: 3030689409
Category : Technology & Engineering
Languages : en
Pages : 137
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Book Description
This book explores integrated gate drivers with emphasis on new gallium nitride (GaN) power transistors, which offer fast switching along with minimum switching losses. It serves as a comprehensive, all-in-one source for gate driver IC design, written in handbook style with systematic guidelines. The authors cover the full range from fundamentals to implementation details including topics like power stages, various kinds of gate drivers (resonant, non-resonant, current-source, voltage-source), gate drive schemes, driver supply, gate loop, gate driver power efficiency and comparison silicon versus GaN transistors. Solutions are presented on the system and circuit level for highly integrated gate drivers. Coverage includes miniaturization by higher integration of subfunctions onto the IC (buffer capacitors), as well as more efficient switching by a multi-level approach, which also improves robustness in case of extremely fast switching transitions. The discussion also includes a concept for robust operation in the highly relevant case that the gate driver is placed in distance to the power transistor. All results are widely applicable to achieve highly compact, energy efficient, and cost-effective power electronics solutions.
Author: Maik Peter Kaufmann
Publisher: Springer Nature
ISBN: 3031156250
Category : Technology & Engineering
Languages : en
Pages : 185
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Book Description
This book is a comprehensive, all-in-one source on design of monolithic GaN power ICs. It is written in handbook style with systematic guidelines and includes implementation examples. It covers the full range from technology fundamentals to implementation details including design techniques specific for GaN technology. It provides a detailed loss analysis based on comparative measurements between silicon and GaN based converters to provide an understanding of the relations between design choices and results which can be transferred to other power converter systems.
Author: Yogesh Singh Chauhan
Publisher: Elsevier
ISBN: 0323999409
Category : Technology & Engineering
Languages : en
Pages : 262
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Book Description
GaN Transistor Modeling for RF and Power Electronics: Using The ASM-GaN-HEMT Model covers all aspects of characterization and modeling of GaN transistors for both RF and Power electronics applications. Chapters cover an in-depth analysis of the industry standard compact model ASM-HEMT for GaN transistors. The book details the core surface-potential calculations and a variety of real device effects, including trapping, self-heating, field plate effects, and more to replicate realistic device behavior. The authors also include chapters on step-by-step parameter extraction procedures for the ASM-HEMT model and benchmark test results. GaN is the fastest emerging technology for RF circuits as well as power electronics. This technology is going to grow at an exponential rate over the next decade. This book is envisioned to serve as an excellent reference for the emerging GaN technology, especially for circuit designers, materials science specialists, device engineers and academic researchers and students. - Provides an overview of the operation and physics of GaN-based transistors - Features in-depth description (by the developers of the model) of all aspects of the industry standard ASM-HEMT model for GaN circuits - Details parameter extraction of GaN devices and measurement data requirements for GaN model extraction
