Al2O3 Hosted Attenuated Phase Shift Mask Materials for 157 Nm PDF Download
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Author: Yang Liu
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 142
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Book Description
"The Semiconductor Industry Association Roadmap 2003 has put 157 nm optical lithography as the next generation lithography wavelength for the node of 70 nm integrated circuits and below. The small departure from 193 nm puts more challenge on imaging tools and processes. One of the crucial areas is the exploration of thin film optical materials for mask coatings at vacuum ultraviolet (VUV) wavelength. Attenuated Phase Shift Mask (APSM) is one of the optical enhancement technologies pushing critical dimension of lithography to diffraction limits. As no existing single material satisfies those demanding requirements of APSM, non-stoichiometric composite materials will be explored ... In this case, the individual dielectric response of those constituents must be combined in an effective model to reproduce composite film dielectric response. The relationships between thin film microstructure and optical properties are extremely useful for hte development and characterization of thin films. Effective Media Approximation (EMA) theory will bridge thin film composition and/or microstructure to optical properties. ... This thesis worked on several potential Al2O3 hosted composite materials. By carefully combining the absorbing and non-absorbing components based on the database of RIT lithography research group for optical properties of various materials, the optical properties of the composite thin film can be tailored to achieve the desired requirements by adjusting the deposition conditions, which include reactive gas partial pressure, power and time. Four promising Al2O3 hosted composite materials were proposed and two of them were fabricated and tested with satisfactory results"--Abstract.
Author: Yang Liu
Publisher:
ISBN:
Category : Aluminum oxide
Languages : en
Pages : 142
Get Book Here
Book Description
"The Semiconductor Industry Association Roadmap 2003 has put 157 nm optical lithography as the next generation lithography wavelength for the node of 70 nm integrated circuits and below. The small departure from 193 nm puts more challenge on imaging tools and processes. One of the crucial areas is the exploration of thin film optical materials for mask coatings at vacuum ultraviolet (VUV) wavelength. Attenuated Phase Shift Mask (APSM) is one of the optical enhancement technologies pushing critical dimension of lithography to diffraction limits. As no existing single material satisfies those demanding requirements of APSM, non-stoichiometric composite materials will be explored ... In this case, the individual dielectric response of those constituents must be combined in an effective model to reproduce composite film dielectric response. The relationships between thin film microstructure and optical properties are extremely useful for hte development and characterization of thin films. Effective Media Approximation (EMA) theory will bridge thin film composition and/or microstructure to optical properties. ... This thesis worked on several potential Al2O3 hosted composite materials. By carefully combining the absorbing and non-absorbing components based on the database of RIT lithography research group for optical properties of various materials, the optical properties of the composite thin film can be tailored to achieve the desired requirements by adjusting the deposition conditions, which include reactive gas partial pressure, power and time. Four promising Al2O3 hosted composite materials were proposed and two of them were fabricated and tested with satisfactory results"--Abstract.
Author: John R. Sabin
Publisher: Gulf Professional Publishing
ISBN: 9780120348428
Category : Science
Languages : en
Pages : 504
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Book Description
Advances in Quantum Chemistry presents surveys of current developments in this rapidly developing field that falls between the historically established areas of mathematics, physics, chemistry, and biology. With invited reviews written by leading international researchers, each presenting new results, it provides a single vehicle for following progress in this interdisciplinary area.
Author:
Publisher:
ISBN:
Category : Prosthodontics
Languages : en
Pages : 80
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Book Description
Author: Eugenio Iannone
Publisher: CRC Press
ISBN: 1466560738
Category : Medical
Languages : en
Pages : 1178
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Book Description
Labs on Chip: Principles, Design and Technology provides a complete reference for the complex field of labs on chip in biotechnology. Merging three main areas— fluid dynamics, monolithic micro- and nanotechnology, and out-of-equilibrium biochemistry—this text integrates coverage of technology issues with strong theoretical explanations of design techniques. Analyzing each subject from basic principles to relevant applications, this book: Describes the biochemical elements required to work on labs on chip Discusses fabrication, microfluidic, and electronic and optical detection techniques Addresses planar technologies, polymer microfabrication, and process scalability to huge volumes Presents a global view of current lab-on-chip research and development Devotes an entire chapter to labs on chip for genetics Summarizing in one source the different technical competencies required, Labs on Chip: Principles, Design and Technology offers valuable guidance for the lab-on-chip design decision-making process, while exploring essential elements of labs on chip useful both to the professional who wants to approach a new field and to the specialist who wants to gain a broader perspective.
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2692
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Book Description
Author: International Atomic Energy Agency
Publisher: IAEA
ISBN:
Category : Business & Economics
Languages : en
Pages : 704
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Book Description
This publication is aimed at students and teachers involved in teaching programmes in field of medical radiation physics, and it covers the basic medical physics knowledge required in the form of a syllabus for modern radiation oncology. The information will be useful to those preparing for professional certification exams in radiation oncology, medical physics, dosimetry or radiotherapy technology.
Author: Andrea Chen
Publisher: CRC Press
ISBN: 1439862079
Category : Technology & Engineering
Languages : en
Pages : 216
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Book Description
In semiconductor manufacturing, understanding how various materials behave and interact is critical to making a reliable and robust semiconductor package. Semiconductor Packaging: Materials Interaction and Reliability provides a fundamental understanding of the underlying physical properties of the materials used in a semiconductor package. By tying together the disparate elements essential to a semiconductor package, the authors show how all the parts fit and work together to provide durable protection for the integrated circuit chip within as well as a means for the chip to communicate with the outside world. The text also covers packaging materials for MEMS, solar technology, and LEDs and explores future trends in semiconductor packages.
Author: Anthony E. Hughes
Publisher: Springer
ISBN: 9401775400
Category : Technology & Engineering
Languages : en
Pages : 429
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Book Description
This book covers a broad range of materials science that has been brought to bear on providing solutions to the challenges of developing self-healing and protective coatings for a range of metals. The book has a strong emphasis on characterisation techniques, particularly new techniques that are beginning to be used in the coatings area. It features many contributions written by experts from various industrial sectors which examine the needs of the sectors and the state of the art. The development of self-healing and protective coatings has been an expanding field in recent years and applies a lot of new knowledge gained from other fields as well as other areas of materials science to the development of coatings. It has borrowed from fields such as the food and pharmaceutical industries who have used, polymer techniques, sol-gel science and colloidosome technology for a range encapsulation techniques. It has also borrowed from fields like hydrogen storage such as from the development of hierarchical and other materials based on organic templating as “nanocontainers” for the delivery of inhibitors. In materials science, recent developments in high throughput and other characterisation techniques, such as those available from synchrotrons, are being increasing used for novel characterisation – one only needs to look at the application of these techniques in self healing polymers to gauge wealth of new information that has been gained from these techniques. This work is largely driven by the need to replace environmental pollutants and hazardous chemicals that represent risk to humans such as chromate inhibitors which are still used in some applications.
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
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Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Kjell J. Gåsvik
Publisher: John Wiley & Sons
ISBN: 0470846704
Category : Technology & Engineering
Languages : en
Pages : 372
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Book Description
New material on computerized optical processes, computerized ray tracing, and the fast Fourier transform, Bibre-Bragg sensors, and temporal phase unwrapping. * New introductory sections to all chapters. * Detailed discussion on lasers and laser principles, including an introduction to radiometry and photometry. * Thorough coverage of the CCD camera.
