Author: Chennupati Jagadish
Publisher: Elsevier Science
ISBN: 9781483299679
Category : Science
Languages : en
Pages : 600
Book Description
With an in-depth exploration of the following topics, this book covers the broad uses of zinc oxide within the fields of materials science and engineering: - Recent advances in bulk, thin film and nanowire growth of ZnO (including MBE, MOCVD and PLD), - The characterization of the resulting material (including the related ternary systems ZgMgO and ZnCdO), - Improvements in device processing modules (including ion implantation for doping and isolation, Ohmic and Schottky contacts, wet and dry etching), - The role of impurities and defects on materials properties - Applications of ZnO in UV light emitters/detectors, gas, biological and chemical-sensing, transparent electronics, spintronics and thin film
Zinc Oxide Bulk, Thin Films and Nanostructures: Processing, Properties, and Applications
Author: Chennupati Jagadish
Publisher: Elsevier Science
ISBN: 9781483299679
Category : Science
Languages : en
Pages : 600
Book Description
With an in-depth exploration of the following topics, this book covers the broad uses of zinc oxide within the fields of materials science and engineering: - Recent advances in bulk, thin film and nanowire growth of ZnO (including MBE, MOCVD and PLD), - The characterization of the resulting material (including the related ternary systems ZgMgO and ZnCdO), - Improvements in device processing modules (including ion implantation for doping and isolation, Ohmic and Schottky contacts, wet and dry etching), - The role of impurities and defects on materials properties - Applications of ZnO in UV light emitters/detectors, gas, biological and chemical-sensing, transparent electronics, spintronics and thin film
Publisher: Elsevier Science
ISBN: 9781483299679
Category : Science
Languages : en
Pages : 600
Book Description
With an in-depth exploration of the following topics, this book covers the broad uses of zinc oxide within the fields of materials science and engineering: - Recent advances in bulk, thin film and nanowire growth of ZnO (including MBE, MOCVD and PLD), - The characterization of the resulting material (including the related ternary systems ZgMgO and ZnCdO), - Improvements in device processing modules (including ion implantation for doping and isolation, Ohmic and Schottky contacts, wet and dry etching), - The role of impurities and defects on materials properties - Applications of ZnO in UV light emitters/detectors, gas, biological and chemical-sensing, transparent electronics, spintronics and thin film
Physico-Chemical Phenomena in Thin Films and at Solid Surfaces
Author:
Publisher: Elsevier
ISBN: 0080480012
Category : Science
Languages : en
Pages : 800
Book Description
The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.· Unified approach to the description of numerous physico-chemical phenomena in different materials· Based on the pioneering research work of the authors· Explantion of a variety of experimental observations· Material is presented at two levels of complexity for specialists and non-specialists · Identifies existing and potential applications of the processes and phenomena · Includes questions at the end of some chapters to further reinforce the material discussed
Publisher: Elsevier
ISBN: 0080480012
Category : Science
Languages : en
Pages : 800
Book Description
The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.· Unified approach to the description of numerous physico-chemical phenomena in different materials· Based on the pioneering research work of the authors· Explantion of a variety of experimental observations· Material is presented at two levels of complexity for specialists and non-specialists · Identifies existing and potential applications of the processes and phenomena · Includes questions at the end of some chapters to further reinforce the material discussed
Engineering Thin Films and Nanostructures with Ion Beams
Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1420028294
Category : Technology & Engineering
Languages : en
Pages : 592
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Publisher: CRC Press
ISBN: 1420028294
Category : Technology & Engineering
Languages : en
Pages : 592
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Nanostructured Thin Films
Author: Maria Benelmekki
Publisher: Elsevier
ISBN: 0081025734
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. - Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting - Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods - Explores how modifying the structure of thin films for specific applications enhances their performance
Publisher: Elsevier
ISBN: 0081025734
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. - Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting - Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods - Explores how modifying the structure of thin films for specific applications enhances their performance
Functional Thin Films and Nanostructures for Sensors
Author: Anis Zribi
Publisher: Springer Science & Business Media
ISBN: 0387686096
Category : Technology & Engineering
Languages : en
Pages : 224
Book Description
This book discusses advances in functional thin films for sensors and novel concepts for future breakthroughs. The focus is on guidelines and design rules for sensor systems, interaction between functional thin films and other sensor subsystems, fundamentals behind the intrinsic functionality in sensing thin films and nanostructures, state-of-the-art technologies used to develop sensors today and concrete examples of sensor designs.
