Author: Mahshid Karimi
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 0
Book Description
Two layer sputtered BiIn thin films (12-120 nmllayer) act as a micro-fabrication resist with many potential applications. Their physical, chemical, and optical characteristics change after laser exposures that produce a rapid thermal anneal in selected areas. Laser exposed areas have lower reflectivity and higher transparency. The structural and electrical properties of BiIn films before and after annealing was investigated in this thesis work. AFM (Atomic Force Microscopy), XRD (X-ray Diffraction), and TEM (Transmission Electronic Microscopy) show that the as-deposited films are polycrystalline, continuous, but with a rough, island morphology. Furnace or laser anneals in air result in the formation of Bismuth and Indium oxides. The island morphology is maintained but there is evidence of melting and recrystallization. RBS (Rutherford Back Scattering) and NRA (Nuclear Reaction Analysis) analysis confirm that Bi/In films exposed to laser or bate contain a large fraction of oxygen consistent with the XRD, and TEM results. Hall effect measurements show a high electron carrier concentrations of 4 x 10Õcm- ̃for Bi/In films after exposure.
Characterization of Heat Treated Bismuth-Indium Thin Films
Author: Mahshid Karimi
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 0
Book Description
Two layer sputtered BiIn thin films (12-120 nmllayer) act as a micro-fabrication resist with many potential applications. Their physical, chemical, and optical characteristics change after laser exposures that produce a rapid thermal anneal in selected areas. Laser exposed areas have lower reflectivity and higher transparency. The structural and electrical properties of BiIn films before and after annealing was investigated in this thesis work. AFM (Atomic Force Microscopy), XRD (X-ray Diffraction), and TEM (Transmission Electronic Microscopy) show that the as-deposited films are polycrystalline, continuous, but with a rough, island morphology. Furnace or laser anneals in air result in the formation of Bismuth and Indium oxides. The island morphology is maintained but there is evidence of melting and recrystallization. RBS (Rutherford Back Scattering) and NRA (Nuclear Reaction Analysis) analysis confirm that Bi/In films exposed to laser or bate contain a large fraction of oxygen consistent with the XRD, and TEM results. Hall effect measurements show a high electron carrier concentrations of 4 x 10Õcm- ̃for Bi/In films after exposure.
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 0
Book Description
Two layer sputtered BiIn thin films (12-120 nmllayer) act as a micro-fabrication resist with many potential applications. Their physical, chemical, and optical characteristics change after laser exposures that produce a rapid thermal anneal in selected areas. Laser exposed areas have lower reflectivity and higher transparency. The structural and electrical properties of BiIn films before and after annealing was investigated in this thesis work. AFM (Atomic Force Microscopy), XRD (X-ray Diffraction), and TEM (Transmission Electronic Microscopy) show that the as-deposited films are polycrystalline, continuous, but with a rough, island morphology. Furnace or laser anneals in air result in the formation of Bismuth and Indium oxides. The island morphology is maintained but there is evidence of melting and recrystallization. RBS (Rutherford Back Scattering) and NRA (Nuclear Reaction Analysis) analysis confirm that Bi/In films exposed to laser or bate contain a large fraction of oxygen consistent with the XRD, and TEM results. Hall effect measurements show a high electron carrier concentrations of 4 x 10Õcm- ̃for Bi/In films after exposure.
Nuclear Science Abstracts
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 680
Book Description
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 680
Book Description
U.S. Government Research Reports
Author:
Publisher:
ISBN:
Category : Research
Languages : en
Pages : 600
Book Description
Publisher:
ISBN:
Category : Research
Languages : en
Pages : 600
Book Description
Technical Abstract Bulletin
Author: Defense Documentation Center (U.S.)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1032
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1032
Book Description
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 892
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 892
Book Description
Metallurgical Abstracts
Author: Institute of Metals
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 620
Book Description
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 620
Book Description
Journal of the Institute of Metals
Author: Institute of Metals
Publisher:
ISBN:
Category :
Languages : en
Pages : 566
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 566
Book Description
Bell Laboratories Talks and Papers
Author: Bell Telephone Laboratories, inc. Libraries and Information Systems Center
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 950
Book Description
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 950
Book Description
Engineered Materials Abstracts
Author:
Publisher:
ISBN:
Category : Ceramic materials
Languages : en
Pages : 724
Book Description
Publisher:
ISBN:
Category : Ceramic materials
Languages : en
Pages : 724
Book Description
BTL Talks and Papers
Author: Bell Telephone Laboratories, inc. Technical Information Libraries
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 986
Book Description
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 986
Book Description