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Author: K.L. Mittal
Publisher: Springer Science & Business Media
ISBN: 1468491261
Category : Science
Languages : en
Pages : 341
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Book Description
Author: K.L. Mittal
Publisher: Springer Science & Business Media
ISBN: 1468491261
Category : Science
Languages : en
Pages : 341
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Book Description
Author: Rajiv Kohli
Publisher: Elsevier
ISBN: 0128155787
Category : Technology & Engineering
Languages : en
Pages : 832
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Book Description
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. - Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field - Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries - Serves as a guide to the selection of precision cleaning techniques for specific applications
Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 0323312713
Category : Technology & Engineering
Languages : en
Pages : 235
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Book Description
As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area.Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. - Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination - Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others - Covers novel wet and dry surface cleaning methods of increasing commercial importance
Author: Michel Andre Aegerter
Publisher: Springer Science & Business Media
ISBN: 0387889531
Category : Technology & Engineering
Languages : en
Pages : 474
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Book Description
Sol-Gel Techniques for Glass Producers and Users provides technological information, descriptions and characterizations of prototypes, or products already on the market, and illustrates advantages and disadvantages of the sol-gel process in comparison to other methods. The first chapter entitled "Wet Chemical Technology" gives a summary of the basic principles of the sol-gel chemistry. The most promising applications are related to coatings. Chapter 2 describes the various "Wet Chemical Coating Technologies" from glass cleaning to many deposition and post-coating treatment techniques. These include patterning of coatings through direct or indirect techniques which have became very important and for which the sol-gel processing is particularly well adapted. Chapter 3 entitled "Bulk Glass Technologies" reports on the preparation of special glasses for different applications. Chapter 4 entitled "Coatings and Materials Properties" describes the properties of the different coatings and the sol-gel materials, fibers and powders. The chapter also includes a section dedicated to the characterization techniques especially applied to sol-gel coatings and products.
Author:
Publisher:
ISBN:
Category : Semiconductor wafers
Languages : en
Pages : 458
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Book Description
Author: Jerzy Rużyłło
Publisher: The Electrochemical Society
ISBN: 9781566774116
Category : Technology & Engineering
Languages : en
Pages : 452
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Book Description
Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 1437778313
Category : Science
Languages : en
Pages : 311
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Book Description
Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: - A systems analysis approach to contamination control - Physical factors that influence the behavior of particle deposition in enclosures - An overview of current yield models and description of advanced models - Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants - In-depth coverage of ultrasonic cleaning - Contamination and cleaning issues at the nanoscale - Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning
Author: Kashmiri Lal Mittal
Publisher: VSP
ISBN: 9789067643122
Category : Technology & Engineering
Languages : en
Pages : 366
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Book Description
This volume documents the Proceedings of the 5th and 6th Symposia on Particles on Surfaces: Detection, Adhesion and Removal, held under the aegis of the Fine Particle Society in Chicago (May 6--9, 1996) and Dallas (April 1--3, 1998), respectively. The technical programs clearly reflected an interest and need to ameliorate the existing methods and to devise new and more efficient ways to detect, analyze and characterize particles on surfaces. The removal of particles from a host of surfaces was especially highlighted; the need to remove smaller and smaller particles was particularly underscored. All manuscripts included in this volume were properly peer reviewed and all were revised before inclusion in this volume. Thus, this book is not a mere collection of unreviewed papers, but represents information that has passed peer scrutiny. Furthermore, the authors of the 5th Symposium were asked to update the information. So, the information presented in this book should be as fresh and up-to-date as possible. This volume is divided into two parts: Part 1. General Papers and Part 2. Particle Adhesion and Removal. The topics covered include: high-sensitivity rapid detection of particles; detection of particles using evanescent wave scattering; particles on the backside of wafers; particle shedding from fluid-handling components; dynamics of particle adhesion; particle dispersion/aggregation; precision cleaning; and particle removal by surfactants, supercritical fluids, hydrodynamic forces, high-speed droplet impinging, megasonic, CO2 blasting, CO2 snow, argon aerosol, lasers, microcluster beams, brush and chemical-mechanical methods. This volume offers bountiful information and represent a current commentary on the R&D activity taking place in the area of particles on surfaces, particularly particle removal from a variety of surfaces.
Author: Kashmiri L. Mittal
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Kash L. Mittal
Publisher: CRC Press
ISBN: 9047403282
Category : Science
Languages : en
Pages : 373
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Book Description
This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination
