Author: Hisham Z. Massoud
Publisher:
ISBN:
Category : Nature
Languages : en
Pages : 562
Book Description
The Physics and Chemistry of SiO2 and the Si-SiO2 Interface--4, 2000
Author: Hisham Z. Massoud
Publisher:
ISBN:
Category : Nature
Languages : en
Pages : 562
Book Description
Publisher:
ISBN:
Category : Nature
Languages : en
Pages : 562
Book Description
Semiconductor Silicon 2002
Author: Howard R. Huff
Publisher: The Electrochemical Society
ISBN: 9781566773744
Category : Science
Languages : en
Pages : 650
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773744
Category : Science
Languages : en
Pages : 650
Book Description
Silicon Nitride and Silicon Dioxide Thin Insulating Films
Author:
Publisher:
ISBN:
Category : Silicon dioxide
Languages : en
Pages : 306
Book Description
Publisher:
ISBN:
Category : Silicon dioxide
Languages : en
Pages : 306
Book Description
Rapid Thermal and Other Short-time Processing Technologies II
Author: Dim-Lee Kwong
Publisher: The Electrochemical Society
ISBN: 9781566773157
Category : Technology & Engineering
Languages : en
Pages : 458
Book Description
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Publisher: The Electrochemical Society
ISBN: 9781566773157
Category : Technology & Engineering
Languages : en
Pages : 458
Book Description
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Silicon Nitride and Silicon Dioxide Thin Insulating Films
Author: Electrochemical Society. Dielectric Science and Technology Division
Publisher: The Electrochemical Society
ISBN: 9781566773133
Category : Science
Languages : en
Pages : 304
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773133
Category : Science
Languages : en
Pages : 304
Book Description
Silicon Nitride and Silicon Dioxide Thin Insulating Films VII
Author: Electrochemical Society. Meeting
Publisher: The Electrochemical Society
ISBN: 9781566773478
Category : Science
Languages : en
Pages : 652
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773478
Category : Science
Languages : en
Pages : 652
Book Description
Corrosion Mechanisms in Theory and Practice, Third Edition
Author: Philippe Marcus
Publisher: CRC Press
ISBN: 1420094629
Category : Mathematics
Languages : en
Pages : 944
Book Description
Updated to include recent results from intensive worldwide research efforts in materials science, surface science, and corrosion science, Corrosion Mechanisms in Theory and Practice, Third Edition explores the latest advances in corrosion and protection mechanisms. It presents a detailed account of the chemical and electrochemical surface reactions that govern corrosion as well as the link between microscopic forces and macroscopic behavior. Revised and expanded, this edition includes four new chapters on corrosion fundamentals, the passivity of metals, high temperature corrosion, and the corrosion of aluminum alloys. The first half of the book covers basic aspects of corrosion, such as entry of hydrogen into metals, anodic dissolution, localized corrosion, stress corrosion cracking, and corrosion fatigue. Connecting the theoretical aspects of corrosion mechanisms to practical applications in industry, the second half of the text discusses corrosion inhibition, atmospheric corrosion, microbially induced corrosion, corrosion in nuclear systems, corrosion of microelectronic and magnetic data-storage devices, and organic coatings. With contributions from leading academic and industrial researchers, this bestselling book continues to provide a thorough understanding of corrosion mechanisms—helping you solve existing corrosion challenges and prevent future problems.
Publisher: CRC Press
ISBN: 1420094629
Category : Mathematics
Languages : en
Pages : 944
Book Description
Updated to include recent results from intensive worldwide research efforts in materials science, surface science, and corrosion science, Corrosion Mechanisms in Theory and Practice, Third Edition explores the latest advances in corrosion and protection mechanisms. It presents a detailed account of the chemical and electrochemical surface reactions that govern corrosion as well as the link between microscopic forces and macroscopic behavior. Revised and expanded, this edition includes four new chapters on corrosion fundamentals, the passivity of metals, high temperature corrosion, and the corrosion of aluminum alloys. The first half of the book covers basic aspects of corrosion, such as entry of hydrogen into metals, anodic dissolution, localized corrosion, stress corrosion cracking, and corrosion fatigue. Connecting the theoretical aspects of corrosion mechanisms to practical applications in industry, the second half of the text discusses corrosion inhibition, atmospheric corrosion, microbially induced corrosion, corrosion in nuclear systems, corrosion of microelectronic and magnetic data-storage devices, and organic coatings. With contributions from leading academic and industrial researchers, this bestselling book continues to provide a thorough understanding of corrosion mechanisms—helping you solve existing corrosion challenges and prevent future problems.
