Author: A. Kumar
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 330
Book Description
Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum of research and technology groups currently working on CMP, to review advances made, and to offer a comprehensive discussion of future challenges that must be overcome. The book shows trends in the development of consumables, process modules, tool designs, process integration, modeling, defect characterization, and metrology. Topics include: planarization processes and applications; consumables -CMP pads and slurries; CMP equipment and metrology; and CMP modeling and simulation.
Chemical-Mechanical Planarization: Volume 867
Author: A. Kumar
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 330
Book Description
Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum of research and technology groups currently working on CMP, to review advances made, and to offer a comprehensive discussion of future challenges that must be overcome. The book shows trends in the development of consumables, process modules, tool designs, process integration, modeling, defect characterization, and metrology. Topics include: planarization processes and applications; consumables -CMP pads and slurries; CMP equipment and metrology; and CMP modeling and simulation.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 330
Book Description
Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum of research and technology groups currently working on CMP, to review advances made, and to offer a comprehensive discussion of future challenges that must be overcome. The book shows trends in the development of consumables, process modules, tool designs, process integration, modeling, defect characterization, and metrology. Topics include: planarization processes and applications; consumables -CMP pads and slurries; CMP equipment and metrology; and CMP modeling and simulation.
ULSI Process Integration 5
Author: Cor L. Claeys
Publisher: The Electrochemical Society
ISBN: 1566775728
Category : Integrated circuits
Languages : en
Pages : 509
Book Description
The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.
Publisher: The Electrochemical Society
ISBN: 1566775728
Category : Integrated circuits
Languages : en
Pages : 509
Book Description
The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.
Tribo-chemical Mechanisms of Copper Chemical Mechanical Planarization (CMP)
Author: Shantanu Tripathi
Publisher:
ISBN:
Category :
Languages : en
Pages : 404
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 404
Book Description
Micro- and Nanosystems: Volume 872
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 552
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 552
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Surface Engineering for Manufacturing Applications: Volume 890
Author: Materials Research Society
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Surface interactions and modifications have become increasingly critical for a broad range of manufacturing technologies. Applications can be in traditional manufacturing sectors and in manufacturing processes for microelectronics, optics, and micro-/nanoelectromechanical systems (MEMS/NEMS). Many applications demand engineered surfaces at different length scales that will function under extreme conditions. The goal of this book is to advance understanding of these diverse applications. In the field of tribological coatings, the increasing sophistication of coating processes to provide control over materials and composition gradients is being exploited to tailor properties such as adhesion, stresses, thermal barrier and wear resistance. Understanding the influence of nanostructure in coatings has become pivotal in the development of hard and wear-resistant materials. Modeling and simulation continue to make contributions to the understanding and predication of surface properties and surface interactions. Advances in this field have focused on the microstructure and organization of organic thin films. In tribology, the combination of modeling, with experimental probe techniques, is increasing our understanding of erosion and wear mechanisms.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Surface interactions and modifications have become increasingly critical for a broad range of manufacturing technologies. Applications can be in traditional manufacturing sectors and in manufacturing processes for microelectronics, optics, and micro-/nanoelectromechanical systems (MEMS/NEMS). Many applications demand engineered surfaces at different length scales that will function under extreme conditions. The goal of this book is to advance understanding of these diverse applications. In the field of tribological coatings, the increasing sophistication of coating processes to provide control over materials and composition gradients is being exploited to tailor properties such as adhesion, stresses, thermal barrier and wear resistance. Understanding the influence of nanostructure in coatings has become pivotal in the development of hard and wear-resistant materials. Modeling and simulation continue to make contributions to the understanding and predication of surface properties and surface interactions. Advances in this field have focused on the microstructure and organization of organic thin films. In tribology, the combination of modeling, with experimental probe techniques, is increasing our understanding of erosion and wear mechanisms.
Materials and Devices for Smart Systems II: Volume 888
Author: Yasubumi Furuya
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 408
Book Description
Smart/intelligent systems is a primary technology for present and future applications in areas ranging from everyday life to aerospace missions, from civil to military environments, from robots to information technology. Smart materials are the critical foundation for high-performance smart devices, and smart devices are fundamental components for smart systems. The three cannot be separated. This book bridges the fields of smart materials, sensing and actuating devices, and intelligent systems, and provides an opportunity for researchers from all three arenas to channel information into a coherent, interdisciplinary community. Topics include: piezoelectric actuators; novel devices and systems; shape memory alloys and magnetostrictive devices; nanometer-scale processing and properties; piezoelectric materials; sensor materials and devices; and electroactive polymer actuators.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 408
Book Description
Smart/intelligent systems is a primary technology for present and future applications in areas ranging from everyday life to aerospace missions, from civil to military environments, from robots to information technology. Smart materials are the critical foundation for high-performance smart devices, and smart devices are fundamental components for smart systems. The three cannot be separated. This book bridges the fields of smart materials, sensing and actuating devices, and intelligent systems, and provides an opportunity for researchers from all three arenas to channel information into a coherent, interdisciplinary community. Topics include: piezoelectric actuators; novel devices and systems; shape memory alloys and magnetostrictive devices; nanometer-scale processing and properties; piezoelectric materials; sensor materials and devices; and electroactive polymer actuators.
Symposium
Author: Pierre van Iseghem
Publisher:
ISBN: 9781558998896
Category :
Languages : en
Pages : 1122
Book Description
Publisher:
ISBN: 9781558998896
Category :
Languages : en
Pages : 1122
Book Description
Materials and Devices for Smart Systems
Author:
Publisher:
ISBN:
Category : Dielectric devices
Languages : en
Pages : 408
Book Description
Publisher:
ISBN:
Category : Dielectric devices
Languages : en
Pages : 408
Book Description
Materials, Technology and Reliability for Advanced Interconnects 2005: Volume 863
Author: Paul R. Besser
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 450
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2005.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 450
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2005.
Electroresponsive Polymers and Their Applications: Volume 889
Author: Vivek Bharti
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 280
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 280
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.