Theoretical Study of Laser-Stimulated Chemical Vapor Deposition Processes of Importance in Microelectronics PDF Download
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Author: T. F. George
Publisher:
ISBN:
Category :
Languages : en
Pages : 36
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Book Description
Recent experiments have demonstrated that laser radiation incident on a gas surface interface can stimulate and control the process of vapor deposition onto the surface. This research project has been a theoretical analysis of the deposition and related laser-stimulated processes, with special attention given to the microscopic dynamics of energy flow associated with such processes. (Author).
Author: T. F. George
Publisher:
ISBN:
Category :
Languages : en
Pages : 36
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Book Description
Recent experiments have demonstrated that laser radiation incident on a gas surface interface can stimulate and control the process of vapor deposition onto the surface. This research project has been a theoretical analysis of the deposition and related laser-stimulated processes, with special attention given to the microscopic dynamics of energy flow associated with such processes. (Author).
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 702
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Author:
Publisher:
ISBN:
Category : Military research
Languages : en
Pages : 588
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Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
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Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author: S. Sivaram
Publisher: Springer
ISBN:
Category : Science
Languages : en
Pages : 312
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Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author:
Publisher:
ISBN:
Category : Lasers
Languages : en
Pages : 836
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Book Description
Author: J. Mazumder
Publisher:
ISBN: 9781489914316
Category :
Languages : en
Pages : 408
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Book Description
Author: J. T. Lin
Publisher:
ISBN:
Category :
Languages : en
Pages : 58
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Book Description
Theory and experiments are reviewed for how laser radiation can stimulate various component mechanisms which contribute to the complex chemistry involved in heterogeneous catalysis. These mechanisms include the processes of desorption, migration and chemical reactions at a gas-solid interface. Application of laser-induced surface chemistry to microelectronics in circuit deposition, lithography, annealing and final testing of the circuit are discussed. In addition to the review, some new theory is presented.
Author: Arthur Sherman
Publisher:
ISBN:
Category :
Languages : en
Pages : 215
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 1140
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Book Description
