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Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
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Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author: Raymond F. Baddour
Publisher: Pergamon
ISBN:
Category : Chemical engineering
Languages : en
Pages : 232
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
Get Book Here
Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author: Giorgio Speranza
Publisher: CRC Press
ISBN: 0429559674
Category : Science
Languages : en
Pages : 77
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Book Description
This book provides a survey of the latest research and developments in plasma technology. In an easy and comprehensive manner, it explores what plasma is and the technologies utilized to produce plasma. It then investigates the main applications and their benefits. Different from other books on the topic that focus on specific aspects of plasma technology, the intention is to provide an introduction to all aspects related to plasma technologies. This book will be an ideal resource for graduate students studying plasma technologies, in addition to researchers in physics, engineering, and materials science Features Accessible and easy to understand Provides simple yet exhaustive explanations of the foundations Explores the latest technologies and is filled with practical applications and case studies
Author: M. Capitelli
Publisher: Springer Science & Business Media
ISBN: 1461534003
Category : Science
Languages : en
Pages : 226
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Book Description
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A
Author: P.F. Williams
Publisher: Springer Science & Business Media
ISBN: 9401158843
Category : Technology & Engineering
Languages : en
Pages : 610
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Book Description
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author: J Reece Roth
Publisher: Routledge
ISBN: 1351438700
Category : Science
Languages : en
Pages : 560
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Book Description
Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
Author:
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 108
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Book Description
Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664
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Book Description
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author: Francisco L. Tabarés
Publisher: CRC Press
ISBN: 1000245276
Category : Science
Languages : en
Pages : 317
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Book Description
This book is an up-to-date review of the most important plasma-based techniques for material modification, from microelectronics to biological materials and from fusion plasmas to atmospheric ones. Each its technical chapters is written by long-experienced, internationally recognised researchers. The book provides a deep and comprehensive insight into plasma technology and its associated elemental processes and is illustrated throughout with excellent figures and references to complement each section. Although some of the topics covered can be traced back several decades, care has been taken to emphasize the most recent findings and expected evolution. The first time the word ‘plasma’ appeared in print in a scientific text related to the study of electrical discharges in gases was 1928, when Irving Langmuir published his article ‘Oscillations in Ionized Gases’. It was the baptism of the predominant state of matter in the known universe (it is estimated that up to 99% of matter is plasma), although not on earth, where the conditions of pressure and temperature make normal the states of matter (solid, liquid, gas) which, in global terms, are exotic. It is enough to add energy to a solid (in the form of heat or electromagnetic radiation) to go into the liquid state, from which gas is obtained through an additional supply of energy. If we continue adding energy to the gas, we will partially or totally ionise it and reach a new state of matter, plasma, made up of free electrons, atoms and molecules (electrically neutral particles) and ions (endowed with a positive or a negative electric charge).
