Deposition of Yttrium Barium Copper Oxide Superconducting Thin Films by RF Magnetron Sputtering PDF Download
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Author: Vijay Dattatraya Parkhe
Publisher:
ISBN:
Category :
Languages : en
Pages : 260
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Author: Vijay Dattatraya Parkhe
Publisher:
ISBN:
Category :
Languages : en
Pages : 260
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Author: Robert Glenn Florence
Publisher:
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Category : Sputtering (Physics)
Languages : en
Pages : 210
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Author: Tamara F. Isaacs-Smith
Publisher:
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Category :
Languages : en
Pages : 56
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Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 31
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Magnetron sputtering deposition is potentially the most economical deposition method for thin films. Presently sputtering can't deposit high temperature superconductors like Yttrium Barium Copper Oxide (YBCO) because of negative oxygen ion bombardment damage. Lowering the plasma discharge voltage to less than 100 volts would decrease such damage and make YBCO economically practical. The goal of this phase I effort was to lower plasma discharge voltages using high magnetic fields. Our results showed that high magnetic fields alone can lower plasma voltages to about 200 volts. Just as important, we showed that plasma impedance was lowered by more than ten times. Low plasma impedance allows high magnetic fields and electron injection into the plasma to be combined to lower plasma voltage to 30 volts. This combination removes the power limitations of electron injection. It should also produce epitaxial quality thin film semiconductors because low voltages allow 'self-bombardment' where the adatoms have the optimum energy to form a crystalline matrix at lower temperatures. The method is also applicable to thin film semiconductors such as II-VI solar cells and III-V films.
Author: Peter Andrew Rosenthal
Publisher:
ISBN:
Category :
Languages : en
Pages : 430
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Author: Charles Wesley Tanger
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Category : High temperature superconductivity
Languages : en
Pages : 198
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Author: Tushar Heramb Dhayagude
Publisher:
ISBN:
Category : High temperature superconductors
Languages : en
Pages : 196
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Author: Vladimir Cort Matijasevic
Publisher:
ISBN:
Category :
Languages : en
Pages : 416
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Author: Zhiyong Jiang
Publisher:
ISBN:
Category : Semiconductor films
Languages : en
Pages : 128
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Author: Wade H. Shafer
Publisher: Springer Science & Business Media
ISBN: 1461573947
Category : Science
Languages : en
Pages : 430
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Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Oata Analysis and Synthesis (CINOAS) * at Purdue. University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna tional publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 33 (thesis year 1988) a total of 13,273 theses titles from 23 Canadian and 1 85 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work. While Volume 33 reports theses submitted in 1988, on occasion, certain univer sities do report theses submitted in previous years but not reported at the time.