Reliability Wearout Mechanisms in Advanced CMOS Technologies
Author: Alvin W. Strong
Publisher: John Wiley & Sons
ISBN: 047045525X
Category : Technology & Engineering
Languages : en
Pages : 642
Book Description
This invaluable resource tells the complete story of failure mechanisms—from basic concepts to the tools necessary to conduct reliability tests and analyze the results. Both a text and a reference work for this important area of semiconductor technology, it assumes no reliability education or experience. It also offers the first reference book with all relevant physics, equations, and step-by-step procedures for CMOS technology reliability in one place. Practical appendices provide basic experimental procedures that include experiment design, performing stressing in the laboratory, data analysis, reliability projections, and interpreting projections.
Publisher: John Wiley & Sons
ISBN: 047045525X
Category : Technology & Engineering
Languages : en
Pages : 642
Book Description
This invaluable resource tells the complete story of failure mechanisms—from basic concepts to the tools necessary to conduct reliability tests and analyze the results. Both a text and a reference work for this important area of semiconductor technology, it assumes no reliability education or experience. It also offers the first reference book with all relevant physics, equations, and step-by-step procedures for CMOS technology reliability in one place. Practical appendices provide basic experimental procedures that include experiment design, performing stressing in the laboratory, data analysis, reliability projections, and interpreting projections.
Non-Crystalline Films for Device Structures
Author:
Publisher: Elsevier
ISBN: 0080542956
Category : Science
Languages : en
Pages : 279
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.
Publisher: Elsevier
ISBN: 0080542956
Category : Science
Languages : en
Pages : 279
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.
Focus on Nanotechnology Research
Author: Eugene V. Dirote
Publisher: Nova Publishers
ISBN: 9781590339374
Category : Technology & Engineering
Languages : en
Pages : 234
Book Description
Nanotechnology is a 'catch-all' description of activities at the level of atoms and molecules that have applications in the real world. A nanometer is a billionth of a meter, about 1/80,000 of the diameter of a human hair, or 10 times the diameter of a hydrogen atom. Nanotechnology is now used in precision engineering, new materials development as well as in electronics; electromechanical systems as well as mainstream biomedical applications in areas such as gene therapy, drug delivery and novel drug discovery techniques. This book presents the latest research in this frontier field. Contents: Preface; Electrospinning: A Novel Method for Metal Oxide Fibres; Nanofocusing Probe Optimisation in a Near-Field Head for an Ultra-High Density Optical Memory; Molecular Dynamics Simulation of Metallic Nanocluster Interfaces; Pre- and Post-Breakdown Conduction of Thin SiO2 Gate Oxides of MOS Devices: A Conductive Atomic Force Microscope Study; Topographic and Electrical Characterisation of Afm-Grown SiO2 on Si; Solvothermal Route used to Synthesize BN Nanocrystals and the Catalytic Effect of BN Nanocrystals; Covalently Attached Multilayer Self-Assembly Films and Micropatterns Comprising Metal
Publisher: Nova Publishers
ISBN: 9781590339374
Category : Technology & Engineering
Languages : en
Pages : 234
Book Description
Nanotechnology is a 'catch-all' description of activities at the level of atoms and molecules that have applications in the real world. A nanometer is a billionth of a meter, about 1/80,000 of the diameter of a human hair, or 10 times the diameter of a hydrogen atom. Nanotechnology is now used in precision engineering, new materials development as well as in electronics; electromechanical systems as well as mainstream biomedical applications in areas such as gene therapy, drug delivery and novel drug discovery techniques. This book presents the latest research in this frontier field. Contents: Preface; Electrospinning: A Novel Method for Metal Oxide Fibres; Nanofocusing Probe Optimisation in a Near-Field Head for an Ultra-High Density Optical Memory; Molecular Dynamics Simulation of Metallic Nanocluster Interfaces; Pre- and Post-Breakdown Conduction of Thin SiO2 Gate Oxides of MOS Devices: A Conductive Atomic Force Microscope Study; Topographic and Electrical Characterisation of Afm-Grown SiO2 on Si; Solvothermal Route used to Synthesize BN Nanocrystals and the Catalytic Effect of BN Nanocrystals; Covalently Attached Multilayer Self-Assembly Films and Micropatterns Comprising Metal