Design and Development of a Silicon Carbide Chemical Vapor Deposition Reactor PDF Download
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Author: Matthew T. Smith
Publisher:
ISBN:
Category :
Languages : en
Pages :
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ABSTRACT: The design and development of a reactor to make this process controlled and repeatable can be accomplished using theoretical and empirical tools. Fluid flow modeling, reactor sizing, low-pressure pumping and control are engineering concepts that were explored. Work on the design and development of an atmospheric pressure cold-wall CVD (APCVD) reactor will be presented. A detailed discussion of modifications to this reactor to permit hot-wall, low-pressure CVD (LPCVD) operation will then be presented. The consequences of this process variable change will be discussed as well as the necessary design parameters. Computational fluid dynamic (CFD) calculations, which predict the flow patterns of gases in the reaction tube, will be presented. Feasible CVD reactor design that results in laminar fluid flow control is a function of the prior mentioned techniques and will be presented.
Author: Matthew T. Smith
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
ABSTRACT: The design and development of a reactor to make this process controlled and repeatable can be accomplished using theoretical and empirical tools. Fluid flow modeling, reactor sizing, low-pressure pumping and control are engineering concepts that were explored. Work on the design and development of an atmospheric pressure cold-wall CVD (APCVD) reactor will be presented. A detailed discussion of modifications to this reactor to permit hot-wall, low-pressure CVD (LPCVD) operation will then be presented. The consequences of this process variable change will be discussed as well as the necessary design parameters. Computational fluid dynamic (CFD) calculations, which predict the flow patterns of gases in the reaction tube, will be presented. Feasible CVD reactor design that results in laminar fluid flow control is a function of the prior mentioned techniques and will be presented.
Author: Michael Peter Orthner
Publisher:
ISBN:
Category : Chemical reactors
Languages : en
Pages : 248
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Author: Matthew T. Smith
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages :
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Author: Xiu-Tian Yan
Publisher: Springer Science & Business Media
ISBN: 1848828942
Category : Technology & Engineering
Languages : en
Pages : 352
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Book Description
"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.
Author: Hemlock Semiconductor Corporation
Publisher:
ISBN:
Category : Chemical processes
Languages : en
Pages : 62
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Author: Edited by Jong-Hee Park and T.S. Sudarshan
Publisher: ASM International
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 478
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Book Description
This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical sta
Author: Robert Moene
Publisher: Coronet Books
ISBN: 9789040711091
Category : Chemical vapor deposition
Languages : en
Pages : 201
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Author: Sandeep D. Chandrasekaram
Publisher:
ISBN: 9781369234275
Category : Airplanes
Languages : en
Pages : 70
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Book Description
Development of air travel technology is always increasing and fuel efficiency is one of the most important factors that’s being looked into. For a 25% increase in fuel efficiency in the future aeroplanes, reduction in the weight of the engine is one of the factors that should be addressed while increasing the strength and power generated. For this purpose, General Electric Aviation has chosen Silicon Carbide as the material to build the turbine blades of its engines. Silicon carbide works best as it is strong, can withstand high temperature and lightweight. The downside of this material is that it reacts with water vapor at temperatures greater than 2700°F to form volatile Silicon hydroxide from Silicon dioxide, its protective layer; and furthermore it reduces to Silicon monoxide that vaporizes. To counter this problem, scientists at the National Aeronautics & Space Administration (NASA) have found that a rare earth silicate could be used as an environmental barrier coating (EBC) to prevent the exposure of Silicon Carbide to water vapor. The EBC can’t be directly coated on the Silicon Carbide surface as it isn’t chemically adhesive enough, therefore Silicon was chosen to act as the bond coat between the Silicon Carbide and EBC. The goal of this research is to design a reactor for the composites to be coated with Silicon using the reaction and diffusion kinetics determined at higher temperatures and different partial pressures compared to the standard electronics industry. Chemical Vapor Deposition is the technique that will be used in determining the necessary parameters. The findings from this research can be further used in optimizing the utilization of the reagents and optimizing the process economically.
Author: Rinku Pankaj Parikh
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Hemlock Semiconductor Corporation
Publisher:
ISBN:
Category : Chemical processes
Languages : en
Pages : 60
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Book Description
