Author: B. H. Loo
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Use of Surface Enhanced Raman Spectroscopy SERS in the Study of Corrosion Inhibition and Passivation Processes on Copper and Copper Base- Alloys
Author: B. H. Loo
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Metals Abstracts
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1076
Book Description
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1076
Book Description
Use of Surface-enhanced Raman Spectroscopy in the Study of the Adsorption Behaviors of Corrosion Inhibitors on Metal Surfaces
Author: Albert Thomas Fakhri El-Hage
Publisher:
ISBN:
Category : Raman spectroscopy
Languages : en
Pages : 200
Book Description
Publisher:
ISBN:
Category : Raman spectroscopy
Languages : en
Pages : 200
Book Description
A Surface Enhanced Raman Spectroscopy (SERS) Study of Adsorption of Corrosion Inhibitors
Author: Ashish Agarwal
Publisher:
ISBN:
Category :
Languages : en
Pages : 304
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 304
Book Description
Metals Abstracts Index
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1390
Book Description
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1390
Book Description
Application of Surface Enhanced Raman Spectroscopy (SERS) to In-situ Study of Passive Films on Iron and Steel in Aqueous Solutions
Author: Jing Gui
Publisher:
ISBN:
Category :
Languages : en
Pages : 528
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 528
Book Description
Applications of Raman Spectroscopy in Cu-CMP and in BEOL Cleaning Chemistries
Author: Siddartha Kondoju
Publisher:
ISBN:
Category :
Languages : en
Pages : 320
Book Description
In copper chemical mechanical planarization (CMP), in situ detection of barrier to dielectric layer transition is typically done using an optical reflectance technique. The introduction of carbon doped oxides (CDOs) as low-dielectric constant (k) materials for dielectric layers has opened up the possibility of using spectroscopic techniques for detecting such transitions more efficiently. The vibrational frequencies of the bonds between C, H, O, and Si in these low-k materials may be readily detected by spectroscopic techniques such as Raman and infrared (IR) spectroscopies. Since CMP is carried out in aqueous media, IR spectroscopy is not very desirable due to strong absorption of water in the same region as C-H vibrations (2800 cm-1 to 3300 cm-1). In contrast, Raman spectroscopy shows minimal water interference and can be used to efficiently monitor the signal from CDO films even in aqueous environments that prevail under CMP conditions. The research reported in this dissertation concerns the use of Raman spectroscopy in detecting the transition from tantalum (Ta) barrier layer to CDO dielectric layer, in-situ. Intensities of Raman peaks characteristic of Si-Si vibrations from silicon substrates and C-H vibrations from low-k materials were used for monitoring CDO thickness and detecting removal of Ta layer. An abrasion cell was integrated with a Raman spectrometer to demonstrate the feasibility of Raman monitoring in-situ. Additionally, an alternative method was investigated for monitoring transitions in highly fluorescent low-k materials where Raman can not be used. The fluorescence intensity was used to effectively monitor Ta to low-k transitions. As a secondary objective, the Raman technique was used to monitor the composition of polishing slurries, which in the case of copper CMP, have a rich chemistry, which may change during the course of polishing due to consumption and decomposition of certain constituents. Various aspects, such as small layer thickness (50μm), continuous flow of the slurry, and dynamics of the film removal process pose a great challenge to the monitoring of slurry components between the pad and the wafer. The slurry constituents such as oxidants and corrosion inhibitors have unique signatures that can be detected using spectroscopic techniques. In this study Raman spectroscopy was used to detect and quantify chemical species such as hydroxylamine, benzotriazole and hydrogen peroxide in-situ. A more detailed study pertaining to the protonation of hydroxylamine with respect to the pH was also performed. Finally, surface enhanced Raman spectroscopy (SERS) was also investigated to improve the detection of pyridine and benzotriazole at low concentrations (100ppm).