Publisher: Springer Science & Business Media
ISBN: 0387686096
Category : Technology & Engineering
Languages : en
Pages : 224
Book Description
This book discusses advances in functional thin films for sensors and novel concepts for future breakthroughs. The focus is on guidelines and design rules for sensor systems, interaction between functional thin films and other sensor subsystems, fundamentals behind the intrinsic functionality in sensing thin films and nanostructures, state-of-the-art technologies used to develop sensors today and concrete examples of sensor designs.
Springer Handbook of Surface Science
Author: Mario Rocca
Publisher: Springer Nature
ISBN: 3030469069
Category : Science
Languages : en
Pages : 1273
Book Description
This handbook delivers an up-to-date, comprehensive and authoritative coverage of the broad field of surface science, encompassing a range of important materials such metals, semiconductors, insulators, ultrathin films and supported nanoobjects. Over 100 experts from all branches of experiment and theory review in 39 chapters all major aspects of solid-state surfaces, from basic principles to applications, including the latest, ground-breaking research results. Beginning with the fundamental background of kinetics and thermodynamics at surfaces, the handbook leads the reader through the basics of crystallographic structures and electronic properties, to the advanced topics at the forefront of current research. These include but are not limited to novel applications in nanoelectronics, nanomechanical devices, plasmonics, carbon films, catalysis, and biology. The handbook is an ideal reference guide and instructional aid for a wide range of physicists, chemists, materials scientists and engineers active throughout academic and industrial research.
Publisher: Springer Nature
ISBN: 3030469069
Category : Science
Languages : en
Pages : 1273
Book Description
This handbook delivers an up-to-date, comprehensive and authoritative coverage of the broad field of surface science, encompassing a range of important materials such metals, semiconductors, insulators, ultrathin films and supported nanoobjects. Over 100 experts from all branches of experiment and theory review in 39 chapters all major aspects of solid-state surfaces, from basic principles to applications, including the latest, ground-breaking research results. Beginning with the fundamental background of kinetics and thermodynamics at surfaces, the handbook leads the reader through the basics of crystallographic structures and electronic properties, to the advanced topics at the forefront of current research. These include but are not limited to novel applications in nanoelectronics, nanomechanical devices, plasmonics, carbon films, catalysis, and biology. The handbook is an ideal reference guide and instructional aid for a wide range of physicists, chemists, materials scientists and engineers active throughout academic and industrial research.
Glancing Angle Deposition of Thin Films
Author: Matthew M. Hawkeye
Publisher: John Wiley & Sons
ISBN: 1118847334
Category : Technology & Engineering
Languages : en
Pages : 435
Book Description
This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.
Publisher: John Wiley & Sons
ISBN: 1118847334
Category : Technology & Engineering
Languages : en
Pages : 435
Book Description
This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.
High-Resolution X-Ray Scattering
Author: Ullrich Pietsch
Publisher: Springer Science & Business Media
ISBN: 9780387400921
Category : Technology & Engineering
Languages : en
Pages : 432
Book Description
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
Publisher: Springer Science & Business Media
ISBN: 9780387400921
Category : Technology & Engineering
Languages : en
Pages : 432
Book Description
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
Interface Controlled Organic Thin Films
Author: Horst-Günter Rubahn
Publisher: Springer Science & Business Media
ISBN: 3540959300
Category : Technology & Engineering
Languages : en
Pages : 208
Book Description
Organic semiconductors are a central topic of advanced materials research. The book is aiming at bridging the gap between the development and production of devices and basic research on thin film characterisation using cutting-edge techniques in surface and interface science. Topics involve organic molecular-based sensors; interfaces in organic diodes and transistors; mobility in organic field effect transistors and space charge problems; integration of optoelectronic nanostructures; nonlinear optical properties of organic nanostructures; the wetting layer problem; how to get from functionalized molecules to nanoaggregates; optical, electrical and mechanical properties of organic nanofibers as well; as near field investigations of organic thin films.
Publisher: Springer Science & Business Media
ISBN: 3540959300
Category : Technology & Engineering
Languages : en
Pages : 208
Book Description
Organic semiconductors are a central topic of advanced materials research. The book is aiming at bridging the gap between the development and production of devices and basic research on thin film characterisation using cutting-edge techniques in surface and interface science. Topics involve organic molecular-based sensors; interfaces in organic diodes and transistors; mobility in organic field effect transistors and space charge problems; integration of optoelectronic nanostructures; nonlinear optical properties of organic nanostructures; the wetting layer problem; how to get from functionalized molecules to nanoaggregates; optical, electrical and mechanical properties of organic nanofibers as well; as near field investigations of organic thin films.
Non-Crystalline Films for Device Structures
Author:
Publisher: Elsevier
ISBN: 0080542956
Category : Science
Languages : en
Pages : 279
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.
Publisher: Elsevier
ISBN: 0080542956
Category : Science
Languages : en
Pages : 279
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.