Combined Experimental and Modelling Studies of Laser Assisted Chemical Vapor Deposition of Copper and Aluminum PDF Download
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Author: Jaesung Han
Publisher:
ISBN:
Category :
Languages : en
Pages : 406
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Book Description
Author: Jaesung Han
Publisher:
ISBN:
Category :
Languages : en
Pages : 406
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Book Description
Author: Satish Kumar Lakshmanan
Publisher:
ISBN:
Category :
Languages : en
Pages : 193
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Book Description
Author: Dieter Bäuerle
Publisher: Springer Science & Business Media
ISBN: 3662040743
Category : Science
Languages : en
Pages : 788
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Book Description
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This third edition has been revised and enlarged to cover new topics such as the synthesis of nanoclusters and nanocrystalline films, ultrashort-pulse laser processing, laser polishing, cleaning, and lithography. Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.
Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 816
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Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 758
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Book Description
Author: Mehul B. Naik
Publisher:
ISBN:
Category :
Languages : en
Pages : 280
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Author:
Publisher:
ISBN:
Category : Materials
Languages : en
Pages : 638
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Book Description
Author: Raja Nassar
Publisher: Springer Science & Business Media
ISBN: 3662087928
Category : Technology & Engineering
Languages : en
Pages : 276
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Book Description
This is the first book to address modelling of systems that are important to the fabrication of three-dimensional microstructures. It is unique in that it focuses on high aspect ratio microtechnology, ranging from ion beam micromachining to x-ray lithography.
Author: Massachusetts Institute of Technology
Publisher:
ISBN:
Category : Materials
Languages : en
Pages : 644
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Author: Brian G. Willis
Publisher:
ISBN:
Category :
Languages : en
Pages : 428
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Book Description
(Cont.) Aluminum chemical vapor deposition (CVD) is a process of interest for semiconductor metalization. Aluminum has been the workhorse metal for interconnect applications since the dawning age of the semiconductor industry. Although aluminum is traditionally deposited with advanced physical vapor deposition (PVD) techniques, new deposition methods, such as CVD, are required as characteristic feature sizes move into the nanometer range. In the present study, a combined experimental/theoretical approach has been implemented to investigate both vapor phase and surface reaction pathways of the aluminum CVD precursor dimethylaluminum hydride (DMAH). DMAH is arguably the best aluminum CVD precursor available, but it has complications including a puzzling liquid and vapor phase chemistry, and an unknown surface chemistry. Detailed knowledge of the deposition process is necessary to design a robust, high yield aluminum CVD process. In the present studies, experimental observations have been taken from the literature for the vapor phase chemistry, and ultra-high vacuum (UHV) surface science studies have been employed to investigate the surface chemistry. Theoretical studies were performed by combining quantum chemistry calculations with transition state theory (TST) and micro-kinetic style estimation of rate parameters ...