Publisher:
ISBN:
Category :
Languages : en
Pages : 320
Book Description
In copper chemical mechanical planarization (CMP), in situ detection of barrier to dielectric layer transition is typically done using an optical reflectance technique. The introduction of carbon doped oxides (CDOs) as low-dielectric constant (k) materials for dielectric layers has opened up the possibility of using spectroscopic techniques for detecting such transitions more efficiently. The vibrational frequencies of the bonds between C, H, O, and Si in these low-k materials may be readily detected by spectroscopic techniques such as Raman and infrared (IR) spectroscopies. Since CMP is carried out in aqueous media, IR spectroscopy is not very desirable due to strong absorption of water in the same region as C-H vibrations (2800 cm-1 to 3300 cm-1). In contrast, Raman spectroscopy shows minimal water interference and can be used to efficiently monitor the signal from CDO films even in aqueous environments that prevail under CMP conditions. The research reported in this dissertation concerns the use of Raman spectroscopy in detecting the transition from tantalum (Ta) barrier layer to CDO dielectric layer, in-situ. Intensities of Raman peaks characteristic of Si-Si vibrations from silicon substrates and C-H vibrations from low-k materials were used for monitoring CDO thickness and detecting removal of Ta layer. An abrasion cell was integrated with a Raman spectrometer to demonstrate the feasibility of Raman monitoring in-situ. Additionally, an alternative method was investigated for monitoring transitions in highly fluorescent low-k materials where Raman can not be used. The fluorescence intensity was used to effectively monitor Ta to low-k transitions. As a secondary objective, the Raman technique was used to monitor the composition of polishing slurries, which in the case of copper CMP, have a rich chemistry, which may change during the course of polishing due to consumption and decomposition of certain constituents. Various aspects, such as small layer thickness (50μm), continuous flow of the slurry, and dynamics of the film removal process pose a great challenge to the monitoring of slurry components between the pad and the wafer. The slurry constituents such as oxidants and corrosion inhibitors have unique signatures that can be detected using spectroscopic techniques. In this study Raman spectroscopy was used to detect and quantify chemical species such as hydroxylamine, benzotriazole and hydrogen peroxide in-situ. A more detailed study pertaining to the protonation of hydroxylamine with respect to the pH was also performed. Finally, surface enhanced Raman spectroscopy (SERS) was also investigated to improve the detection of pyridine and benzotriazole at low concentrations (100ppm).
Electrochemical and Optical Techniques for the Study and Monitoring of Metallic Corrosion
Author: M.G.S Ferreira
Publisher: Springer Science & Business Media
ISBN: 940113636X
Category : Technology & Engineering
Languages : en
Pages : 714
Book Description
In spite of considerable efforts over the years to understand and combat materials degradation via corrosion processes, many challenges still remain both in the theoretical understanding of the phenomena and in seeking pratical solutions to the perennial problem. Progress has been slow due to the complexity of the processes and the systems involved. Fortunately, in recent years there has been a renaissance in the development of new electrochemical and optical techniques, as well as advances in instrumentation, which have greatly aided our quest to gain insight into the complex mechanisms involved in metallic corrosion and passivation. Numerous scientific meetings, symposia, and workshops have been held allover the world which attest to the frenzy of activities in corrosion science and technology. However, most of these conferences have dealt mainly with recent research results. There appeared to be a need to assess and disseminate our present state of knowledge in the field as regards measurement techniques, theory, and instrumentation. The present NATO Advanced Study Institute was therefore held in Viana do Castelo, Portugal from July 9 to 21, 1989. The Institute consisted of a series of tutorial lectures, poster sessions, and round-table discussions interspersed evenly over the two-week period. It was attended by 75 participants from several countries representing industry, government and university laboratories.
Publisher: Springer Science & Business Media
ISBN: 940113636X
Category : Technology & Engineering
Languages : en
Pages : 714
Book Description
In spite of considerable efforts over the years to understand and combat materials degradation via corrosion processes, many challenges still remain both in the theoretical understanding of the phenomena and in seeking pratical solutions to the perennial problem. Progress has been slow due to the complexity of the processes and the systems involved. Fortunately, in recent years there has been a renaissance in the development of new electrochemical and optical techniques, as well as advances in instrumentation, which have greatly aided our quest to gain insight into the complex mechanisms involved in metallic corrosion and passivation. Numerous scientific meetings, symposia, and workshops have been held allover the world which attest to the frenzy of activities in corrosion science and technology. However, most of these conferences have dealt mainly with recent research results. There appeared to be a need to assess and disseminate our present state of knowledge in the field as regards measurement techniques, theory, and instrumentation. The present NATO Advanced Study Institute was therefore held in Viana do Castelo, Portugal from July 9 to 21, 1989. The Institute consisted of a series of tutorial lectures, poster sessions, and round-table discussions interspersed evenly over the two-week period. It was attended by 75 participants from several countries representing industry, government and university laboratories.
Directory of Graduate Research
Author: American Chemical Society. Committee on Professional Training
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages : 1294
Book Description
Publisher:
ISBN:
Category : Chemical engineering
Languages : en
Pages : 1294
Book Description
The Application of Surface Enhanced Raman Spectroscopy to the In Situ Study of Passivity and Inhibition
Author: Lucy Jane Oblonsky
Publisher:
ISBN:
Category :
Languages : en
Pages : 304
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 304
Book Description