Advances in Low Temperature Rf Plasmas PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Advances in Low Temperature Rf Plasmas PDF full book. Access full book title Advances in Low Temperature Rf Plasmas by Toshiaki Makabe. Download full books in PDF and EPUB format.
Author: Toshiaki Makabe
Publisher: Elsevier Publishing Company
ISBN: 9780444510952
Category : Low temperature plasmas
Languages : en
Pages : 0
Get Book Here
Book Description
Low temperature plasmas have had a very broad range of applications ever since their discovery. However, recent developments in the dextrous handling of dry etching non-equilibrium plasma have attracted a great common interest that has driving force behind the major developments in diagnostic, theoretical and numerical techniques since the 1980s. A greater fundamental understanding of the kinetics of radio-frequency (rf) plasmas and their interaction with surfaces in regard to the process of large scale integrated circuits has been achieved through the cooperation between academia and industry. At the same time, new applications have become possible, and the basic understanding of low temperature rf plasmas has diffused to other areas of plasma physics. in the special issue of Applied Surface Science, which is published in memory of the International Workshop on Basis for Low Temperature Plasma Applications at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection of topics was to cover the range of issues that represent the building blocks of the complex, vertically integrated plasma simulation schemes including surface processes. The text also shows examples of integrated codes and how they are implemented in the development of new strategies of plasma processing. Such codes may be used both in modern experiments and in the computer aided design and control of the plasma devices of the next generation. These are based on the transport theory of electrons, ions and neutrals, as well as on numerical modellings and on the available collision and transport data describing gas and surface phases. density plasmas. All the chapters present a relatively complete review of the developments in these fields since the 1980s as well as a review of their status of development in 2002, and there is a blend of research reviews from both academia and industry.
Author: Toshiaki Makabe
Publisher: Elsevier Publishing Company
ISBN: 9780444510952
Category : Low temperature plasmas
Languages : en
Pages : 0
Get Book Here
Book Description
Low temperature plasmas have had a very broad range of applications ever since their discovery. However, recent developments in the dextrous handling of dry etching non-equilibrium plasma have attracted a great common interest that has driving force behind the major developments in diagnostic, theoretical and numerical techniques since the 1980s. A greater fundamental understanding of the kinetics of radio-frequency (rf) plasmas and their interaction with surfaces in regard to the process of large scale integrated circuits has been achieved through the cooperation between academia and industry. At the same time, new applications have become possible, and the basic understanding of low temperature rf plasmas has diffused to other areas of plasma physics. in the special issue of Applied Surface Science, which is published in memory of the International Workshop on Basis for Low Temperature Plasma Applications at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection of topics was to cover the range of issues that represent the building blocks of the complex, vertically integrated plasma simulation schemes including surface processes. The text also shows examples of integrated codes and how they are implemented in the development of new strategies of plasma processing. Such codes may be used both in modern experiments and in the computer aided design and control of the plasma devices of the next generation. These are based on the transport theory of electrons, ions and neutrals, as well as on numerical modellings and on the available collision and transport data describing gas and surface phases. density plasmas. All the chapters present a relatively complete review of the developments in these fields since the 1980s as well as a review of their status of development in 2002, and there is a blend of research reviews from both academia and industry.
Author: Herman V. Boenig
Publisher: CRC Press
ISBN:
Category : Science
Languages : en
Pages : 300
Get Book Here
Book Description
Author: Riccardo d'Agostino
Publisher: John Wiley & Sons
ISBN: 3527622195
Category : Science
Languages : en
Pages : 479
Get Book Here
Book Description
A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.
Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1482222108
Category : Science
Languages : en
Pages : 406
Get Book Here
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental
Author: Aamir Shahzad
Publisher: BoD – Books on Demand
ISBN: 1837697906
Category : Science
Languages : en
Pages : 80
Get Book Here
Book Description
This book summarizes the most significant advancements of plasma science in allied technologies. It highlights the most recent developments and important advances in plasma science and technology. It is important for all civilizations to use more cost-effective and eco-friendly plasma technology for industrial, clinical/biotechnology, wastewater, and agricultural applications. Traditional techniques are not effective, and thus, this book examines the challenges that must be solved before novel plasma technology can be successfully used in the future. It also examines aspects of fine particle plasmas, including their fundamental physics, mechanisms, design, allied technologies, and novel methods. The most promising plasma-based devices and nano-plasmas allow us to change approaches in industries such as medicine and agriculture due to their thermophysical (transport and thermodynamics), wave behaviors, as well as external electric and magnetic, acoustic, light, temperature, and other properties. This book highlights recent advances in energy materials, semiconductor systems, plasma medicine, agricultural plasma and food processing, green plasma fusion energy, space science, plasma technology for the conversion of CO2, green energy, and more. Moreover, it examines plasma technology as a key advancement in modern medicine and health care.
Author: Shi Nguyen-Kuok
Publisher: Springer
ISBN: 3319437216
Category : Science
Languages : en
Pages : 508
Get Book Here
Book Description
This book offers the reader an overview of the basic approaches to the theoretical description of low-temperature plasmas, covering numerical methods, mathematical models and modeling techniques. The main methods of calculating the cross sections of plasma particle interaction and the solution of the kinetic Boltzmann equation for determining the transport coefficients of the plasma are also presented. The results of calculations of thermodynamic properties, transport coefficients, the equilibrium particle-interaction cross sections and two-temperature plasmas are also discussed. Later chapters consider applications, and the results of simulation and calculation of plasma parameters in induction and arc plasma torches are presented. The complex physical processes in high-frequency plasmas and arc plasmas, the internal and external parameters of plasma torches, near-electrode processes, heat transfer, the flow of solid particles in plasmas and other phenomena are considered. The book is intended for professionals involved in the theoretical study of low-temperature plasmas and the design of plasma torches, and will be useful for advanced students in related areas.
Author: Oleg O. Baranov
Publisher: Springer Nature
ISBN: 3031020359
Category : Technology & Engineering
Languages : en
Pages : 82
Get Book Here
Book Description
Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
Author: Jurgen Meichsner
Publisher: CRC Press
ISBN: 1420059165
Category : Science
Languages : en
Pages : 566
Get Book Here
Book Description
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.
Author:
Publisher: ScholarlyEditions
ISBN: 1481683578
Category : Science
Languages : en
Pages : 974
Get Book Here
Book Description
Advances in Oxygen Research and Application: 2013 Edition is a ScholarlyBrief™ that delivers timely, authoritative, comprehensive, and specialized information about ZZZAdditional Research in a concise format. The editors have built Advances in Oxygen Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about ZZZAdditional Research in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Advances in Oxygen Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Author: Pascal Chabert
Publisher: Cambridge University Press
ISBN: 9780521763004
Category : Science
Languages : en
Pages : 392
Get Book Here
Book Description
Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.
