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Author:
Publisher:
ISBN:
Category : Weights and measures
Languages : en
Pages : 162
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Book Description
Author:
Publisher:
ISBN:
Category : Weights and measures
Languages : en
Pages : 162
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Book Description
Author:
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 374
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Book Description
Author: X. Jane Jiang
Publisher: Academic Press
ISBN: 0128218169
Category : Technology & Engineering
Languages : en
Pages : 376
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Book Description
Advanced Metrology: Freeform Surfaces provides the perfect guide for engineering designers and manufacturers interested in exploring the benefits of this technology. The inclusion of industrial case studies and examples will help readers to implement these techniques which are being developed across different industries as they offer improvements to the functional performance of products and reduce weight and cost. - Includes case studies in every chapter to help readers implement the techniques discussed - Provides unique advice from industry on hot subjects, including surface description and data processing - Features links to online content, including video, code and software
Author: Tom Proulx
Publisher: Springer Science & Business Media
ISBN: 146140228X
Category : Technology & Engineering
Languages : en
Pages : 412
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Book Description
Optical Measurements, Modeling, and Metrology represents one of eight volumes of technical papers presented at the Society for Experimental Mechanics Annual Conference on Experimental and Applied Mechanics, held at Uncasville, Connecticut, June 13-16, 2011. The full set of proceedings also includes volumes on Dynamic Behavior of Materials, Mechanics of Biological Systems and Materials, Mechanics of Time-Dependent Materials and Processes in Conventional and Multifunctional Materials; MEMS and Nanotechnology; Experimental and Applied Mechanics, Thermomechanics and Infra-Red Imaging, and Engineering Applications of Residual Stress.
Author: Sergey Yurish
Publisher: Lulu.com
ISBN: 8409073218
Category : Technology & Engineering
Languages : en
Pages : 300
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Book Description
'Advances in Measurements and Instrumentation: Reviews'Vol. 1 Book Series is covering some aspects related to metrology, sensors, measuring systems and sensor instrumentation as well as related modeling and mathematical tools for measurements in quality control and other applications. The book volume contains seven chapters written by nine contributors from academia and industry from 6 countries: Algeria, Canada, China, Germany, Slovak Republic and United Kingdom. The book will be a valuable tool for those who involved in research and development of various measuring instruments and systems.
Author: Franco Pavese
Publisher: World Scientific
ISBN: 9812839518
Category : Mathematics
Languages : en
Pages : 419
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Book Description
The main theme of the AMCTM 2008 conference, reinforced by the establishment of IMEKO TC21, was to provide a central opportunity for the metrology and testing community worldwide to engage with applied mathematicians, statisticians and software engineers working in the relevant fields. This review volume consists of reviewed papers prepared on the basis of the oral and poster presentations of the Conference participants. It covers all the general matters of advanced statistical modeling (e.g. uncertainty evaluation, experimental design, optimization, data analysis and applications, multiple measurands, correlation, etc.), metrology software (e.g. engineering aspects, requirements or specification, risk assessment, software development, software examination, software tools for data analysis, visualization, experiment control, best practice, standards, etc.), numerical methods (e.g. numerical data analysis, numerical simulations, inverse problems, uncertainty evaluation of numerical algorithms, applications, etc.), and data fusion techniques and design and analysis of inter-laboratory comparisons.
Author: P. Ciarlini
Publisher: World Scientific
ISBN: 9789812702647
Category : Computers
Languages : en
Pages : 376
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Book Description
This volume collects refereed contributions based on the presentations made at the Sixth Workshop on Advanced Mathematical and Computational Tools in Metrology, held at the Istituto di Metrologia OC G. ColonnettiOCO (IMGC), Torino, Italy, in September 2003. It provides a forum for metrologists, mathematicians and software engineers that will encourage a more effective synthesis of skills, capabilities and resources, and promotes collaboration in the context of EU programmes, EUROMET and EA projects, and MRA requirements. It contains articles by an important, worldwide group of metrologists and mathematicians involved in measurement science and, together with the five previous volumes in this series, constitutes an authoritative source for the mathematical, statistical and software tools necessary to modern metrology. The proceedings have been selected for coverage in: . OCo Index to Scientific & Technical Proceedings- (ISTP- / ISI Proceedings). OCo Index to Scientific & Technical Proceedings (ISTP CDROM version / ISI Proceedings). OCo CC Proceedings OCo Engineering & Physical Sciences."
Author: Richard Leach
Publisher:
ISBN: 9780750325240
Category : Metrology
Languages : en
Pages : 0
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Book Description
Advances in Optical Form and Coordinate Metrology covers the latest advances in the development of optical form and coordinate measuring instruments plus the manipulation of point cloud data. The book presents some basic principles of the optical measurement methods and takes a deeper look at the operation of the instruments and the new application areas where they can be applied, with an emphasis on advanced manufacturing. Latest advances discussed include the drive towards faster instruments for in-process applications, the ability to measure highly complex objects (in e.g. additive manufacturing), performance verification and advances in the use of machine learning to enhance data analysis. Part of IOP Series in Emerging Technologies in Optics and Photonics.
Author: Franco Pavese
Publisher: World Scientific
ISBN: 9814468517
Category : Mathematics
Languages : en
Pages : 419
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Book Description
The main theme of the AMCTM 2008 conference, reinforced by the establishment of IMEKO TC21, was to provide a central opportunity for the metrology and testing community worldwide to engage with applied mathematicians, statisticians and software engineers working in the relevant fields.This review volume consists of reviewed papers prepared on the basis of the oral and poster presentations of the Conference participants. It covers all the general matters of advanced statistical modeling (e.g. uncertainty evaluation, experimental design, optimization, data analysis and applications, multiple measurands, correlation, etc.), metrology software (e.g. engineering aspects, requirements or specification, risk assessment, software development, software examination, software tools for data analysis, visualization, experiment control, best practice, standards, etc.), numerical methods (e.g. numerical data analysis, numerical simulations, inverse problems, uncertainty evaluation of numerical algorithms, applications, etc.), and data fusion techniques and design and analysis of inter-laboratory comparisons.
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
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Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
