Chemical Vapor Deposition of Amorphous Silicon Films Produced by Using Higher Order Silanes PDF Download
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Author: Amir Mikhail
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 0
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Book Description
Various chemical vapor deposition (CVD) techniques performed by research groups under contract to SERI in the area of chemical vapor deposition of hydrogenated amorphous silicon by using higher order silanes are discussed in this report. The static CVD system was found to produce films with nonuniform stoichiometry. All flow systems were capable of depositing films that produced a short-circuit current density of 10mA/cm2. Results of measurements performed at SERI and at the Naval Research Laboratory led to basic reactor modifications and increased emphasis on substrate diffusion barrier research.
Author: Amir Mikhail
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 0
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Book Description
Various chemical vapor deposition (CVD) techniques performed by research groups under contract to SERI in the area of chemical vapor deposition of hydrogenated amorphous silicon by using higher order silanes are discussed in this report. The static CVD system was found to produce films with nonuniform stoichiometry. All flow systems were capable of depositing films that produced a short-circuit current density of 10mA/cm2. Results of measurements performed at SERI and at the Naval Research Laboratory led to basic reactor modifications and increased emphasis on substrate diffusion barrier research.
Author: Alan Edward Delahoy
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 0
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Book Description
This report describes the preparation of hydrogenated amorphous silicon (a-Si:H) films and photovoltaic devices by chemical vapor deposition (CVD) from higher order silanes and the properties of such films and devices.
Author: Poly Solar, Inc
Publisher:
ISBN:
Category : Photovoltaic power generation
Languages : en
Pages :
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Book Description
Author: Alan Edward Delahoy
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 48
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Book Description
This report describes the preparation of hydrogenated amorphous silicon (a-Si:H) films and photovoltaic devices by chemical vapor deposition (CVD) from higher order silanes and lists the properties of such films and devices. This report summarizes the properties of the experimental thermal CVD films and the reasons for terminating the research in this area. In addition, the results for deposition by mercury-sensitized decomposition of disilane are presented.
Author: Hailan Duan
Publisher:
ISBN:
Category :
Languages : en
Pages : 164
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Book Description
Author: Pio Capezzuto
Publisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339
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Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author: Alan Edward Delahoy
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 0
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Book Description
This report describes the preparation of hydrogenated amorphous silicon (a-Si:H) films and photovoltaic devices by chemical vapor deposition (CVD) from higher order silanes and the properties of such films and devices. This report summarizes the properties of the experimental thermal CVD films and the reasons for terminating the research in this area. In addition, the results for deposition by mercury-sensitized decomposition of disilane are presented.
Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 526
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Book Description
Author:
Publisher:
ISBN:
Category : Photoelectric cells
Languages : en
Pages : 186
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Book Description
Author: M. Meunier
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 4
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Book Description
