Technology of Gallium Nitride Crystal Growth

Technology of Gallium Nitride Crystal Growth PDF Author: Dirk Ehrentraut
Publisher: Springer Science & Business Media
ISBN: 3642048307
Category : Science
Languages : en
Pages : 337

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Book Description
This book discusses the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production.

Technology of Gallium Nitride Crystal Growth

Technology of Gallium Nitride Crystal Growth PDF Author: Dirk Ehrentraut
Publisher: Springer Science & Business Media
ISBN: 3642048307
Category : Science
Languages : en
Pages : 337

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Book Description
This book discusses the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production.

Crystal Growth of Gallium Nitride

Crystal Growth of Gallium Nitride PDF Author:
Publisher:
ISBN: 9780792375616
Category :
Languages : en
Pages :

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Book Description


Technology of Gallium Nitride Crystal Growth

Technology of Gallium Nitride Crystal Growth PDF Author: Dirk Ehrentraut
Publisher: Springer
ISBN: 9783642048289
Category : Science
Languages : en
Pages : 326

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Book Description
This book discusses the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production.

Substrate Independent Oriented Crystal Growth of Gallium Nitride

Substrate Independent Oriented Crystal Growth of Gallium Nitride PDF Author: Hari Chandrasekaran
Publisher:
ISBN:
Category :
Languages : en
Pages : 194

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Book Description


Ammonothermal Synthesis and Crystal Growth of Nitrides

Ammonothermal Synthesis and Crystal Growth of Nitrides PDF Author: Elke Meissner
Publisher: Springer Nature
ISBN: 3030563057
Category : Technology & Engineering
Languages : en
Pages : 351

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Book Description
This book provides a collection of contributed chapters, delivering a comprehensive overview of topics related to the synthesis and crystal growth of nitride compounds under supercritical ammonia conditions. Focusing on key chemical and technological aspects of ammonothermal synthesis and growth of functional nitride compounds, the book also describes many innovative techniques for in-situ observation and presents new data fundamental for materials synthesis under ammonothermal conditions. With its detailed coverage of many thermodynamic and kinetics aspects, which are necessary for understanding and controlling crystal growth, this contributed volume is the ideal companion to materials chemists and engineers at any point in their journey in this rich and exciting field.

Crystal Growth Technology

Crystal Growth Technology PDF Author: K. Byrappa
Publisher: Springer Science & Business Media
ISBN: 9783540003670
Category : Science
Languages : en
Pages : 618

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Book Description
Crystals are the unacknowledged pillars of modern technology. The modern technological developments depend greatly on the availability of suitable single crystals, whether it is for lasers, semiconductors, magnetic devices, optical devices, superconductors, telecommunication, etc. In spite of great technological advancements in the recent years, we are still in the early stage with respect to the growth of several important crystals such as diamond, silicon carbide, PZT, gallium nitride, and so on. Unless the science of growing these crystals is understood precisely, it is impossible to grow them as large single crystals to be applied in modern industry. This book deals with almost all the modern crystal growth techniques that have been adopted, including appropriate case studies. Since there has been no other book published to cover the subject after the Handbook of Crystal Growth, Eds. DTJ Hurle, published during 1993-1995, this book will fill the existing gap for its readers. The book begins with "Growth Histories of Mineral Crystals" by the most senior expert in this field, Professor Ichiro Sunagawa. The next chapter reviews recent developments in the theory of crystal growth, which is equally important before moving on to actual techniques. After the first two fundamental chapters, the book covers other topics like the recent progress in quartz growth, diamond growth, silicon carbide single crystals, PZT crystals, nonlinear optical crystals, solid state laser crystals, gemstones, high melting oxides like lithium niobates, hydroxyapatite, GaAs by molecular beam epitaxy, superconducting crystals, morphology control, and more. For the first time, the crystal growth modeling has been discussed in detail with reference to PZT and SiC crystals.

