Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films PDF Download
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Author: Jeffrey Thomas Barton
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 276
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Book Description
Author: Jeffrey Thomas Barton
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 276
Get Book Here
Book Description
![Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] PDF](https://books.google.com/books/content/images/frontcover/8hsXnQEACAAJ?fife=w80-h100)
Author: Becker, Jill Svenja
Publisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category : Thin film devices
Languages : en
Pages : 308
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Book Description
Author: Tommi Kääriäinen
Publisher: John Wiley & Sons
ISBN: 1118062779
Category : Technology & Engineering
Languages : en
Pages : 274
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Book Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Author: Nicola Pinna
Publisher: John Wiley & Sons
ISBN: 3527639934
Category : Technology & Engineering
Languages : en
Pages : 472
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Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Author: Anthony C. Jones
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
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Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Author: Xinye Liu
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 436
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Book Description
Author: F. Roozeboom
Publisher: The Electrochemical Society
ISBN: 1607685469
Category : Chemical vapor deposition
Languages : en
Pages : 311
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Book Description
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Andrew Y. C. Nee
Publisher: Springer
ISBN: 9781447146698
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Author: J. W. Elam
Publisher: The Electrochemical Society
ISBN: 1607682567
Category :
Languages : en
Pages : 353
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Book Description