Hydride vapour phase epitaxy growth, crystal properties and dopant incorporation in gallium nitride

Hydride vapour phase epitaxy growth, crystal properties and dopant incorporation in gallium nitride PDF Author: Patrick Hofmann
Publisher: BoD – Books on Demand
ISBN: 3752884924
Category : Science
Languages : en
Pages : 166

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Book Description
This dissertation employs doping to investigate basic gallium nitride (GaN) crystal properties and to solve challenges of the hydride vapour phase epitaxy (HVPE) growth process. Whereas the first chapter is a short introduction to the history of the GaN single crystal growth, the 2nd chapter introduces to current crystal growth techniques, discusses properties of the GaN material system and the resulting influence on the applicable crystal growth techniques. HVPE, as a vapour phase epitaxy crystal growth method will be explained in greater detail, with focus on the used vertical reactor and its capabilities for doping. The 3rd chapter then focusses on point defects in GaN, specifically on intentionally introduced extrinsic point defects used for doping purposes, i.e. to achieve p-type, n-type or semi-insulating behaviour. Different dopants will be reviewed before the diffusion of point defects in a solid will be discussed. The in-situ introduction of iron, manganese, and carbon during crystal growth is employed in chapter 4 to compensate the unintentional doping (UID) of the GaN crystals, and therefore to achieve truly semi-insulating behaviour of the HVPE GaN. However the focus of this chapter lies on the characterisation of the pyroelectric coefficient (p), as semi-insulating properties are a necessary requirement for the applied Sharp-Garn measurement method. The creation of tensile stress due to in-situ silicon doping during GaN crystal growth is the topic of the 5th chapter. The tensile stress generation effect will be reproduced and the strain inside the crystal will be monitored ex-situ employing Raman spectroscopy. The n-type doping is achieved by using a vapour phase doping line and a process is developed to hinder the tensile strain generation effect. The 6th chapter concentrates on the delivery of the doping precursor via a solid state doping line, a newly developed doping method. Similar to chapter 5, the doping line is characterised carefully before the germanium doping is employed to the GaN growth. The focus lies on the homogeneity of the germanium doping and it is compared compared to the silicon doping and the vapour phase doping line. Benefits and drawbacks are discussed in conjunction with the obtained results. The germanium doping via solid state doping line is applied to the HVPE GaN growth process to measure accurately growth process related properties unique to the applied set of GaN growth parameters.

Gallium Nitride Bulk Crystal Growth Processes

Gallium Nitride Bulk Crystal Growth Processes PDF Author: Annaïg Denis
Publisher:
ISBN:
Category :
Languages : en
Pages : 28

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Book Description


Vertical GaN and SiC Power Devices

Vertical GaN and SiC Power Devices PDF Author: Kazuhiro Mochizuki
Publisher: Artech House
ISBN: 1630814296
Category : Technology & Engineering
Languages : en
Pages : 308

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Book Description
This unique new resource provides a comparative introduction to vertical Gallium Nitride (GaN) and Silicon Carbide (SiC) power devices using real commercial device data, computer, and physical models. This book uses commercial examples from recent years and presents the design features of various GaN and SiC power components and devices. Vertical verses lateral power semiconductor devices are explored, including those based on wide bandgap materials. The abstract concepts of solid state physics as they relate to solid state devices are explained with particular emphasis on power solid state devices. Details about the effects of photon recycling are presented, including an explanation of the phenomenon of the family tree of photon-recycling. This book offers in-depth coverage of bulk crystal growth of GaN, including hydride vapor-phase epitaxial (HVPE) growth, high-pressure nitrogen solution growth, sodium-flux growth, ammonothermal growth, and sublimation growth of SiC. The fabrication process, including ion implantation, diffusion, oxidation, metallization, and passivation is explained. The book provides details about metal-semiconductor contact, unipolar power diodes, and metal-insulator-semiconductor (MIS) capacitors. Bipolar power diodes, power switching devices, and edge terminations are also covered in this resource.

The Growth of Single Crystals

The Growth of Single Crystals PDF Author: Charles S. Sahagian
Publisher:
ISBN:
Category : Crystal growth
Languages : en
Pages : 74

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Book Description
Single crystals of over 100 different electronically active materials have been synthesized using a variety of methods, including growth by flame-fusion, flux, melt, gel diffusion, low-temperature solution, vapor, as well as synthesis by ultra-high-pressure techniques. These crystals, including a large number of doped specimens, emphasize oxides, garnets, silicates, ferrites, fluorides, as well as a large variety of other electromagnetic materials. Charts are presented giving summary data on single crystals grown, percentage and kind of dopants, growth methods and apparatus, crystal dimensions and other physical characteristics, primary research interest or use, crystal system, class, space group, and pertinent references. Several of the growth methods and recent Laboratory accomplishments are described. (Author).